Patents by Inventor Toshihide Nakajima

Toshihide Nakajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7553768
    Abstract: A substrate having flatness of less than 230 nmPV and surface roughness at RMS of less than 0.20 nm. is obtained by a method comprising: a process of polishing an object to be polished with a polishing pad comprising at least one layer having compressibility of 5% or below in a base layer of the polishing pad.
    Type: Grant
    Filed: April 6, 2006
    Date of Patent: June 30, 2009
    Assignee: Ohara Inc.
    Inventors: Kazuyoshi Nakamura, Toshihide Nakajima, Kousuke Nakajima, Takahisa Oonami
  • Patent number: 7164481
    Abstract: A coefficient of linear expansion measuring apparatus includes: two reflection plates between which a sample is put, a container to house them, which is filled with a gas having known rate of a refractive index variation, a temperature regulating member to set a temperature in the container variably, a light source to irradiate an irradiating light to reflecting surfaces of the reflection plates, a light receiving element to receive reflected lights in which the lights interferes each other and detecting a light intensity thereof, and a calculating member to calculate a coefficient of linear expansion of the sample, wherein: the calculating member calculates an optical path length variation between the reflecting surfaces from an output variation of the light receiving element, and calculates a length variation of the sample by correcting a part of the optical path length variation derived from the refractive index variation of the gas caused by the temperature variation.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: January 16, 2007
    Assignee: Kabushiki Kaisha Ohara
    Inventors: Nobuo Kawasaki, Toshihide Nakajima, Masahiko Daimon, Osamu Okajima
  • Publication number: 20060226124
    Abstract: A substrate having flatness of less than 230 nmPV and surface roughness at RMS of less than 0.20 nm. is obtained by a method comprising: a process of polishing an object to be polished with a polishing pad comprising at least one layer having compressibility of 5% or below in a base layer of the polishing pad.
    Type: Application
    Filed: April 6, 2006
    Publication date: October 12, 2006
    Applicant: OHARA INC.
    Inventors: Kazuyoshi Nakamura, Toshihide Nakajima, Kousuke Nakajima, Takahisa Oonami
  • Publication number: 20050046869
    Abstract: A coefficient of linear expansion measuring apparatus includes: two reflection plates between which a sample is put, a container to house them, which is filled with a gas having known rate of a refractive index variation, a temperature regulating member to set a temperature in the container variably, a light source to irradiate an irradiating light to reflecting surfaces of the reflection plates, a light receiving element to receive reflected lights in which the lights interferes each other and detecting a light intensity thereof, and a calculating member to calculate a coefficient of linear expansion of the sample, wherein: the calculating member calculates an optical path length variation between the reflecting surfaces from an output variation of the light receiving element, and calculates a length variation of the sample by correcting a part of the optical path length variation derived from the refractive index variation of the gas caused by the temperature variation.
    Type: Application
    Filed: August 27, 2004
    Publication date: March 3, 2005
    Applicant: KABUSHIKI KAISHA OHARA
    Inventors: Nobuo Kawasaki, Toshihide Nakajima, Masahiko Daimon, Osamu Okajima