Abstract: An exposure apparatus includes a substrate holder configured to hold a substrate and move, a module including a spatial light modulator having light modulation elements that are two-dimensionally arranged, an illumination unit irradiating the spatial light modulator with illumination lights, and a projection unit guiding the illumination light from the light modulation elements to respective light irradiation areas that are two-dimensionally arranged on the substrate in first and second directions, and a control unit configured to drive the substrate holder in a scanning direction, wherein the light modulation elements are two-dimensionally arranged to be inclined at a predetermined angle ? (0°<?<90°) with respect to the scanning direction and a non-scanning direction orthogonal to the scanning direction, and when a predetermined region of the substrate is exposed, the control unit scans the substrate holder at such a speed that spot positions are arranged in a staggered arrangement.

Abstract: A dipole group quantification method includes quantitating a dipole group that are sources of signals based on positions of dipoles.

Abstract: A dipole group quantification method includes quantitating a dipole group that are sources of signals based on positions of dipoles.

Abstract: An information processing apparatus for supporting extraction, from a plurality of managed persons, of one or more persons who are subject to an interview by a manager includes an index value calculation unit configured to calculate, for each of the plurality of managed persons, an index value which is a criterion of determination whether a managed person is subject to the interview with reference to a work information database which stores work information and a health examination database which stores health examination information, a screen data generation unit configured to generate screen data for displaying a list screen, the list screen displaying the plurality of managed persons arranged in accordance with the index value and an output unit configured to output the screen data.

Abstract: Consumed energy is minimized to reduce running cost. Final formed products of uniform quality are successively obtained. High productivity is provided. A primary forming step of obtaining a primary formed product by plastically working a heated steel sheet with a primary forming die set for a predetermined time period, a secondary forming step of machining the primary formed product with the secondary forming die set for a predetermined time period to obtain a secondary formed product, and a hardening step of allowing a cooling die set placed in a hydraulic press controlled by a servomotor to hold the secondary formed product under pressure for a longer time period than the time period of each of the primary and secondary forming steps to obtain a hardened final formed product are successively performed in sequence. The hardening step is performed independently without coordinating with the primary and secondary forming steps.

Abstract: Consumed energy is minimized to reduce running cost. Final formed products of uniform quality are successively obtained. High productivity is provided. A primary forming step of obtaining a primary formed product by plastically working a heated steel sheet with a primary forming die set for a predetermined time period, a secondary forming step of machining the primary formed product with the secondary forming die set for a predetermined time period to obtain a secondary formed product, and a hardening step of allowing a cooling die set placed in a hydraulic press controlled by a servomotor to hold the secondary formed product under pressure for a longer time period than the time period of each of the primary and secondary forming steps to obtain a hardened final formed product are successively performed in sequence. The hardening step is performed independently without coordinating with the primary and secondary forming steps.

Abstract: Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

Abstract: Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

Abstract: When a pattern is transferred via a projection optical system, a size of an image of the pattern varies depending on a defocus amount of a transferring position from the best focus position, and a flucuation curve showing the variation (the so-called CD-focus curve) varies depending on wavefront aberration of the projection optical system. There is a close relation between a linear combination value of a plurality of terms that each have a coefficient (an aberration component) of a plurality of Zernike terms (aberration component terms) into which the wavefront aberration of the projection optical system is decomposed using a Zernike polynomial in series expansion, and the variation of the flucuation curve.

Abstract: Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

Abstract: Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

Abstract: An exposure apparatus with optimum illumination conditions without dependence on the directionality of the fine pattern on a reticle comprises an illumination optical system for illuminating a reticle having a pattern to be transferred and a projection optical system for projecting and transforming the reticle pattern on a substrate. The illumination optical system has pupil shape forming unit for forming four substantially planar light sources on the plane in the vicinity of its pupil. These four substantially planar light sources are arranged at each substantial vertices of a narrow rectangle whose barycenter is located on the illumination optical axis.

Abstract: Disclosed is an environmental control apparatus for controlling a working environment in an exposure apparatus for effecting exposure using exposure light having a wavelength range in which oxygen absorbs the exposure light. The apparatus comprises an ozone removing filter for removing ozone in the air supplied to the exposure apparatus. By use of the environmental control apparatus of the present invention, ozone which is present in the air supplied to the exposure apparatus and absorbs the exposure light can be removed, so that a decrease in the amount of exposure light can be suppressed and hence, the amount of exposure light can be stabilized during exposure.

Abstract: An exposure apparatus with optimum illumination conditions without dependence on the directionality of the fine pattern on a reticle comprises an illumination optical system for illuminating a reticle having a pattern to be transferred and a projection optical system for projecting and transforming the reticle pattern on a substrate. The illumination optical system has pupil shape forming unit for forming four substantially planar light sources on the plane in the vicinity of its pupil. These four substantially planar light sources are arranged at each substantial vertices of a narrow rectangle whose barycenter is located on the illumination optical axis.

Abstract: Disclosed is an environmental control apparatus for controlling a working environment in an exposure apparatus for effecting exposure using exposure light having a wavelength range in which oxygen absorbs the exposure light. The apparatus comprises an ozone removing filter for removing ozone in the air supplied to the exposure apparatus. By use of the environmental control apparatus of the present invention, ozone which is present in the air supplied to the exposure apparatus and absorbs the exposure light can be removed, so that a decrease in the amount of exposure light can be suppressed and hence, the amount of exposure light can be stabilized during exposure.

Abstract: An exposure system comprises a first exposure apparatus having a first exposure field and a second exposure apparatus having a second exposure field larger than the first exposure field. A first shot map forming device is provided in the first exposure apparatus to form a first shot map by dividing an exposure region on a photosensitive substrate in units of first shot areas each corresponding to the first exposure field. A control unit transfers information on the first shot map to the second exposure apparatus. A second shot map forming device is provided in the second exposure apparatus to form a second shot map, based on the information on the first shot map, so that a number of shots becomes minimum when an exposure region including the first shot map on the photosensitive substrate is divided in units of second shot areas each corresponding to the second exposure field. A manufacturing method provides apparatus used in the exposure system.

Abstract: Disclosed is an environmental control apparatus for controlling a working environment in an exposure apparatus for effecting exposure using exposure light having a wavelength range in which oxygen absorbs the exposure light. The apparatus comprises an ozone removing filter for removing ozone in the air supplied to the exposure apparatus. By use of the environmental control apparatus of the present invention, ozone which is present in the air supplied to the exposure apparatus and absorbs the exposure light can be removed, so that a decrease in the amount of exposure light can be suppressed and hence, the amount of exposure light can be stabilized during exposure.

Abstract: An exposure method comprises a first exposure step of using a first exposure apparatus having a first exposure field and projecting a pattern of a first mask onto a photosensitive substrate to effect exposures according to a first shot map where an exposure region on the photosensitive substrate is divided in units of first shot areas each corresponding to the first exposure field; and a second exposure step of using a second exposure apparatus having a second exposure field larger than the first exposure field and projecting a pattern of a second mask onto the photosensitive substrate to effect exposures according to a second shot map arranged so that a number of shots therein becomes minimum when a region including the first shot map is divided in units of second shot areas each corresponding to the second exposure field.

Abstract: A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light beam from the light source and illuminating a local area on the mask with the light beam, and a device for synchronously moving the mask and the photosensitive substrate so as to transfer the pattern on the mask onto the photosensitive substrate. A direction, corresponding to a higher spatial coherence of the light beam, is made to coincide with the direction of relative scanning an illumination area and the mask in the illumination area.

Abstract: A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light beam from the light source and illuminating a local area on the mask with the light beam, and a device for synchronously moving the mask and the photosensitive substrate so as to transfer the pattern on the mask onto the photosensitive substrate. A direction, corresponding to a higher spatial coherence of the light beam, is made to coincide with the direction of relative scanning an illumination area and the mask in the illumination area.