Patents by Inventor Toshihide Takano
Toshihide Takano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8231851Abstract: An exhaust gas containing a perfluoride compound (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 by the catalyst. The exhaust gas containing HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer.Type: GrantFiled: September 16, 2002Date of Patent: July 31, 2012Assignees: Hitachi, Ltd., Hitachi Information & Control Solutions, Ltd., Hitachi Kyowa Engineering Co., Ltd.Inventors: Kazuyoshi Irie, Toshihiro Mori, Hisao Yokoyama, Takayuki Tomiyama, Toshihide Takano, Shin Tamata, Shuichi Kanno
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Patent number: 7641867Abstract: An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.Type: GrantFiled: June 23, 2006Date of Patent: January 5, 2010Assignees: Hitachi, Ltd., Hitachi Engineering Co., Ltd., Hitachi Kyowa Engineering Co., Ltd.Inventors: Kazuyoshi Irie, Toshihiro Mori, Hisao Yokoyama, Takayuki Tomiyama, Toshihide Takano, Shin Tamata, Shuichi Kanno
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Patent number: 7141221Abstract: An exhaust gas containing a perfluoride component (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.Type: GrantFiled: May 16, 2001Date of Patent: November 28, 2006Assignees: Hitachi, Ltd., Hitachi Engineering Co., Ltd., Hitachi Kyowa Engineering Co., Ltd.Inventors: Kazuyoshi Irie, Toshihiro Mori, Hisao Yokoyama, Takayuki Tomiyama, Toshihide Takano, Shin Tamata, Shuichi Kanno
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Publication number: 20060239869Abstract: An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.Type: ApplicationFiled: June 23, 2006Publication date: October 26, 2006Inventors: Kazuyoshi Irie, Toshihiro Mori, Hisao Yokoyama, Takayuki Tomiyama, Toshihide Takano, Shin Tamata, Shuichi Kanno
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Patent number: 6652817Abstract: An apparatus for processing an organohalogen compounds includes a catalyst container containing a catalyst layer, a supplying path for supplying a carrier gas containing organohalogen compounds and steam through the catalyst container, a cooling chamber arranged at a lower portion of the catalyst container, a spraying apparatus mounted in the cooling chamber for spraying a cooling liquid to cool exhaust gas containing a decomposed gas of the organohalogen compounds exhausted from the catalyst layer and a baffle member forming a bent path which introduces the exhaust gas containing the decomposed gas into the cooling chamber from the catalyst layer and mounted in the cooling chamber for preventing mists generated by spraying cooling liquid from the spraying apparatus from back flowing into the catalyst container.Type: GrantFiled: October 29, 1998Date of Patent: November 25, 2003Assignees: Hitachi, Ltd., Hitachi Engineering Co., Ltd.Inventors: Shin Tamata, Satoru Ohashi, Toshihide Takano, Hisao Yokoyama, Toshihiro Mori
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Publication number: 20030049190Abstract: An exhaust gas containing a perfluoride compound (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 by the catalyst. The exhaust gas containing HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer.Type: ApplicationFiled: September 16, 2002Publication date: March 13, 2003Inventors: Kazuyoshi Irie, Toshihiro Mori, Hisao Yokoyama, Takayuki Tomiyama, Toshihide Takano, Shin Tamata, Shuichi Kanno
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Publication number: 20010031228Abstract: An exhaust gas containing a perfluoride component (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.Type: ApplicationFiled: May 16, 2001Publication date: October 18, 2001Inventors: Kazuyoshi Irie, Toshihiro Mori, Hisao Yokoyama, Takayuki Tomiyama, Toshihide Takano, Shin Tamata, Shuichi Kanno
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Patent number: 5977427Abstract: A process is provided for the destruction of organohalogen compounds, such as methyl chloride, chloroform, carbon tetrachloride, etc., by mixing the organohalogen compounds with a heated carrier gas, such as nitrogen, argon or air, and either steam or water to form a mixture; supplying the mixture to a catalyst, such as titanium oxide/tungsten oxide, to decompose the organohalogen compounds into halogens and hydrogen halides, such as chlorine, hydrochloric acid, fluorine and hydrofluoric acid; conducting the halogen and hydrogen halide contaminated gas through a bent path, created by a baffle that prevents the entry of mist or droplets into the catalyst chamber, into a cooling section where the halogen and hydrogen halide contaminated gas is sprayed with water to cool the gas to a temperature low enough to prevent the formation of dioxines. An alkaline agent, such as sodium hydroxide, can be added to the cooling water to neutralize the halides and hydrogen halides.Type: GrantFiled: June 5, 1996Date of Patent: November 2, 1999Assignees: Hitachi, Ltd., Hitachi Engineering Co., Ltd.Inventors: Shin Tamata, Satoru Ohashi, Toshihide Takano, Hisao Yokoyama, Toshihiro Mori