Patents by Inventor Toshihiko Yawata

Toshihiko Yawata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8039532
    Abstract: A compound represented by formula (I-1): wherein R21, R22, R23 and R24 each independently represent a hydrogen atom or a monovalent substituent, with the proviso that compounds, in which R21, R22, R23 and R24 each are an alkylthio group, are excluded; R21 and R22 and/or R23 and R24 each may bond to each other to form a ring, with the proviso that compounds, in which the formed ring is a dithiol ring or a dithiolane ring, are excluded; R25 and R26 each independently represent a hydrogen atom or a monovalent substituent; X21, X22, X23 and X24 each independently represent a hetero atom; compounds, wherein R21, R22, R23 and R24 each represent a cyan group; X21, X22, X23 and X24 each represent a sulfur atom; and R25 and R26 each represent a hydroxyl group or a hydrogen atom, are excluded; and compounds, wherein R21 and R23 each represent a hydrogen atom; R22 and R24 each represent an arylcarbonyl group; X21, X22, X23 and X24 each represent a sulfur atom; and R25 and R26 each represent a hydroxyl group, are e
    Type: Grant
    Filed: August 15, 2008
    Date of Patent: October 18, 2011
    Assignee: Fujifilm Corporation
    Inventors: Naoyuki Hanaki, Masuji Motoki, Toshihiko Yawata
  • Publication number: 20110059033
    Abstract: An object of the invention is to provide an ultraviolet absorbing composition for a skin and hair, which has absorption of high absorbance in both UV-A region and UV-B region, wherein an ultraviolet absorbing compounds in the ultraviolet absorbing composition will not precipitate or turn to yellow in the process of preparing cosmetics. Moreover, the ultraviolet absorbing composition shows excellent feeling in use, and will not dye clothes easily, and may be applied to the skin and hair of a living object, and exhibits excellent capability of absorbing an ultraviolet light. The ultraviolet absorbing composition for skin and hair, which comprises the ultraviolet absorbing compound represented by formula (1) and at least one ultraviolet absorbing compound selected from the group consisting of formulae (I) to (V). (In formula (1), Y11 and Y12 each independently represents monovalent substituent.
    Type: Application
    Filed: September 3, 2010
    Publication date: March 10, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Takashi Kitagawa, Toshihiko Yawata, Youichirou Takeshima, Keizo Kimura
  • Patent number: 7884146
    Abstract: A polymer material, containing at least one kind of polymer substance selected from the group consisting of acrylic acid-based polymers, polyester-based polymers, and polycarbonate-based polymers; and a compound represented by formula (2) contained in the polymer substance: wherein A21 and A22 each independently represent an atom other than hydrogen atom and carbon atom; Y21 and Y22 each independently represent a hydrogen atom or a monovalent substituent; at least one of Y21 and Y22 represents a substituent having a Hammett substituent constant ?p of 0.2 or more; Y21 and Y22 may bind to each other to form a ring; and (B) represents a group of atoms necessary for forming a five- or six-membered ring with A21, A22 and the carbon atom.
    Type: Grant
    Filed: February 20, 2008
    Date of Patent: February 8, 2011
    Assignee: Fujifilm Corporation
    Inventors: Toshihiko Yawata, Naoyuki Hanaki, Hisashi Mikoshiba, Akihiro Kaneko
  • Publication number: 20100210762
    Abstract: A compound represented by formula (I-1): wherein R21, R22, R23 and R24 each independently represent a hydrogen atom or a monovalent substituent, with the proviso that compounds, in which R21, R22, R23 and R24 each are an alkylthio group, are excluded; R21 and R22 and/or R23 and R24 each may bond to each other to form a ring, with the proviso that compounds, in which the formed ring is a dithiol ring or a dithiolane ring, are excluded; R25 and R26 each independently represent a hydrogen atom or a monovalent substituent; X21, X22, X23 and X24 each independently represent a hetero atom; compounds, wherein R21, R22, R23 and R24 each represent a cyan group; X21, X22, X23 and X24 each represent a sulfur atom; and R25 and R26 each represent a hydroxyl group or a hydrogen atom, are excluded; and compounds, wherein R21 and R23 each represent a hydrogen atom; R22 and R24 each represent an arylcarbonyl group; X21, X22, X23 and X24 each represent a sulfur atom; and R25 and R26 each represent a hydroxyl group, are e
    Type: Application
    Filed: August 15, 2008
    Publication date: August 19, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Naoyuki Hanaki, Masuji Motoki, Toshihiko Yawata
  • Publication number: 20100130638
    Abstract: An ultraviolet absorbent composition, containing an ultraviolet absorbent represented by formula (2) or (B-I), and a compound represented by formula (TS-I) or (TS-II): wherein A21, A22 and XB1 to XB4 represent a hetero atom; Y21, Y22, RB1 to RB6, R91 to R96, R101 to R104 and X101 represent a hydrogen atom or a substituent; at least one of Y21 and Y22 represents a substituent having a Hammett substituent constant of 0.2 or more; and (B) represents a group of atoms necessary for forming a five- or six-membered ring; —X91- represents —O—, —S—, or —N(—R100)-, in which R100 has the same meaning as R91; all of R91 to R96 and R100 cannot simultaneously represent a hydrogen atom, respectively, and the total number of carbon atoms is 10 or more; and X102 represents a group of hetero atoms necessary for forming a 5- to 7-membered ring.
    Type: Application
    Filed: March 31, 2008
    Publication date: May 27, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Naoyuki Hanaki, Toshihiko Yawata
  • Publication number: 20100105814
    Abstract: An ultraviolet absorbent, containing a compound represented by formula (1): wherein X1 and X2 each are an oxygen atom, a sulfur atom, or —NR16—; R11, R12, R13, R14, R15 and R16 each are a hydrogen atom or a monovalent substituent.
    Type: Application
    Filed: October 27, 2009
    Publication date: April 29, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Akihiro KANEKO, Toshihiko Yawata, Yoshihiko Fujie
  • Publication number: 20100076124
    Abstract: A polymer material, containing at least one kind of polymer substance selected from the group consisting of acrylic acid-based polymers, polyester-based polymers, and polycarbonate-based polymers; and a compound represented by formula (2) contained in the polymer substance: wherein A21 and A22 each independently represent an atom other than hydrogen atom and carbon atom; Y21 and Y22 each independently represent a hydrogen atom or a monovalent substituent; at least one of Y21 and Y22 represents a substituent having a Hammett substituent constant ?p of 0.2 or more; Y21 and Y22 may bind to each other to form a ring; and (B) represents a group of atoms necessary for forming a five- or six-membered ring with A21, A22 and the carbon atom.
    Type: Application
    Filed: February 20, 2008
    Publication date: March 25, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Toshihiko Yawata, Naoyuki Hanaki, Hisashi Mikoshiba, Akihiro Kaneko
  • Publication number: 20100025642
    Abstract: An ultraviolet absorbent composition, containing: at least one kind of ultraviolet absorbent A having an absorption maximum wavelength of from 350 nm to 400 nm, a half value width of 55 nm or less and a molar extinction coefficient of 20,000 or more at the absorption maximum wavelength; and at least one kind of ultraviolet absorbent B having an absorption maximum wavelength of 350 nm or less and showing 30% or more of absorbance at 320 nm of the absorbance at the absorption maximum wavelength.
    Type: Application
    Filed: February 20, 2008
    Publication date: February 4, 2010
    Inventors: Naoyuki Hanaki, Toshihiko Yawata, Hisashi Mikoshiba
  • Publication number: 20090240067
    Abstract: A method of producing a compound represented by formula (1), including: allowing 1,4-benzoquinone or 1,2-benzoquinone to react with a dithiocarbamate compound represented by formula (2) in a polar solvent: wherein R1 and R2 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R1 and R2 may be the same or different and may be combined with each other to form a ring, X represents an ion necessary to neutralize the charge of the molecule, m represents an integer of 1 to 2, n represents an integer of 1 to 2, M represents a hydrogen atom, a metal atom or a conjugate acid of a base, p represents an integer of 1 to 4, and q represents an integer of 1 to 4.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 24, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Masuji Motoki, Toshihiko Yawata, Naoyuki Hanaki, Tomoaki Nakamura