Abstract: Excellent optical performance is obtained without substantially any impact of birefringence even when a crystal material with intrinsic birefringence such as fluorite is used.

Abstract: A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

Abstract: This pressure gauge comprises a mounting section connected to a joint provided partway along a pipeline, and a measurement section provided on the mounting section, and in which the upwards movement of an actuator rod causes a rotation of a needle. In the mounting section, a concave section is provided with a base which interconnects with the inside of the pipeline, and inside this concave section is provided a diaphragm with a closed base, with an outer surface comprising a bellows section formed as a concertina shape, and with a central aperture for housing the tip of the actuator rod, and the pressure of fluid within the pipeline acts upon the base of the diaphragm compressing the diaphragm. At the tip of the actuator rod housed within the housing aperture is installed a protective cap which is constructed from polytetrafluoroethylene resin or a vinyl chloride or the like with excellent chemical resistance.

Abstract: A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

Abstract: A connector 20 comprises a plug 21 fitted to an opening 2 formed in a container 1, and a socket 22 which is connected to the plug 21. The plug 21 comprises a bracket section 3 which is fitted into the opening 2 of the container 1, and a plug section 23 which is screwed into a threaded aperture 4 formed in the bracket section 3. An annular locking ring 63 formed with lugs 66 on the outer periphery is integrally but removably fitted to the plug section 23 which is threadedly attached to the threaded aperture 4. A plurality of engaging ribs 67 are formed on the inner peripheral face of the bracket section 3 for preventing rotation of the plug section 23 by engaging with the lugs 66 of the locking ring 63 which is fitted to the plug section 23. As a result, loosening from the threaded aperture 4 of the reusable plug section 23 which is removable by threading into the threaded aperture 4 of the bracket section 3, is prevented so that leaking of the liquid inside the container 1 from a loosened part is prevented.

Abstract: There is provided a plug 13 for a fluid pipe connector 11 for connecting fluid pipes to each other or for connecting a fluid pipe to a storage tank or a processing unit. The plug 13 for fluid pipe connector comprises: a plug portion 61; a fixed plate portion 87 which is formed on a fluid pipe 60; a fixing portion 78 for sandwiching the fixed plate portion 87 between the fixing portion 78 and the end portion of the plug portion 61 to fix and support the fixed plate portion 87; a cylindrical supporting portion 80 which is integrally provided on the fixing portion 78 for gently supporting thereon the fluid pipe 60; and a fixing nut for covering and fixing the plug portion 61 and the fixing portion 78. Between the fixing portion 78 and the cylindrical supporting portion 80, the engaged surface 79 for a lock lever 52 is provided. On the tip end of the plug portion 61, a valve 62 is provided for pushing a valve 20 of a member, which is to be connected to the plug 13, to establish a fluid communication.

Abstract: The object of this invention is to improve safety by preventing the leakage of liquid caused by the internal pressure of a container. A liquid path plug in which a pipe is provided in the lid section of the plug, and a gas path plug which does not have a pipe are attached to openings of the container. The engaging groove section is formed on the end surface of the liquid path cap which closes the through hole provided in the liquid path plug section of the liquid path plug. The engaging protrusion section and the engaging hole section are formed on the end surface of the gas path cap which is provided in the gas path plug section of the gas path plug and closes the through hole. The gas path cap is detached by engaging the engaging pin of the detaching fixture on the engaging hole section of the gas path cap and by turning the gas path cap.

Abstract: A connector 20 comprises a plug 21 fitted to an opening 2 formed in a container 1, and a socket 22 which is connected to the plug 21. The plug 21 comprises a bracket section 3 which is fitted into the opening 2 of the container 1, and a plug section 23 which is screwed into a threaded aperture 4 formed in the bracket section 3. An annular locking ring 63 formed with lugs 66 on the outer periphery is integrally but removably fitted to the plug section 23 which is threadedly attached to the threaded aperture 4. A plurality of engaging ribs 67 are formed on the inner peripheral face of the bracket section 3 for preventing rotation of the plug section 23 by engaging with the lugs 66 of the locking ring 63 which is fitted to the plug section 23.

Abstract: The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective light intensity distribution is nonlinear to the intensity of incident exposure light. Further, multiple exposure is made with plural patterns having a certain lateral shift therebetween, or multiple exposure is made with shifting the position of an identical pattern, whereby multiple exposure is effected with patterns different in intensity distribution on the photosensitive material. A high-resolution pattern can be formed over the resolution limit of projection optical system by the above arrangement.