Patents by Inventor Toshihiko Ichikawa

Toshihiko Ichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210320204
    Abstract: The semiconductor device includes: a gate electrode on a semiconductor substrate via a gate insulating film; an offset drain layer in the semiconductor substrate on one side of the gate electrode; a drain layer on the offset drain layer; and a source layer in the semiconductor substrate on another side of the gate electrode. The semiconductor device further includes: a protective film covering the semiconductor substrate; a field plate on the protective film, and having a portion above the offset drain layer; and a field plug connected to the field plate and in the protective film and above the offset drain layer, in such a manner as to avoid reaching the offset drain layer.
    Type: Application
    Filed: June 23, 2021
    Publication date: October 14, 2021
    Applicants: TOWER PARTNERS SEMICONDUCTOR CO., LTD., TOWER SEMICONDUCTOR LTD.
    Inventors: Masao SHINDO, Takayuki YAMADA, Yoshinobu MOCHO, Toshihiko ICHIKAWA, Noriyuki INUISHI, Hideo ICHIMURA, Norio KOIKE, Sharon LEVIN, Hongning YANG, David MISTELE, Daniel SHERMAN
  • Patent number: 7717213
    Abstract: A motorcycle is provided with a rear fork attached to a body frame so as to swing up and down freely. A rear wheel is attached to the rear end portion of the rear fork, a gear case is attached to a side of the rear wheel, and a drive shaft is provided between the gear case and an output shaft of a power unit. The output of the power unit is transmitted to the rear wheel via the drive shaft and the gear case. In the motorcycle, the gear case is supported by a rear-wheel axle provided in the rear end portion of the rear fork. A torque rod, which links an outer periphery portion of the gear case with the rear fork, serves as a stopper for rotation of the gear case. The resulting configuration provides a shaft-drive system that reduces the assembling time of the torque rod, and improves the productivity of the main line.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: May 18, 2010
    Assignee: Honda Motor Co., Ltd.
    Inventors: Shinji Ito, Toshiyuki Iwai, Toshihiko Ichikawa
  • Publication number: 20080066987
    Abstract: A motorcycle is provided with a rear fork attached to a body frame so as to swing up and down freely. A rear wheel is attached to the rear end portion of the rear fork, a gear case is attached to a side of the rear wheel, and a drive shaft is provided between the gear case and an output shaft of a power unit. The output of the power unit is transmitted to the rear wheel via the drive shaft and the gear case. In the motorcycle, the gear case is supported by a rear-wheel axle provided in the rear end portion of the rear fork. A torque rod, which links an outer periphery portion of the gear case with the rear fork, serves as a stopper for rotation of the gear case. The resulting configuration provides a shaft-drive system that reduces the assembling time of the torque rod, and improves the productivity of the main line.
    Type: Application
    Filed: September 17, 2007
    Publication date: March 20, 2008
    Inventors: Shinji Ito, Toshiyuki Iwai, Toshihiko Ichikawa
  • Patent number: 6655363
    Abstract: A fuel supply system for a vehicle is provided with a fuel pump disposed in a fuel tank sitting astride a vehicle body frame. The fuel pump is disposed along a side surface of the fuel tank in a position opposed to a portion of the vehicle body frame. This fuel supply system for a vehicle provides a system in which a fuel pump can be disposed even in a fuel tank of a saddle-ridden vehicle with minimum modifications required in size and shape.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: December 2, 2003
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Koki Kobayashi, Toshihiko Ichikawa, Hiroyuki Kido, Hiroshi Nakano
  • Patent number: 6451640
    Abstract: There is provided a method of fabricating a semiconductor device, including the steps of (a) forming first well regions in a semiconductor substrate in all regions in which high-voltage and low-voltage MOS transistors are to be formed, the semiconductor At e having a first conductivity and the first well regions having a second conductivity, (b) forming an isolation layer on the semiconductor substrate for isolating the first well regions from each other, (c) forming high-voltage well regions having a first conductivity and low-voltage well regions one of which has a first conductivity and another of which has a second conductivity, and (d) forming MOS transistors on the high-voltage and low-voltage well regions. The high-voltage and low-voltage well regions are formed with the isolation layer being used as a mark. The above-mentioned method makes it possible to form low-voltage and high-voltage MOS transistors on a common semiconductor substrate in the smallest number of fabrication steps.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: September 17, 2002
    Assignee: NEC Corporation
    Inventor: Toshihiko Ichikawa
  • Publication number: 20020038653
    Abstract: A fuel supply system for a vehicle is provided with a fuel pump disposed in a fuel tank sitting astride a vehicle body frame. The fuel pump is disposed along a side surface of the fuel tank in a position opposed to a portion of the vehicle body frame. This fuel supply system for a vehicle provides a system in which a fuel pump can be disposed even in a fuel tank of a saddle-ridden vehicle with minimum modifications required in size and shape.
    Type: Application
    Filed: September 25, 2001
    Publication date: April 4, 2002
    Inventors: Koki Kobayashi, Toshihiko Ichikawa, Hiroyuki Kido, Hiroshi Nakano
  • Patent number: 6248669
    Abstract: A method of manufacturing a semiconductor device comprises forming a composite film which is etched on a base substrate. The composite film includes nitrogen atoms but, at the surface portion thereof, does not substantially include nitrogen atoms. The method further comprises forming a chemically amplified photo resist film on the composite film, exposing the photo resist film according to predetermined patterns, developing the photo resist film to form a patterned resist film, and etching the composite film by using the patterned resist film as a mask. According to this method, deterioration of throughput can be avoided, and the phenomenon of deactivation of proton acid generated on the resist exposure can be suppressed even after long time storage or even when the reconstruction is required.
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: June 19, 2001
    Assignee: NEC Corporation
    Inventors: Toshihiko Ichikawa, Hiroshi Ogawa