Patents by Inventor Toshihiko Higuchi

Toshihiko Higuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5223583
    Abstract: A process for producing an unsaturated group-terminated polyalkylene oxide, which comprises subjecting a monoepoxide having at least 3 carbon atoms to ringopening addition polymerization to an initiator in the presence of a double metal cyanide complex catalyst, followed by converting terminal hydroxyl groups of the resulting hydroxyl group terminated polyalkylene oxide to unsaturated groups.
    Type: Grant
    Filed: May 3, 1990
    Date of Patent: June 29, 1993
    Assignee: Asahi Glass Company Ltd.
    Inventors: Toshihiko Higuchi, Shigeyuki Kozawa
  • Patent number: 5124425
    Abstract: The present invention is a room temperature curable polyurethane composition comprising as a curable component a polyurethane prepolymer having terminal isocyanate groups obtained by reacting an organic polyisocyanate and a polyol comprising as the main component a polyoxyalkylenepolyol having a molecular weight per hydroxyl group of from 1,500 to 15,000 and a total unsaturation degree of at most 0.07 meq/g.The above polyoxyalkylenepolyol having a molecular weight per hydroxyl group of from 1,500 to 15,000 and a total unsaturation degree of at most 0.07 meq/g, is produced by ring-opening addition polymerizing an alkylene oxide to an initiator, preferably by means of a double metal cyanide complex catalyst.By curing this curable polyurethane composition by moisture in air, a highly flexible cured product will be obtained.
    Type: Grant
    Filed: January 9, 1991
    Date of Patent: June 23, 1992
    Assignee: Asahi Glass Company Ltd.
    Inventors: Toshihiko Higuchi, Sigeyuki Kozawa, Nobuaki Kunji
  • Patent number: 5093710
    Abstract: Method of fabricating a semiconductor device having minute contact holes formed in an insulating film that is formed on a first metal layer. A layer of titanium nitride is formed on the side walls in the holes and on the insulating layer. A second metal layer is formed on the layer of titanium nitride. The second metal layer consists mainly of aluminum and is not thinned in the holes. The second metal layer and the underlying titanium nitride layer are photolithographically patterned.
    Type: Grant
    Filed: July 5, 1990
    Date of Patent: March 3, 1992
    Assignee: Seiko Epson Corporation
    Inventor: Toshihiko Higuchi
  • Patent number: 5068304
    Abstract: A moisture-curable resin composition containing a hydrolyzable silyl group-containing polyether compound as a curable component, said polyether compound comprising polyoxyalkylene chains derived from a polyoxyalkylene polyol having a hydroxyl value (x mgKOH/g) of from 5 to 35, a total degree of unsaturation (y meq/g) of not higher than 0.07 meq/g and y.ltoreq.0.9/(x-10), from 2 to 8 hydroxyl groups, and a content of oxyalkylene groups having at least 3 carbon atoms, of at least 60% by weight, and a hydrolyzable silyl group-containing terminal group present at least 1.3 terminals on the average of said polyoxyalkylene chains, said terminal group having a urethane bond linked to the polyoxyalkylene chain.
    Type: Grant
    Filed: December 6, 1989
    Date of Patent: November 26, 1991
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Toshihiko Higuchi, Yasuhiko Nakano, Nobuaki Kunii, Yoshiyuki Yamaguchi, Shigeyuki Kozawa