Patents by Inventor Toshiharu Kurauchi

Toshiharu Kurauchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220195582
    Abstract: The invention provides an apparatus that causes film formation particles to adhere to a surface of a substrate moving in a hermetically-sealable chamber and thereby forms a thin film thereon and includes: a plasma generator; a substrate transfer unit; a film-formation source supplier; and a film-formation region limiter. The plasma generator includes a magnet located at the other surface of the substrate and a gas supplier that supplies a film forming gas to near the surface of the substrate. The film-formation region limiter includes a shield that is located close to the surface of the substrate and has an opening. The ratio of a diameter of the opening of the shield to a diameter of the plasma generated by the plasma generator in a direction along the surface of the substrate is in a range of less than or equal to 110/100.
    Type: Application
    Filed: December 22, 2020
    Publication date: June 23, 2022
    Applicant: ULVAC, Inc.
    Inventors: Manabu GIBO, Toshiharu KURAUCHI, Hiroshi EHIRA
  • Patent number: 8460048
    Abstract: A method for manufacturing a plasma display panel in which an electrical discharge gas is introduced into a space between a first substrate and a second substrate which are sealed together, the method including: a first deaeration step of releasing impurity gases from a protective film by heating the first substrate, on which the protective film is formed for withstanding plasma electrical discharge, to 280° C. or more in a vacuum or in a controlled atmosphere; and a sealing step of sealing the front substrate, in which the impurity gases have been released from the protective film, and a rear substrate which are placed in contact with each other.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: June 11, 2013
    Assignee: Ulvac, Inc.
    Inventors: Eiichi Iijima, Muneto Hakomori, Masato Nakatuka, Toshiharu Kurauchi
  • Patent number: 8454404
    Abstract: A method for manufacturing a sealed panel having a first substrate and a second substrate, including: a melting step of melting a sealing material which does not contain a binder for making the sealing material into paste form; a coating step of applying the melted sealing material onto a surface of the second substrate; and a sealing step of laminating the first substrate and the second substrate via the sealing material applied onto the surface of the second substrate.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: June 4, 2013
    Assignee: Ulvac, Inc.
    Inventors: Eiichi Iijima, Muneto Hakomori, Toshiharu Kurauchi, Takanobu Yano, Yuichi Orii
  • Publication number: 20120196175
    Abstract: A process for producing a chargeable-and-dischargeable thin film lithium secondary battery, which includes a substrate, a positive electrode film arranged on the substrate and formed in a structure of which lithium is insertable and releasable, an electrolyte film which is arranged on the positive electrode film and being in contact with the positive electrode film and contains lithium ions and in which lithium ions are movable, and a negative electrode film made of metallic lithium and arranged on the electrolyte film and being in contact with the electrolyte film, wherein after the negative electrode film is formed, a lithium carbonate film is formed on a surface of the negative electrode film by bringing a surface of the negative electrode film into contact with a surface-treating gas containing a rare gas and carbon dioxide. The process does not change the properties of a metallic lithium film as a negative electrode.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 2, 2012
    Applicant: ULVAC, INC.
    Inventors: Masanori HIDA, Hideyuki Odagi, Tetsuya Shimada, Makoto Aodai, Toshiharu Kurauchi
  • Publication number: 20120082778
    Abstract: The present invention aims to provide a technology, which uses an apparatus having a simple configuration to efficiently form a film with uniform film thickness and film quality when continuously forming a film by vacuum deposition of highly reactive lithium. A vacuum deposition system of the present invention has a vacuum deposition chamber wherein an evaporation material is deposited on a substrate by deposition, a substrate supplying/replacing system, connected to the vacuum deposition chamber, for performing supplying and replacing the substrate to and from the vacuum deposition chamber, and a material supplying/replacing system, connected to the vacuum deposition chamber, for performing the supplying and the replacing of the evaporation material to and from the vacuum deposition chamber.
    Type: Application
    Filed: October 18, 2011
    Publication date: April 5, 2012
    Applicant: ULVAC, INC.
    Inventors: Tetsuya SHIMADA, Masanori Hida, Hideyuki Odagi, Shun Mikami, Makoto Aodai, Toshiharu Kurauchi
  • Publication number: 20100167618
    Abstract: A method for manufacturing a plasma display panel in which an electrical discharge gas is introduced into a space between a first substrate and a second substrate which are sealed together, the method including: a first deaeration step of releasing impurity gases from a protective film by heating the first substrate, on which the protective film is formed for withstanding plasma electrical discharge, to 280° C. or more in a vacuum or in a controlled atmosphere; and a sealing step of sealing the front substrate, in which the impurity gases have been released from the protective film, and a rear substrate which are placed in contact with each other.
    Type: Application
    Filed: May 30, 2008
    Publication date: July 1, 2010
    Applicant: ULVAC, INC.
    Inventors: Eiichi Iijima, Muneto Hakomori, Masato Nakatuka, Toshiharu Kurauchi
  • Publication number: 20100159787
    Abstract: A method for manufacturing a sealed panel having a first substrate and a second substrate, including: a melting step of melting a sealing material which does not contain a binder for making the sealing material into paste form; a coating step of applying the melted sealing material onto a surface of the second substrate; and a sealing step of laminating the first substrate and the second substrate via the sealing material applied onto the surface of the second substrate.
    Type: Application
    Filed: May 30, 2008
    Publication date: June 24, 2010
    Applicant: ULVAC, INC.
    Inventors: Eiichi Iijima, Muneto Hakomori, Toshiharu Kurauchi, Takanobu Yano, Yuichi Orii
  • Patent number: 7626337
    Abstract: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma-gas contains xenon gas, the plasma display panel of the present invention has higher brightness.
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: December 1, 2009
    Assignee: Ulvac, Inc.
    Inventors: Toshiharu Kurauchi, Muneto Hakomori, Kazuya Uchida, Shunji Misawa
  • Publication number: 20080182034
    Abstract: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma gas contains xenon gas, the plasma display panel of the present invention has higher brightness.
    Type: Application
    Filed: March 25, 2008
    Publication date: July 31, 2008
    Applicant: ULVAC, INC.
    Inventors: Toshiharu Kurauchi, Muneto Hakomori, Kazuya Uchida, Shunji Misawa
  • Publication number: 20070108905
    Abstract: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma-gas contains xenon gas, the plasma display panel of the present invention has higher brightness.
    Type: Application
    Filed: November 9, 2006
    Publication date: May 17, 2007
    Applicant: ULVAC, Inc.
    Inventors: Toshiharu Kurauchi, Muneto Hakomori, Kazuya Uchida, Shunji Misawa
  • Patent number: 6533630
    Abstract: A vacuum display device for enabling the manufacture of high quality plasma display device with high throughput. A front panel 6 constituting a plasma display device is carried into a film deposition chamber 22; and a MgO thin film is deposited in a vacuum atmosphere. The front panel 6 is then carried into an alignment chamber 11 without being exposed to the atmosphere and aligned with a rear panel 7 that has been subjected to degassing in a vacuum atmosphere. There is no absorption of gas, such as moisture; and the quality of the thin film is not degraded. After alignment, aging processing is carried out without exposure to the atmosphere, followed by gas encapsulation and hermetic sealing, which further increases throughput.
    Type: Grant
    Filed: May 26, 2000
    Date of Patent: March 18, 2003
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Ryuuichi Terajima, Yukio Masuda, Toshiharu Kurauchi, Ken Momono, Yoshio Sunaga, Hidenori Suwa, Kyuzo Nakamura