Patents by Inventor Toshihiko OONO

Toshihiko OONO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10065912
    Abstract: An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: September 4, 2018
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Takaaki Yoshimura, Toshihiko Oono, Shinya Akiba, Masaki Fujiwara
  • Publication number: 20180222834
    Abstract: An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).
    Type: Application
    Filed: March 30, 2017
    Publication date: August 9, 2018
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Takaaki YOSHIMURA, Toshihiko OONO, Shinya AKIBA, Masaki FUJIWARA
  • Publication number: 20180117644
    Abstract: It is an object of the present invention to provide a method for effectively washing a used “sevoflurane storage container” without using expensive sevoflurane as a washing liquid. This object is achieved by employing the washing method, comprising the steps of: creating a state in which at least sevoflurane vapor is present in the storage container (step A); bringing a “liquid containing water as a major component” into contact with the inner wall of the sevoflurane storage container in the state in which sevoflurane vapor is present in the storage container and draining the liquid outside of the storage container while the liquid remains liquid after step A (step B); and introducing a drying gas into the storage container so as to drain the liquid remaining on the inner wall of the storage container together with the drying gas outside of the storage container after step B (step C).
    Type: Application
    Filed: December 22, 2016
    Publication date: May 3, 2018
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Katsumi IWAO, Takaaki YOSHIMURA, Toshihiko OONO, Shinya AKIBA, Masaki FUJIWARA