Patents by Inventor Toshiharu Takaramoto

Toshiharu Takaramoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7880532
    Abstract: There is provided a reference voltage generating circuit including: a first PN junction element (PN1) whose forward voltage is a first voltage V1; a second PN junction element (PN2) having a current density different from the first PN junction element and whose forward voltage is a second voltage V2 higher than the first voltage V1; and generating circuits (101 to 103) inputting the first voltage V1 and the second voltage V2 and generating a reference voltage expressed by A2×V2+A3×(A2×V2?A1×V1) in which A1, A2, and A3 are set to be coefficients, and in which A1 and A2 are different values.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: February 1, 2011
    Assignee: Fujitsu Limited
    Inventors: Toshiharu Takaramoto, Kunihiko Gotoh
  • Publication number: 20100013540
    Abstract: There is provided a reference voltage generating circuit including: a first PN junction element (PN1) whose forward voltage is a first voltage V1; a second PN junction element (PN2) having a current density different from the first PN junction element and whose forward voltage is a second voltage V2 higher than the first voltage V1; and generating circuits (101 to 103) inputting the first voltage V1 and the second voltage V2 and generating a reference voltage expressed by A2×V2+A3×(A2×V2?A1×V1) in which A1, A2, and A3 are set to be coefficients, and in which A1 and A2 are different values.
    Type: Application
    Filed: September 24, 2009
    Publication date: January 21, 2010
    Applicant: FUJITSU LIMITED
    Inventors: Toshiharu TAKARAMOTO, Kunihiko Gotoh
  • Patent number: 7598541
    Abstract: A semiconductor device has transistors (P1,P10,P11) formed in an active region (22) isolated by a trench isolation region, and a predetermined circuit including a first and second transistors (P10,P11) that require symmetry or relativity characteristics, wherein the distances (S1) between a gate electrode and one end of the active region on a source side viewed from the gate electrode in the first and second transistor are substantially same, and the distances (D1) between a gate electrode and one end of the active region on a drain side viewed from the gate electrode in the first and second transistor are substantially same. The predetermined circuit includes, for example, a current mirror circuit that has a transistor pair of which gate is commonly connected, and a differential circuit that has a transistor pair whose sources are commonly connected, where an input signal is supplied to the gate, and an output signal is generated in the drain.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: October 6, 2009
    Assignee: Fujitsu Microelectronics Limited
    Inventors: Atsushi Okamoto, Toshiharu Takaramoto
  • Publication number: 20050189595
    Abstract: A semiconductor device has transistors (P1,P10,P11) formed in an active region (22) isolated by a trench isolation region, and a predetermined circuit including a first and second transistors (P10,P11) that require symmetry or relativity characteristics, wherein the distances (S1) between a gate electrode and one end of the active region on a source side viewed from the gate electrode in the first and second transistor are substantially same, and the distances (D1) between a gate electrode and one end of the active region on a drain side viewed from the gate electrode in the first and second transistor are substantially same. The predetermined circuit includes, for example, a current mirror circuit that has a transistor pair of which gate is commonly connected, and a differential circuit that has a transistor pair whose sources are commonly connected, where an input signal is supplied to the gate, and an output signal is generated in the drain.
    Type: Application
    Filed: August 18, 2004
    Publication date: September 1, 2005
    Applicant: FUJITSU LIMITED
    Inventors: Atsushi Okamoto, Toshiharu Takaramoto
  • Patent number: 6646860
    Abstract: The capacitor comprises a lower layer electrode 22 formed on a substrate 10 with an inter-layer insulation film 12 therebetween; an upper layer electrode 24 opposed to the lower layer electrode 22 with an inter-layer insulation film 12 therebetween, a lower interconnection layer 14 formed between the substrate 10 and the lower layer electrode 22, and electrically connected to the upper layer electrode 24, whereby the parasitic capacitance, which is a cause for lower capacitor accuracy, useless power consumption, etc. can be drastically decreased, and external noises can be shielded off.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: November 11, 2003
    Assignee: Fujitsu Limited
    Inventors: Toshiharu Takaramoto, Kunihiko Gotoh
  • Publication number: 20030081371
    Abstract: The capacitor comprises a lower layer electrode 22 formed on a substrate 10 with an inter-layer insulation film 12 therebetween; an upper layer electrode 24 opposed to the lower layer electrode 22 with an inter-layer insulation film 12 therebetween, a lower interconnection layer 14 formed between the substrate 10 and the lower layer electrode 22, and electrically connected to the upper layer electrode 24, whereby the parasitic capacitance, which is a cause for lower capacitor accuracy, useless power consumption, etc. can be drastically decreased, and external noises can be shielded off.
    Type: Application
    Filed: March 22, 2002
    Publication date: May 1, 2003
    Applicant: Fujitsu Limited
    Inventors: Toshiharu Takaramoto, Kunihiko Gotoh