Patents by Inventor Toshihiko Kajima

Toshihiko Kajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010005569
    Abstract: Printing plate stock comprising a base, a photosensitive resin layer overlying the base, and a covering layer overlying the photosensitive resin layer, characterized in that said photosensitive resin layer comprises (i) a matrix phase comprising a hydrophobic polymer, and (ii) a dispersed phase, surrounded by said matrix phase, comprised of particles, wherein each of said particles comprises a hydrophobic polymer surrounded by a hydrophilic polymer, wherein said hydrophilic polymer is 5-30% wt of said photosensitive resin layer.
    Type: Application
    Filed: December 7, 2000
    Publication date: June 28, 2001
    Inventors: Masaru Nanpei, Akira Tomita, Keizo Kawahara, Toshihiko Kajima
  • Patent number: 6054249
    Abstract: A photosensitive resin laminate comprising at least a support, a photosensitive resin layer, a tackiness preventive layer and a cover film successively laminated, said tackiness preventive layer having a water content of not less than 4 wt % under a relative humidity (RH) of 30-80%. During the production of such photosensitive resin laminate, a water content of the tackiness preventive layer of not less than 4% has been achieved by adding a water retention agent to the tackiness preventive layer or allowing presence of water on the cover film (preferably by directly spraying water onto the cover film or placing a water-containing sheet on the cover film), as a result of which the tackiness preventive layer thereof is free of occurrence of wrinkles during any handling step and under any environment.
    Type: Grant
    Filed: July 18, 1997
    Date of Patent: April 25, 2000
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Shigenori Nagahara, Toshihiko Kajima, Hiroyuki Hamada
  • Patent number: 5424172
    Abstract: A photosensitive resin composition includes (A) a hydrophobic polymer having a glass transition temperature not greater than 5.degree. C., (B) a hydrophilic polymer, (C) an ethylenically unsaturated compound, (D) a solvent capable of dissolving the component (B) more than the component (A) and (E) a photopolymerization initiator, with the content of component (B) being less than that of component (A). The resin composition can be used to prepare a printing plate having a base, a photosensitive resin layer and a covering layer arranged one over another. The photosensitive resin layer contains a dispersed phase which includes particles having a phase which includes a hydrophobic polymer, surrounded by a phase which includes a hydrophilic polymer. The photosensitive resin layer can be prepared by removing the solvent (D) to a content of 0.001-2% by weight.
    Type: Grant
    Filed: July 20, 1992
    Date of Patent: June 13, 1995
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Masaru Nanpei, Akira Tomita, Keizo Kawahara, Toshihiko Kajima
  • Patent number: 5372913
    Abstract: A photosensitive resin composition includes (A) a hydrophobic polymer having a glass transition temperature not greater than 5.degree. C., (B) a hydrophilic polymer, (C) an ethylenically unsaturated compound, (D) a solvent capable of dissolving the component (B) more than the component (A) and (E) a photopolymerization initiator, with the content of component (B) being less than that of component (A). The resin composition can be used to prepare a printing plate having a base, a photosensitive resin layer and a covering layer arranged one over another. The photosensitive resin layer contains a dispersed phase which includes particles having a phase which includes a hydrophobic polymer, surrounded by a phase which includes a hydrophilic polymer. The photosensitive resin layer can be prepared by removing the solvent (D) to a content of 0.001-2% by weight.
    Type: Grant
    Filed: August 19, 1992
    Date of Patent: December 13, 1994
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Masaru Nanpei, Akira Tomita, Keizo Kawahara, Toshihiko Kajima
  • Patent number: 4946752
    Abstract: A photosensitive resin composition for a flexographic printing plate which comprises:(A) a polymer having a chlorine content of 10 to 50% by weight and a glass transition temperature of not higher than 5.degree. C. provided that the polymer is other than that of a conjugated diene hydrocarbon and a copolymer thereof;(B) a hydrophilic polymer;(C) an ethylenic unsaturated compound; and(D) a photopolymerization initiator.
    Type: Grant
    Filed: December 15, 1988
    Date of Patent: August 7, 1990
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Akira Tomita, Toshihiko Kajima, Keizo Kawahara, Hiroshi Satomi
  • Patent number: 4740450
    Abstract: An image reproducing material which comprises a support and at least a photosensitive resin layer and scratch resistance layer borne on the support, said scratch resistance layer containing a compound represented by AmBn, wherein A is mono- or divalent, straight or branched C.sub.11-20 aliphatic hydrocarbon; B is hydrogen, hydroxyl, amino, nitrile, aldehyde, carboxyl, or alkylamide, alkylester, ammonium salt or a periodic table group I-IV metal salt of a carboxylic acid; m is an integer of 1 to 3; and n is 1 or 2. A process for preparing the image reproducing material as well as a process for preparing an image reproduced material by using the image reproducing material are also described.
    Type: Grant
    Filed: January 8, 1987
    Date of Patent: April 26, 1988
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Nobuyuki Tamaoki, Yoshio Katoh, Akitada Osako, Toshihiko Kajima, Shinichi Tanaka
  • Patent number: 4459349
    Abstract: A photosensitive resin composition which comprises (1) an ethylenically unsaturated compound which can be addition polymerized to form a high molecular compound, said addition polymerizaton being initiated by a free radical and of chain-propagation, (2) a 2-polycyclic aryl-4,5-diphenylimidazolyl dimer wherein the polycyclic aryl group comprises at least two benzene rings condensed each other and (3) at least one compound selected from the group consisting of dimedone, indolacetic acid, N-naphthylglycine, S-lower alkylthioglycollic acid, 4,4'-bis[di(lower)alkylamino]benzyl, p-di(lower)alkylaminobenzoic ester, leucocrystalviolet, indoxylic acid, rhodanine, 7-di(lower)alkylaminocumarine and diarylthiourea and their derivatives, the molar ratio of the component (2) and the component (3) being from 2:1 to 1:5.
    Type: Grant
    Filed: March 23, 1982
    Date of Patent: July 10, 1984
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Toshikiyo Tanaka, Yoshio Katoh, Satoshi Imahashi, Toshihiko Kajima, Hisashi Uhara