Patents by Inventor Toshihiko Sakuhara
Toshihiko Sakuhara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6589402Abstract: A part fabricating apparatus has a holder for holding an object to be machined immersed in an electrolytic solution. A machining electrode subjects a surface of the object to an electrochemical reaction to electrolytically machine the surface of the object. The machining electrode has a sharp-edged tip and is coated with an insulator except for the sharp-edged tip. A spacing changing unit detects and changes a spacing between the surface of the object and the machining electrode. A potential/current control unit controls a potential/current on the machining electrode. An electrolytic solution changing unit supplies a first electrolytic solution for subjecting the surface of the object to be machined to a removal process to fabricate a cast mold, supplies a second electrolytic solution for depositing a first metal on a surface of the cast mold to form a first metal layer, and supplies a third electrolytic solution for depositing a second metal inside the cast mold to form a part.Type: GrantFiled: January 19, 2001Date of Patent: July 8, 2003Assignee: Seiko Instruments Inc.Inventors: Reiko Irie, Masayuki Suda, Toshihiko Sakuhara, Tatsuaki Ataka
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Patent number: 6469421Abstract: A piezoelectric device having improved characteristics is accomplished by restricting degradation and variance of vibration characteristics resulting from an adhesive, and a production process is simplified. The piezoelectric device has a construction in which a ultra-fine particle layer made of substantially the same main component and having the same crystal structure as those of a piezoelectric layer is formed on a substrate, and the piezoelectric layer is formed on the ultra-fine particle layer.Type: GrantFiled: October 25, 1999Date of Patent: October 22, 2002Assignee: Seiko Instruments Inc.Inventors: Mari Wakabayashi, Masataka Shinogi, Toshihiko Sakuhara
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Publication number: 20010002001Abstract: A machining solution for removal-machining an object to be machined 103 is introduced to an inside of a machining solution container 101, and a predetermined voltage is applied to between the machining electrode 104 and the object to be machined 103 to cause electrochemical reaction thereby fabricating a part cast mold. Then the machining solution is changed to a machining solution for metal layer formation to effect additional machining on a surface of the cast mold, forming a metal layer. Then the machining solution is changed to a machining solution for part formation to effect additional machining inside the cast mold, forming a part. Finally the machining solution is changed to a machining solution for dissolving metal layer to dissolve the metal layer to taking out the inside part, fabricating a part.Type: ApplicationFiled: January 19, 2001Publication date: May 31, 2001Inventors: Reiko Irie, Masayuki Suda, Toshihiko Sakuhara, Tstsuaki Ataka
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Patent number: 6221228Abstract: A part fabricating method comprises the steps of machining an object to fabricate a part cast mold, depositing a first metal on a surface of the cast mold to form a first metal layer, and depositing a second metal different in kind from the first metal inside the cast mold to form a part. The first metal layer is then selectively removed to take out the part formed inside the cast mold.Type: GrantFiled: December 2, 1998Date of Patent: April 24, 2001Assignee: Seiko Instruments Inc.Inventors: Reiko Irie, Masayuki Suda, Toshihiko Sakuhara, Tatsuaki Ataka
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Patent number: 6215121Abstract: A signal having a resonant frequency of a cantilever is output by a first oscillator, and supplied to a vibrating element and a control unit to oscillate a probe. A low frequency signal having a large amplitude is output by a second oscillator and supplied to a piezoelectric scanning apparatus. The probe is periodically and relatively moved with respect to the sample between a position where the sample surface is penetrated by the probe and another position where the probe does not penetrate the sample surface and is outside the range of atomic forces caused by the sample. During this movement, the probe movement may be analyzed to obtain a plurality of physical characteristics about the sample, e.g.Type: GrantFiled: July 29, 1998Date of Patent: April 10, 2001Assignee: Seiko Instruments Inc.Inventors: Masamichi Fujihira, Masatoshi Yasutake, Tatsuya Miyatani, Toshihiko Sakuhara, Kazutoshi Watanabe
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Patent number: 6059954Abstract: An electrochemical machining method in which a work piece and a machining electrode are opposed to each other and dipped in an electrolyte solution, and a surface of the work piece is machined by causing an electrolytic reaction between the surface of the work piece and a tip of the machining electrode in a state where a separating distance between the surface of the work piece and the tip of the machining electrode is adjusted and a desired separating distance is maintained, wherein a zero contact reference position where the surface of the work piece and the tip of the machining electrode are brought into contact with each other and the separating distance between the work piece and the machining electrode is nullified is electrically detected, moving distances of the work piece and the machining electrode from the zero contact reference position are detected, a relative separating distance between the surface of the work piece and the tip of the machining electrode is calculated based on a result of the deType: GrantFiled: March 25, 1998Date of Patent: May 9, 2000Assignee: Seiko Instruments Inc.Inventors: Masayuki Suda, Toshihiko Sakuhara, Tatsuaki Ataka
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Patent number: 6046053Abstract: A process is disclosed for sequencing proteins or peptides from the C-terminal end. The process comprises the steps of reacting the peptide or protein with an alkyl acid anhydride to convert the carboxy-terminal thereof into oxazolone, liberating the C-terminal amino acid by reaction with acid and alcohol or with ester, and identifying the liberated amino acid or amino acid derivative.Type: GrantFiled: May 23, 1997Date of Patent: April 4, 2000Assignee: Seiko Instruments Inc.Inventors: Akira Tsugita, Keiji Takamoto, Tatsuaki Ataka, Toshihiko Sakuhara, Toyoaki Uchida
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Patent number: 5962642Abstract: A protein or peptide which has an amino-terminus serine or threonine which has an acetylated alpha-amino group is allowed to react with an acid, and then allowed to react with an isothiocyanate under acidic conditions to thereby obtain a thiocarbamyl compound. Then the compound is to be analyzed using Edman degradation. Analysis can be performed with fewer operation steps and without using enzymes.Type: GrantFiled: May 9, 1997Date of Patent: October 5, 1999Assignee: Seiko Instruments Inc.Inventors: Akira Tsugita, Keiji Takamoto, Tatsuaki Ataka, Toshihiko Sakuhara, Toyoaki Uchida
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Patent number: 5885434Abstract: A method for performing fine working of a material by electrochemical reaction comprises a two-step scanning operation in which a surface topography of the material is obtained during a first scan which is used to control the position of a probe during a second scan in which an electrochemical reaction is performed. During the first scan, an electrochemical cell is constructed with a four-electrode system, including the probe, a material to be worked, a reference electrode and a counter electrode. The potential of each of the probe and the material to be worked is set so that no electrochemical reaction occurs during the first scan. Data representative of the surface topography is stored and used to control the position of the probe during the second scan in which an electrochemical cell is constructed with a three-electrode system, including the probe, the material, and the reference electrode.Type: GrantFiled: April 1, 1997Date of Patent: March 23, 1999Assignee: Seiko Instruments Inc.Inventors: Masayuki Suda, Toshihiko Sakuhara, Tatsuaki Ataka
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Patent number: 5650043Abstract: A silicon substrate is etched by dipping it in a NH.sub.4 F solution while charging it with a potential more negative than an open-circuit potential. The NH.sub.4 F solution preferably has NH.sub.4 F concentration of 10M or less. The potential applied to the silicon substrate is controlled within the range of from the open-circuit potential to a more negative potential by -1.5 V vs. SCE. Since the etched silicon substrate has flatness in atomic order, it is suitable for the precise fabrications to manufacture high-density ir high-functional semiconductor devices.Type: GrantFiled: May 25, 1995Date of Patent: July 22, 1997Assignees: Research Development Corporation of Japan, Kazutoshi Kaji, Toshihiko SakuharaInventors: Kazutoshi Kaji, Shueh Lin Yau, Kingo Itaya, Toshihiko Sakuhara
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Patent number: 5510224Abstract: A photosensitive microcapsule which contains a polymerizable monomer and a polymerization initiator has increased sensitivity due to the displacement of soluble water in the monomer photosensitive microcapsule comprises a polymerizable monomer contained in a microcapsule; a photopolymerization initiator comprising a hydrophobic sensitizer for initiating polymerization of the polymerizable monomer in response to incident light energy; and an image producing material such as a dye or a precursor; wherein the hydrophobic sensitizer includes at least one of 3,7-bis (octadecylmethylamino) phenothiazoniumchloride which reacts on a red color light energy, 3,7-di(octadecylmethylamino)-5-phenylphenaziniumchloride which reacts on a green color light energy, and 3,6-di(octadecylmethylamino)-acridinechloride which reacts on a blue color light energy.Type: GrantFiled: October 6, 1993Date of Patent: April 23, 1996Assignee: Seiko Instruments Inc.Inventors: Hiroshi Takahashi, Toshihiko Sakuhara, Fumiharu Iwasaki
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Patent number: 5366613Abstract: An electrochemical fine processing method for forming a pattern of a substance having different etching resistance against an etching solution from that of an article by bringing the minute forward end of the counter electrode close to the surface of the article. The counter electrode is applied a predetermined electric potential and the electrochemical reaction is repeating in a minute region of the article in the vicinity of the counter electrode to form an optional pattern. After forming the pattern, the article is etched in an etching solution having a property of different etching rate for the pattern forming portion and a portion other than the pattern forming portion. It become possible to form a fine pattern directly onto the surface of an article to be processed having surface unevenness.Type: GrantFiled: March 29, 1993Date of Patent: November 22, 1994Assignee: Seiko Instruments Inc.Inventors: Masayuki Suda, Toshihiko Sakuhara, Masataka Shinogi, Fumiharu Iwasaki, Akito Ando
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Patent number: 5344539Abstract: An electrochemical fine processing apparatus for electrochemically performing an adding processing and a removing processing of a substance such as a metal or a polymer in a solution in order to produce a structure having a high aspect ratio. Removing electrodes for applying an electric potential opposite to that applied to an addition electrode are disposed around the addition electrode, whereby an excess portion of metal or polymer film pattern can be scraped electrochemically. In addition, alternate electric potential pulses are applied successively to the addition electrode and then to the removing electrodes. It becomes possible to form on the support a structure with sharp pattern edge portions and a high aspect ratio.Type: GrantFiled: March 29, 1993Date of Patent: September 6, 1994Assignee: Seiko Instruments Inc.Inventors: Masataka Shinogi, Toshihiko Sakuhara, Masayuki Suda, Fumiharu Iwasaki, Akito Ando
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Patent number: 5292458Abstract: A method of producing a photosensitive microcapsule which contains a polymerizable monomer and a polymerization initiator. Soluble water is displaced in the polymerizable monomer by performing one or both of distilling the polymerizable monomer and adding a dehydrating agent to the polymerizable monomer. The polymerization initiator and a first microcapsule-forming material are added to the water-displaced polymerizable monomer to produce a solution. Soluble oxygen in the polymerizable monomer is displaced by performing one or both of bubbling an inert gas and adding an oxygen absorbent to the polymerizable monomer. Soluble oxygen may also be displaced in an ionic surfactant by performing the bubbling and adding of oxygen absorbent. The ionic absorbent is added to the solution containing the polymerizable monomer and polymerization initiator, and then the solution is emulsified. A microcapsule membrane is produced by adding a second microcapsule-forming material to the emulsion.Type: GrantFiled: April 9, 1991Date of Patent: March 8, 1994Assignee: Seiko Instruments Inc.Inventors: Hiroshi Takahashi, Toshihiko Sakuhara, Fumiharu Iwasaki
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Patent number: 5288382Abstract: An optical fine processing apparatus for forming a structure having a high aspect ratio even on a workpiece having high heat conductivity. Light, such as a laser beam, is irradiated onto the workpiece in an electrolytic solution through a light guide to deposit a substance such as a metal or a polymer. A plurality of removal electrodes are allowed to have an electric potential for removing a part of the deposited substance. The removal electrodes are disposed in a rotation ring which is rotatable about the optical axis of the irradiating light onto the sample so as to adjust the width of a predetermined pattern to be scraped by changing the rotation angle of the removal electrodes with respect to the optical axis. By scanning the light guide and the removing electrodes above the workpiece surface, it is possible to form any desired pattern on the workpiece.Type: GrantFiled: March 29, 1993Date of Patent: February 22, 1994Assignee: Seiko Instruments, Inc.Inventors: Masataka Shinogi, Toshihiko Sakuhara, Masayuki Suda, Fumiharu Iwasaki, Akito Ando
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Patent number: 5258107Abstract: In a method of making a cantilever for atomic force micoscopes, to provide a method of manufacturing a high-resolution cantilever having a sharpened metal needle by introducing an electrolytic polishing process. In the method of making a cantilever, an erect metal structure, an electrode layer and an electric insulation layer are formed, and they are subjected to the electrolytic polishing process to allow a large number of erect metal structures formed on a silicon wafer to be formed into sharpened metal needles at a time. The cantilever having a sharpened metal needle manufactured by the method of this invention makes it possible to measure with high resolution specimen surface with deep grooves and holes and high projections that cannot be measured by the conventional cantilever having a pyramidal needle.Type: GrantFiled: May 20, 1992Date of Patent: November 2, 1993Assignee: Seiko Instruments Inc.Inventors: Hitoshi Yoshida, Toshihiko Sakuhara, Katsunori Honma
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Patent number: 4969978Abstract: Apparatus and method for tunnel current measurement observed simultaneously with electrochemical measurement using an electrochemical cell. The electrochemical cell holds a tip, a counter electrode, a reference electrode and a sample in a solution. In the electrochemical cell, a tunnel current flowing between a sample and the tip is detected while controlling the electrode potential of the sample in a solution for electrochemical measurement. The detected tunnel current is represented as the surface image of the sample during electrochemical reaction.Type: GrantFiled: November 23, 1988Date of Patent: November 13, 1990Assignee: Seiko Instruments Inc.Inventors: Eisuke Tomita, Toshihiko Sakuhara, Kingo Itaya
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Patent number: 4962480Abstract: An output section comprising a needle which has a fine tip portion. A data stored in a memory is read out by applying electrical stimulation between the tip portion of the needle and the memory. A memory reading apparatus enables non-contact reading on an atomic or molecular scale.Type: GrantFiled: September 12, 1988Date of Patent: October 9, 1990Assignee: Seiko Instruments, Inc.Inventors: Manabu Ooumi, Toshihiko Sakuhara, Tatsuaki Ataka
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Patent number: 4945515Abstract: An input section comprising a needle which has a fine tip portion. A data is written in a memory by applying electrical stimulation between the tip portion of the needle and the memory. A memory writing apparatus enables non-contact recording on an atomic or molecular scale.Type: GrantFiled: September 12, 1988Date of Patent: July 31, 1990Assignee: Seiko Instruments, Inc.Inventors: Manabu Ooumi, Toshihiko Sakuhara, Tatsuaki Ataka
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Patent number: 4837435Abstract: The tunneling scanning microscope which is provided with a light source to irradiate a sample with light, particularly with light having one wavelength. The apparatus is used for the investigation of the surface structure of materials which have very low conductivity but increase their conductivities under light irradiation. In particular, the apparatus selectively provides an atomic image of an element of a compound in response to a selected wavelength.Type: GrantFiled: June 24, 1988Date of Patent: June 6, 1989Assignee: Seiko Instruments Inc.Inventors: Toshihiko Sakuhara, Fumiki Sakai, Tetsuo Uchiyama