Patents by Inventor Toshihiko Ryo

Toshihiko Ryo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230120376
    Abstract: A plating apparatus (10) is disclosed including a plating tank (9), cathodes (1a to 1f), a holding mechanism (2), at least one anode (3), and a rotation mechanism (4). The plating tank (9) contains an annularly or helically wound substrate (90) together with a plating solution. The cathodes (1a to 1f) are placed inside the plating tank (9). The holding mechanism (2) holds the cathodes (1a to 1f) at positions electrically connected to the outer periphery of the substrate (90) and holds the substrate (90) via the cathodes (1a to 1f). The anode (3) is placed at least on the inner periphery side of the substrate (90) held by the holding mechanism (2). The rotation mechanism (4) rotates at least either the substrate (90) and cathodes (1a to 1f) held by the holding mechanism (2) or the anode (3), or both, around the axis of the wound substrate (90).
    Type: Application
    Filed: August 6, 2021
    Publication date: April 20, 2023
    Applicants: TEIKOKU ION CO., LTD, NATIONAL INSTITUTES FOR QUANTUM SCIENCE AND TECHNOLOGY, OKAZAKI MANUFACTURING COMPANY
    Inventors: Takashi Nakamura, Takuya Kawawaki, Mitsuhiko Terashita, Masahiko Hirakami, Masafumi Hojo, Ryosuke Nakamura, Masao Ishikawa, Taketo Nishikawa, Toshihiko Ryo