Patents by Inventor Toshihiko OTSUKl

Toshihiko OTSUKl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POLISHING AGENT, POLISHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    Publication number: 20160237316
    Abstract: The present invention relates to a polishing agent including: cerium oxide particles; a water-soluble polyamine; potassium hydroxide; at least one selected from an organic acid and a salt thereof; and water, in which the polishing agent has a pH of 10 or more, a polishing method using the polishing agent, and a method for manufacturing a semiconductor integrated circuit device.
    Type: Application
    Filed: February 10, 2016
    Publication date: August 18, 2016
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Masaru SUZUKI, Toshihiko OTSUKl
  • POLISHING AGENT, POLISHING METHOD AND ADDITIVE LIQUID FOR POLISHING
    Publication number: 20160024351
    Abstract: A polishing agent includes a particle of a metal oxide, a water-soluble polyamide, an organic acid and water. The water-soluble polyamide has a tertiary amino group and/or an oxyalkylene chain in a molecule thereof. The polishing agent has a pH of 7 or less.
    Type: Application
    Filed: July 24, 2015
    Publication date: January 28, 2016
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Iori YOSHIDA, Nobuyuki TAKAGI, Masaru SUZUKI, Toshihiko OTSUKl