Abstract: A novel optical fiber connector part is provided which comprises a ferrule having a capillary hole for holding an optical fiber, the ferrule being formed from a zirconia-alumina composite oxide containing yttria at a content ranging from 2 to 4 mol % in zirconia. In the optical fiber connector part, a sleeve for connecting and holding the ferrule may be formed from zirconia and/or a zirconia-alumina composite oxide. A process for producing the optical fiber connector part is provided wherein the granular zirconia-alumina composed of a particulate zirconia-alumina mixture having an average particle diameter of not more than 1 .mu.m is used as raw material. The granular zirconia-alumina preferably contains alumina at a content ranging from 0.1% to 50% by weight. The process comprises spray-drying a slurry containing a particulate zirconia-alumina mixture having an average particle diameter of not more than 1 .mu.m.

Abstract: A shot method wherein a shot media based on zirconia composed of a sintered body of partially stabilized zirconia, of which a substantial quantity of the shot media pass through a sieve of normal sizes with apertures of 2.36 mm or less, of which the mean relative density against the theoretical density of zirconia is not less than 95%, of which the mean grain size is not more than 1.0 .mu.m, and which has a mean Vickers hardness of not less than 1,000 kgf/mm.sup.2, is shot to a work surface.

Abstract: A silicon nitride sintered body having a composition of 1.5-3.0 weight % of Y.sub.2 O.sub.3, 0.1-1.0 weight % of Al.sub.2 O.sub.3 and balance substantially Si.sub.3 N.sub.4, a weight ratio of Y.sub.2 O.sub.3 /Al.sub.2 O.sub.3 being 2.5 or more, which has a density of 3.0 g/cm.sup.3 or more and has a structure in which the minor axes of grains are substantially 6 .mu.m or less. This silicon nitride sintered body is produced by preparing a powder mixture containing Y.sub.2 O.sub.3 powder, Al.sub.2 O.sub.3 powder and silicon nitride powder in the above proportions, the silicon nitride powder having an oxygen content of 1.2 weight % or less, a specific surface area of 9-11 m.sup.2 /g and a metal impurity content of 200 ppm or less; and sintering the powder mixture at a temperature of 1900.degree.-2100.degree. C. and a pressure of 5 kg/cm.sup.2 G or more in a nitrogen atmosphere.

Abstract: A silicon nitride sintered body comprised of 1.5 to 3.0% by weight of Y.sub.2 O.sub.3, 0.1 to 1.0% by weight of Al.sub.2 O.sub.3 and 96 to 98.4% by weight of Si.sub.3 N.sub.4 wherein the Y.sub.2 O.sub.3 /Al.sub.2 O.sub.3 weight ratio is at least 2.5, and having a density of at least 3.0 g/cm.sup.3, exhibits a high oxidation resistance and a high strength at a high temperature. This silicon nitride sintered body is prepared by sintering a powdery mixture consisting essentially of 1.5 to 3.0% by weight of Y.sub.2 O.sub.3 powder, 0.1 to 1.0% by weight of Al.sub.2 O.sub.3 powder, and 96 to 98.4% by weight of Si.sub.3 N.sub.4 powder, the Y.sub.2 O.sub.3 /Al.sub.2 O.sub.3 weight ratio being at least 2.5, the oxygen content in the Si.sub.3 N.sub.4 powder being less than 2.0% by weight and the total metallic impurity content in the Si.sub.3 N.sub.4 being less than 200 ppm, at a temperature of 1,850.degree. to 2,000.degree. C. in a non-oxidizing atmosphere.

Abstract: Disclosed is a process for the preparation of high .alpha.-type silicon nitride powder, wherein a nitrogen-containing silane compound and/or amorphous silicon nitride is crystallized to form crystalline silicon nitride. In this process, crystalline silicon nitride having a particle size not larger than 0.05 .mu.m is incorporated in an amount of at least 0.1% by weight into the nitrogen-containing silane compound and/or amorphous silicon nitride, the mixture is formed into a power or molded body having a powder bulk density of at least 0.1 g/cm.sup.3 as silicon, and the powder or molded body is heated to 1,350.degree. to 1,700.degree. C. while controlling the temperature-elevating rate to at least 15.degree. C./min throughout the temperature range of from 1,200.degree. to 1,350.degree. C. The resulting high .alpha.-type silicon nitride is composed of a fine granular crystal and the does not contain a needle crystal or columnar crystal.

Abstract: A high .alpha.-type silicon nitride powder is prepared by thermally decomposing a mixture of a crystalline silicon nitride powder having an oxygen content of at least 1.0% by weight and a nitrogen-containing silane compound.

Abstract: A silicon nitride powder having an enhanced sintering activity is prepared by heating a mixture of a nitrogen-containing silane compound and a sintering aid in a non-oxidizing atmosphere.