Patents by Inventor Toshihiko Amano

Toshihiko Amano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180288270
    Abstract: An image sensor unit includes multiple elongated-shaped sensor wiring boards provided with sensor chips that generate an electric signal in response to incident light. The sensor wiring boards are arranged such that end faces in the longitudinal direction face each other. A resin material is provided between the end faces of the sensor wiring boards that face each other.
    Type: Application
    Filed: March 28, 2018
    Publication date: October 4, 2018
    Inventors: Toshihiko AMANO, Yoshihiro HATTORI
  • Publication number: 20040073627
    Abstract: A management system of patent or utility model information retrieval by Internet, connects a PC of a group or a subgroup to a server of a server management office by an Internet line, said PC accesses to said server, said server has a retrieval data base containing at least one of classification code data for a group, classification code data for a subgroup, and a classification code data for an individual, as well as an information data base of patent or utility model information, said retrieval data base and said information data base are retrieved upon request of retrieval for patent or utility model information by said PC and applied data of the patent or utility model information is issued to said PC, and said PC outputs the issued data.
    Type: Application
    Filed: August 13, 2003
    Publication date: April 15, 2004
    Inventor: Toshihiko Amano
  • Patent number: 6315869
    Abstract: A perfluorovinyl ether of the formula: RfO(CF2CFXO)nCF═CF2  (1) in which Rf is a perfluoralkyl group, X is a fluorine atom or a trifluoromethyl group, and n is a number of 0 to 20 containing impurities is purified by removing a hydrogen fluoride adduct of the perfluorovinyl ether (1) through distillation, the perfluorovinyl ether (1) is distilled in the presence of a ketone or an ether having a lower boiling point than that of the perfluorovinyl ether (1) while refluxing such a solvent. This method can remove the hydrogen fluoride adduct of a perfluorovinyl ether as an impurity and provide a high purity perfluorovinyl ether.
    Type: Grant
    Filed: May 21, 1999
    Date of Patent: November 13, 2001
    Assignee: Daikin Industries, Ltd.
    Inventors: Shigeru Morita, Toshihiko Amano
  • Patent number: 6211415
    Abstract: A hexafluoropropylene oxide oligomer of the formula: RfO[CF(CF3)CF2O]nCF(CF3)COF in which Rf is a group represented by the formula: F(CF2)m— in which m is an integer of 1 to 8, or the formula: (CF3)2CF(CF2)q— in which q is an integer of 0 to 6, and n is a number of 3 to 20 is heated and thermally decomposed in a solvent at a temperature of at least 100° C. in the presence of a compound which generates a fluoride (F−) ion to obtain mainly the dimer, trimer and tetramer of hexafluoropropylene oxide. Thus, the valuable low molecular weight oligomers of hexafluoropropylene oxide can be obtained from high molecular weight oligomers of hexafluoropropylene oxide which have been discarded.
    Type: Grant
    Filed: May 21, 1999
    Date of Patent: April 3, 2001
    Assignee: Daikin Industries, Ltd.
    Inventors: Shigeru Morita, Toshihiko Amano
  • Patent number: 4703095
    Abstract: A fluorine-containing copolymer comprising monomeric units of:(a) tetrafluoroethylene,(b) 8 to 15% by weight of hexafluoropropene on the basis of the weight of the copolymer, and(c) 0.2 to 2% by weight of a fluoroalkyl vinyl ether of the formula:CF.sub.2 .dbd.CF--O--(CF.sub.2).sub.n --CF.sub.2 Xwherein X is hydrogen or fluorine, and n is an integer of 3 to 9, on the basis of the weight of the copolymer, which has good moldability and improved stress crack resistance and flex resistance when formed as an article such as a film.
    Type: Grant
    Filed: February 14, 1986
    Date of Patent: October 27, 1987
    Assignee: Daiken Kogyo Co., Ltd.
    Inventors: Shinichi Nakagawa, Tsuneo Nakagawa, Toshihiko Amano, Mitsugu Omori, Sadaatsu Yamaguchi, Kozo Asano
  • Patent number: 4686168
    Abstract: A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.
    Type: Grant
    Filed: March 11, 1985
    Date of Patent: August 11, 1987
    Assignees: Daikin Kogyo Co., Ltd., Nippon Telegraph & Telephone Public Corporation
    Inventors: Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi, Hiroshi Asakawa, Osamu Kogure
  • Patent number: 4587316
    Abstract: A fluorine-containing copolymer comprising monomeric units of(a) tetrafluoroethylene,(b) 8 to 15% by weight of hexafluoropropene on the basis of the weight of the copolymer, and(c) 0.2 to 2% by weight of a fluoroalkyl vinyl ether of the formula:CF.sub.2 .dbd.CF--O--(CF.sub.2).sub.n --CF.sub.2 X (I)wherein X is hydrogen or fluorine, and n is an integer of 3 to 9 on the basis of the weight of the copolymer, which has improved stress crack resistance, and flex resistance as well as good moldability.
    Type: Grant
    Filed: January 31, 1984
    Date of Patent: May 6, 1986
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shinichi Nakagawa, Tsuneo Nakagawa, Toshihiko Amano, Mitsugu Omori, Sadaatsu Yamaguchi, Kozo Asano
  • Patent number: 4546157
    Abstract: A fluorine-containing copolymer comprising monomeric units of(a) from 95.8 to 80% by weight of tetrafluoroethylene,(b) from 4 to 14% by weight of hexafluoropropene, and(c) from 0.2 to 6% by weight of perfluorovinyl ether of the formula: ##STR1## wherein n is an integer of 1 to 4, and m is an integer of 0 to 3, and having excellent stress crack resistance when formed into a molded article.
    Type: Grant
    Filed: September 21, 1982
    Date of Patent: October 8, 1985
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Tsuneo Nakagawa, Sadatsu Yamaguchi, Toshihiko Amano, Kohzoh Asano
  • Patent number: 4539250
    Abstract: A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.
    Type: Grant
    Filed: December 17, 1982
    Date of Patent: September 3, 1985
    Assignees: Daikin Kogyo Co. Ltd., Nippon Telegraph & Telephone Public Corporation
    Inventors: Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi, Hiroshi Asakawa, Osamu Kogure
  • Patent number: 4499249
    Abstract: A process for preparing a tetrafluoroethylene/fluoro(alkyl vinyl ether) copolymer comprising polymerizing tetrafluoroethylene and fluoro(alkyl vinyl ether) in an aqueous suspension system which comprises a mixed medium of water and a fluorohydrocarbon or a chlorofluorohydrocarbon in a volume ratio of from 1:1 to 10:1 at a temperature of from 0.degree. to 25.degree. C. in the presence of a polymerization initiator of the formula:[Cl(CF.sub.2).sub.n --COO].sub.2 (I)wherein n is an integer of 1 to 10, the copolymer obtained by the process having a small number of unstable terminal groups and excellent flex life.
    Type: Grant
    Filed: April 28, 1983
    Date of Patent: February 12, 1985
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shinichi Nakagawa, Tsuneo Nakagawa, Sadaatsu Yamaguchi, Kiyohiko Ihara, Toshihiko Amano, Mitsugu Omori, Kohzoh Asano
  • Patent number: 4487903
    Abstract: A fluorine-containing elastomeric copolymer which comprises units of at least one fluorovinyl ether of the formula: ##STR1## wherein X is C.sub.1 -C.sub.3 perfluoroalkyl, C.sub.1 -C.sub.3 .omega.-hydroperfluoroalkyl or C.sub.1 -C.sub.3 .omega.-chloroperfluoroalkyl, Y is hydrogen, chlorine, fluorine, trifluoromethyl, difluoromethyl or chlorodifluoromethyl and n is an integer of 1 to 4 and units of at least one other fluorine-containing monomer copolymerizable therewith, the content of the fluorovinyl ether units being 15 to 50 mol %, which has excellent resistance to low temperatures.
    Type: Grant
    Filed: September 29, 1982
    Date of Patent: December 11, 1984
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Masayoshi Tatemoto, Toshihiko Amano
  • Patent number: 4144299
    Abstract: An acrylonitrile polymer film is produced by the steps of:Extruding an acrylonitrile polymer solution in a tubular shape into a coagulation liquid bath while a coagulation liquid is introduced into and withdrawn from the inside of the extruded tubular-shaped film;Removing the solvent remaining in the coagulated tubular film, and;Biaxially stretching the tubular film containing 5 to 23% by weight of water based on the dry weight, at a temperature of 100.degree.-170.degree. C. at least twice its original length both in the longitudinal and transverse directions by a tubular stretching procedure.
    Type: Grant
    Filed: September 12, 1977
    Date of Patent: March 13, 1979
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Akio Inoue, Toshio Iwasa, Kiichiro Sasaguri, Toshihiko Amano, Junji Nomura