Patents by Inventor Toshiharu Numata

Toshiharu Numata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6033476
    Abstract: A coating apparatus comprises an upstream lip and a downstream lip defining a slot between the two lips through which a coating liquid can be extruded; and a pair of guide rollers disposed on opposite side of the lips for guiding a support to move past the lips such that the coating liquid can be applied thereto, wherein the downstream lip has a coating operation surface facing and curved toward the support and, a curvature k of the curved coating operation surface being given asP.sub.2 /T.ltoreq.k.ltoreq.P.sub.1 /Twhere T represents the tension in the coated portion of the support, and P.sub.1 and P.sub.2 represent the pressures of the coating liquid acting on the support at upstream and downstream ends of said coating operation surface.
    Type: Grant
    Filed: April 23, 1996
    Date of Patent: March 7, 2000
    Assignee: Kao Corporation
    Inventors: Junichi Masukawa, Nobuyuki Isshiki, Nobunori Ohji, Eiten Chin, Toshiharu Numata
  • Patent number: 5743722
    Abstract: A coating apparatus wherein downstream lips have coating work surfaces respectively where a magnetic dispersoid contacts with a web. A coating work surface of a second downstream lip which is positioned downstream with respect to the web feeding direction is set in a position so as to be apart from the web more than a tangential line which extends from a downstream end of a coating work surface of a first downstream lip which is positioned upstream with respect to the web feeding direction.
    Type: Grant
    Filed: May 29, 1996
    Date of Patent: April 28, 1998
    Assignee: Kao Corporation
    Inventors: Eiten Chin, Toshiharu Numata, Masayuki Sugawa, Takeshi Nakajima
  • Patent number: 5618580
    Abstract: The present invention provides a method for producing ceramic fine particles comprising the steps of supplying gaseous starting materials or starting material droplets to a reaction space arranged in an annular portion between inner and outer cylinders of a coaxial, double-cylinder reaction apparatus, the reaction apparatus having a stationary outer cylinder and a rotatable inner cylinder; and subjecting the gaseous starting materials or the starting material droplets to reaction in the reaction space while rotating the inner cylinder. Also, the present invention provides a production apparatus used therefor.
    Type: Grant
    Filed: June 15, 1995
    Date of Patent: April 8, 1997
    Assignee: Kao Corporation
    Inventors: Kentaro Oshima, Toshiharu Numata, Toru Nishimura, Sachiko Kokubo, Keiichi Tsuto
  • Patent number: 5537344
    Abstract: A convolution of input data S.sub.0 and a Gabor function G.sub..alpha.,.omega. is implemented by a processing unit (20) to obtain a wavelet coefficient T.sub.g (2.sup.0,b) of a 0th stage. The input data S.sub.0 is applied to a low-pass filter (30) and is subjected to Gaussian-type filtering so as to be converted into input data S.sub.1 for a 1st stage. The frequency of the high-frequency components of this input data is halved by this filtering. A convolution of this input data S.sub.1 and a Gabor function G.sub..alpha. /3,2.omega./3 is implemented by a processing unit (21) to obtain a wavelet coefficient T.sub.g (2.sup.1,b) of the 1st stage. In the convolution of the 1st stage, the sampling interval is twice that of the 0th stage. Thenceforth, and in similar fashion, the sampling interval in processing operations of subsequent stages is doubled from one stage to the next. As a result, there is no increase in the amount of processing in each stage and a coefficient T.sub.g (2.sup.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: July 16, 1996
    Assignee: Kao Corporation
    Inventors: Nobuyuki Isshiki, Kimie Sannomiya, Takanobu Uchida, Toshiharu Numata
  • Patent number: 5534065
    Abstract: A coating apparatus comprises an upstream lip and a downstream lip defining a slot between the two lips through which a coating liquid can be extruded; and a pair of guide rollers disposed on opposite side of the lips for guiding a support to move past the lips such that the coating liquid can be applied thereto, wherein the downstream lip has a coating operation surface facing and curved toward the support and, a curvature k of the curved coating operation surface being given asP.sub.2 /T.ltoreq.k.ltoreq.P.sub.1 /Twhere T represents the tension in the coated portion of the support, and P.sub.1 and P.sub.2 represent the pressures of the coating liquid acting on the support at upstream and downstream ends of said coating operation surface.
    Type: Grant
    Filed: August 23, 1994
    Date of Patent: July 9, 1996
    Assignee: Kao Corporation
    Inventors: Junichi Masukawa, Nobuyuki Isshiki, Nobunori Ohji, Eiten Chin, Toshiharu Numata
  • Patent number: 5418004
    Abstract: In an extrusion type coating device 10, an upstream lip 12 of a coating head 11 is provided with a chamfer with a slot side edge B thereof as a start point. A contact line L drawn from the upstream lip 12 to a downstream lip 13 defines an angle .theta. with a line segment OB with respect to a point O of contact between the contact line and the upstream lip 12 such that the angle .theta. is O<.theta.<45 degrees.
    Type: Grant
    Filed: November 23, 1993
    Date of Patent: May 23, 1995
    Assignee: Kao Corporation
    Inventors: Eiten Chin, Toshiharu Numata, Toshiki Takeuchi, Yutaka Nakama