Patents by Inventor Toshihide Ohgata

Toshihide Ohgata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4511429
    Abstract: This invention relates to a fine processing of aluminum and aluminum alloy layers, and to a method for dry etching by a plasma in a gas containing hydrogen and/or a gaseous hydrogen compound and further containing a gaseous chloride. The fine processing without suffering from the side-etching is feasible even in case using an inorganic material as a mask.
    Type: Grant
    Filed: December 15, 1982
    Date of Patent: April 16, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Tatsumi Mizutani, Toshihide Ohgata, Hideo Komatsu