Patents by Inventor Toshihiko Nishiguchi

Toshihiko Nishiguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5059503
    Abstract: The present invention provides an electrophotosensitive material containing the diamine derivative represented by the following general formula (I) and at least one selected from the group consisting of the hydrazone compound, fluorene compound and m-phenylenediamine compound. ##STR1## wherein R.sup.5 to R.sup.9, l, m, n, o and p are as defined.
    Type: Grant
    Filed: March 29, 1990
    Date of Patent: October 22, 1991
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Muto, Tatsuo Maeda, Toshihiko Nishiguchi, Mikio Kakui, Keisuke Sumida, Toru Nakazawa
  • Patent number: 5004662
    Abstract: Disclosed is an electrophotographic photosensitive material containing in a photosensitive layer an m-phenylenediamine compound represented by the following general formula [I]: ##STR1## wherein R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are groups substituted at meta-positions to the nitrogen atoms and represent a hydrogen atom, an alkyl group, an alkoxyl group or a halogen atom, with the proviso that at least two of R.sup.5, R.sup.6, R.sup.7 and R.sup.8 represent an alkyl group, alkoxyl group or a halogen atom, and R represents a hydrogen atom, an alkyl group, an alkoxyl group or a halogen atom.This meta-substituted m-phenylenediamine compound of general formula [I] is hardly crystallized in a resin but is sufficiently dissolved in the resin, and therefore, the concentration of the compound in the resin can be increased and the mobility can be enhanced. Accordingly, an electrophotographic photosensitive material having an increased sensitivity can be provided.
    Type: Grant
    Filed: July 27, 1989
    Date of Patent: April 2, 1991
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Mutoh, Yasuyuki Hanatani, Toshihiko Nishiguchi
  • Patent number: 4965155
    Abstract: Disclosed is an organic photoconductive material for the electrophotography, which comprises a linear high-molecular-weight polymer having a rhodanine derivative of the following formula incorporated as a substituent: ##STR1## In this derivative group, a benzylidene group or the like is bonded to the 5-position of the rhodanine ring. A photosensitive material comprising a polymer having this rhodanine derivative group shows a photoconductivity to visible rays even without addition of a charge-generating pigment.
    Type: Grant
    Filed: December 2, 1988
    Date of Patent: October 23, 1990
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Toshihiko Nishiguchi, Mika Yamamura
  • Patent number: 4885369
    Abstract: A photoconductive material for use in electrophotography comprising a rhodanine derivative and a halogen-containing polymer. The marked feature of the invention is to use a compound of the following formula ##STR1## wherein X represents ##STR2## and R represents a substituent such as an alkyl, aryl or amino group.
    Type: Grant
    Filed: November 30, 1988
    Date of Patent: December 5, 1989
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Toshiyuki Uryu, Toshihiko Nishiguchi