Patents by Inventor Toshihiko Amano
Toshihiko Amano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180288270Abstract: An image sensor unit includes multiple elongated-shaped sensor wiring boards provided with sensor chips that generate an electric signal in response to incident light. The sensor wiring boards are arranged such that end faces in the longitudinal direction face each other. A resin material is provided between the end faces of the sensor wiring boards that face each other.Type: ApplicationFiled: March 28, 2018Publication date: October 4, 2018Inventors: Toshihiko AMANO, Yoshihiro HATTORI
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Publication number: 20040073627Abstract: A management system of patent or utility model information retrieval by Internet, connects a PC of a group or a subgroup to a server of a server management office by an Internet line, said PC accesses to said server, said server has a retrieval data base containing at least one of classification code data for a group, classification code data for a subgroup, and a classification code data for an individual, as well as an information data base of patent or utility model information, said retrieval data base and said information data base are retrieved upon request of retrieval for patent or utility model information by said PC and applied data of the patent or utility model information is issued to said PC, and said PC outputs the issued data.Type: ApplicationFiled: August 13, 2003Publication date: April 15, 2004Inventor: Toshihiko Amano
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Patent number: 6315869Abstract: A perfluorovinyl ether of the formula: RfO(CF2CFXO)nCF═CF2 (1) in which Rf is a perfluoralkyl group, X is a fluorine atom or a trifluoromethyl group, and n is a number of 0 to 20 containing impurities is purified by removing a hydrogen fluoride adduct of the perfluorovinyl ether (1) through distillation, the perfluorovinyl ether (1) is distilled in the presence of a ketone or an ether having a lower boiling point than that of the perfluorovinyl ether (1) while refluxing such a solvent. This method can remove the hydrogen fluoride adduct of a perfluorovinyl ether as an impurity and provide a high purity perfluorovinyl ether.Type: GrantFiled: May 21, 1999Date of Patent: November 13, 2001Assignee: Daikin Industries, Ltd.Inventors: Shigeru Morita, Toshihiko Amano
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Patent number: 6211415Abstract: A hexafluoropropylene oxide oligomer of the formula: RfO[CF(CF3)CF2O]nCF(CF3)COF in which Rf is a group represented by the formula: F(CF2)m— in which m is an integer of 1 to 8, or the formula: (CF3)2CF(CF2)q— in which q is an integer of 0 to 6, and n is a number of 3 to 20 is heated and thermally decomposed in a solvent at a temperature of at least 100° C. in the presence of a compound which generates a fluoride (F−) ion to obtain mainly the dimer, trimer and tetramer of hexafluoropropylene oxide. Thus, the valuable low molecular weight oligomers of hexafluoropropylene oxide can be obtained from high molecular weight oligomers of hexafluoropropylene oxide which have been discarded.Type: GrantFiled: May 21, 1999Date of Patent: April 3, 2001Assignee: Daikin Industries, Ltd.Inventors: Shigeru Morita, Toshihiko Amano
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Patent number: 4703095Abstract: A fluorine-containing copolymer comprising monomeric units of:(a) tetrafluoroethylene,(b) 8 to 15% by weight of hexafluoropropene on the basis of the weight of the copolymer, and(c) 0.2 to 2% by weight of a fluoroalkyl vinyl ether of the formula:CF.sub.2 .dbd.CF--O--(CF.sub.2).sub.n --CF.sub.2 Xwherein X is hydrogen or fluorine, and n is an integer of 3 to 9, on the basis of the weight of the copolymer, which has good moldability and improved stress crack resistance and flex resistance when formed as an article such as a film.Type: GrantFiled: February 14, 1986Date of Patent: October 27, 1987Assignee: Daiken Kogyo Co., Ltd.Inventors: Shinichi Nakagawa, Tsuneo Nakagawa, Toshihiko Amano, Mitsugu Omori, Sadaatsu Yamaguchi, Kozo Asano
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Patent number: 4686168Abstract: A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.Type: GrantFiled: March 11, 1985Date of Patent: August 11, 1987Assignees: Daikin Kogyo Co., Ltd., Nippon Telegraph & Telephone Public CorporationInventors: Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi, Hiroshi Asakawa, Osamu Kogure
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Patent number: 4587316Abstract: A fluorine-containing copolymer comprising monomeric units of(a) tetrafluoroethylene,(b) 8 to 15% by weight of hexafluoropropene on the basis of the weight of the copolymer, and(c) 0.2 to 2% by weight of a fluoroalkyl vinyl ether of the formula:CF.sub.2 .dbd.CF--O--(CF.sub.2).sub.n --CF.sub.2 X (I)wherein X is hydrogen or fluorine, and n is an integer of 3 to 9 on the basis of the weight of the copolymer, which has improved stress crack resistance, and flex resistance as well as good moldability.Type: GrantFiled: January 31, 1984Date of Patent: May 6, 1986Assignee: Daikin Kogyo Co., Ltd.Inventors: Shinichi Nakagawa, Tsuneo Nakagawa, Toshihiko Amano, Mitsugu Omori, Sadaatsu Yamaguchi, Kozo Asano
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Patent number: 4546157Abstract: A fluorine-containing copolymer comprising monomeric units of(a) from 95.8 to 80% by weight of tetrafluoroethylene,(b) from 4 to 14% by weight of hexafluoropropene, and(c) from 0.2 to 6% by weight of perfluorovinyl ether of the formula: ##STR1## wherein n is an integer of 1 to 4, and m is an integer of 0 to 3, and having excellent stress crack resistance when formed into a molded article.Type: GrantFiled: September 21, 1982Date of Patent: October 8, 1985Assignee: Daikin Kogyo Co., Ltd.Inventors: Tsuneo Nakagawa, Sadatsu Yamaguchi, Toshihiko Amano, Kohzoh Asano
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Patent number: 4539250Abstract: A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.Type: GrantFiled: December 17, 1982Date of Patent: September 3, 1985Assignees: Daikin Kogyo Co. Ltd., Nippon Telegraph & Telephone Public CorporationInventors: Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi, Hiroshi Asakawa, Osamu Kogure
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Patent number: 4499249Abstract: A process for preparing a tetrafluoroethylene/fluoro(alkyl vinyl ether) copolymer comprising polymerizing tetrafluoroethylene and fluoro(alkyl vinyl ether) in an aqueous suspension system which comprises a mixed medium of water and a fluorohydrocarbon or a chlorofluorohydrocarbon in a volume ratio of from 1:1 to 10:1 at a temperature of from 0.degree. to 25.degree. C. in the presence of a polymerization initiator of the formula:[Cl(CF.sub.2).sub.n --COO].sub.2 (I)wherein n is an integer of 1 to 10, the copolymer obtained by the process having a small number of unstable terminal groups and excellent flex life.Type: GrantFiled: April 28, 1983Date of Patent: February 12, 1985Assignee: Daikin Kogyo Co., Ltd.Inventors: Shinichi Nakagawa, Tsuneo Nakagawa, Sadaatsu Yamaguchi, Kiyohiko Ihara, Toshihiko Amano, Mitsugu Omori, Kohzoh Asano
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Patent number: 4487903Abstract: A fluorine-containing elastomeric copolymer which comprises units of at least one fluorovinyl ether of the formula: ##STR1## wherein X is C.sub.1 -C.sub.3 perfluoroalkyl, C.sub.1 -C.sub.3 .omega.-hydroperfluoroalkyl or C.sub.1 -C.sub.3 .omega.-chloroperfluoroalkyl, Y is hydrogen, chlorine, fluorine, trifluoromethyl, difluoromethyl or chlorodifluoromethyl and n is an integer of 1 to 4 and units of at least one other fluorine-containing monomer copolymerizable therewith, the content of the fluorovinyl ether units being 15 to 50 mol %, which has excellent resistance to low temperatures.Type: GrantFiled: September 29, 1982Date of Patent: December 11, 1984Assignee: Daikin Kogyo Co., Ltd.Inventors: Masayoshi Tatemoto, Toshihiko Amano
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Patent number: 4144299Abstract: An acrylonitrile polymer film is produced by the steps of:Extruding an acrylonitrile polymer solution in a tubular shape into a coagulation liquid bath while a coagulation liquid is introduced into and withdrawn from the inside of the extruded tubular-shaped film;Removing the solvent remaining in the coagulated tubular film, and;Biaxially stretching the tubular film containing 5 to 23% by weight of water based on the dry weight, at a temperature of 100.degree.-170.degree. C. at least twice its original length both in the longitudinal and transverse directions by a tubular stretching procedure.Type: GrantFiled: September 12, 1977Date of Patent: March 13, 1979Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Akio Inoue, Toshio Iwasa, Kiichiro Sasaguri, Toshihiko Amano, Junji Nomura