Patents by Inventor Toshihiro Fujii
Toshihiro Fujii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6559443Abstract: An ionization apparatus and ionization method, wherein an ion trap type structural unit is used as the ion source and an ion emitter for emitting metal ions is provided inside or outside the ion source, metal ions are attached to ingredients of a sample gas to ionize the sample gas, a separation parameter is changed to separate ions relating to a target substance for analysis and the metal ions, the metal ions are trapped and accumulated inside the ion source, and the ions relating to a target substance are ejected to a mass spectrometry unit. Due to this configuration, in ion mass spectrometry, it is possible to accurately separate the ions desired to be analyzed and the ions desired to be trapped by a simple configuration and relatively low resolution and possible to improve the sensitivity of analysis.Type: GrantFiled: November 5, 2001Date of Patent: May 6, 2003Assignee: Anelva CorporationInventors: Yoshiro Shiokawa, Megumi Nakamura, Yoshiki Hirano, Toshihiro Fujii
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Patent number: 6507020Abstract: A mass spectrometry apparatus is provided with an emitter for emitting metal ions, a reaction chamber where the detected gas is introduced and ionized by the metal ions, an aperture for guiding molecules of the ionized detected gas, and a mass spectrometer for measuring the guided molecules. The metal ions emitted from the emitter are caused to fly to the reaction chamber to ionize said detected gas. The detected gas is a halide compound. Further provision is made of a sample gas source for feeding a halide compound to the reaction chamber and an N2 gas source for feeding to the reaction chamber a gas (N2 etc.) to which the metal ions attach less easily than to the halide compound. It is therefore made possible to apply cation attachment of the Fujii system to mass spectrometry of a halide compound and enable precise measurement of fluoride compounds etc. having a large impact on global warming.Type: GrantFiled: December 15, 2000Date of Patent: January 14, 2003Assignee: Anelva CorporationInventors: Yoshiro Shiokawa, Toshihiro Fujii
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Patent number: 6479814Abstract: An ion source of an ion attachment mass spectrometry apparatus has an emitter and a voltage-impressed portion for impressing a bias voltage to the emitter. In the ion source, the emitter is heated to emit positive charge metal ions that are attached to a detected gas to ionize it. By changing the material of the emitter, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced. By shortening the distance between the reference-voltage-impressed portion and the ion emission point, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced to not more than 1010&OHgr;. It is also possible to form a thin film emitter on the surface of the reference-voltage-impressed portion.Type: GrantFiled: March 23, 2001Date of Patent: November 12, 2002Assignee: Anelva CorporationInventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
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Publication number: 20020139930Abstract: An ionization apparatus according to the present invention has a mechanism for causing metal ions emitted from an ion emitter to attach to an introduced target gas so as to generate ions of the sample gas and emits the ions of the sample gas to a mass spectrometer. The mass spectrometer has a zone in which one or both of an electric field and magnetic field are formed. As the electrode for causing the generation of cleaning plasma in the ionization zone generating the ions of the sample gas, the ion emitter is used. The ion emitter causes the generation of plasma in connection with a hollow vessel and removes deposits on components facing the ionization zone by the plasma. The plasma cleaning process is performed consecutively at a suitable timing after the ionization process. Due to the above configuration, deteriorated performance in ionization can be restored in a short time, a memory effect can be prevented, and accurate mass spectrometry becomes possible.Type: ApplicationFiled: March 22, 2002Publication date: October 3, 2002Applicant: ANELVA CORPORATIONInventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
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Publication number: 20020084408Abstract: An apparatus for ion attachment mass spectrometry provided with an ion emitter for emitting positively charged metal ions, an ionization chamber for causing attachment of the metal ions to a gas to be detected, a third component gas introduction mechanism for introducing a third component gas into the ionization chamber, and a mass spectrometer for mass separation and detection of the detected gas with the metal ions attached. The third component gas introduction mechanism is provided with three types of third component gases and selectively introduces one type of third component gas from the three types of third component gases. Due to this, the occurrence of interference peaks due to macromers of third component gases with each other, macromers of third component gases and high concentration ingredients, etc. is prevented and accurate mass analysis made possible.Type: ApplicationFiled: December 21, 2001Publication date: July 4, 2002Applicant: ANELVA CORPORATIONInventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
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Publication number: 20020053636Abstract: An ionization apparatus and ionization method, wherein an ion trap type structural unit is used as the ion source and an ion emitter for emitting metal ions is provided inside or outside the ion source, metal ions are attached to ingredients of a sample gas to ionize the sample gas, a separation parameter is changed to separate ions relating to a target substance for analysis and the metal ions, the metal ions are trapped and accumulated inside the ion source, and the ions relating to a target substance are ejected to a mass spectrometry unit. Due to this configuration, in ion mass spectrometry, it is possible to accurately separate the ions desired to be analyzed and the ions desired to be trapped by a simple configuration and relatively low resolution and possible to improve the sensitivity of analysis.Type: ApplicationFiled: November 5, 2001Publication date: May 9, 2002Applicant: ANELVA CORPORATIONInventors: Yoshiro Shiokawa, Megumi Nakamura, Yoshiki Hirano, Toshihiro Fujii
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Publication number: 20020036263Abstract: A mass spectrometry apparatus is provided with a mass spectrometry mechanism for analyzing the mass of ionized detected gas. The mass spectrometry apparatus is further provided with two ion sources, that is, a first ion source for attaching positive charge metal ions to cause ionization, and a second ion source for causing electrons to impact to cause ionization. Based on the configuration, it becomes possible to simultaneously or separately measure the molecular weight and analyze the molecular structure of the detected gas with a high sensitivity. The second ion source is positioned between the first ion source and the mass spectrometry mechanism and the detected gas is introduced into the first ion source. According to the above mass spectrometry apparatus, it is possible to measure the accurate molecular weight of the detected gas with a sufficient sensitivity and to simultaneously analyze the molecular structure with a sufficient sensitivity.Type: ApplicationFiled: March 23, 2001Publication date: March 28, 2002Applicant: ANELVA CORPORATIONInventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
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Publication number: 20020020813Abstract: Metal ions are attached to a sample gas in an ionization chamber to produce ions of the sample gas. The ions of the sample gas pass through a mass spectrometer formed by an electromagnetic field for separation by mass. The mass separated ions of the sample gas are detected and measured by a detector as an ion current. Further, a metal ion emitter for emitting metal ions is arranged at the upstream side of a region controlled to a reduced pressure atmosphere where the flow of gas becomes viscous, a sample gas inflow part for introducing the sample gas to the downstream side where the metal ions are transported, and the sample gas ionized by attachment of the metal ions passes through the opening of the aperture plate and transported to the mass spectrometer. A second gas inflow part is arranged at the upstream side of the metal ion producing region. A second gas supplied by the second inflow part flows through the metal ion producing region and sample gas ionization region.Type: ApplicationFiled: August 8, 2001Publication date: February 21, 2002Applicant: Anelva CorporationInventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
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Publication number: 20010048074Abstract: An apparatus for ion attachment mass spectrometry provided with a reaction chamber for causing positively charged metal ions to attach to a gas to be detected; a mass spectrometer for mass separation and detection of the detection gas; an analysis chamber in which the mass spectrometer is placed; differential evacuation chambers for connecting the reaction chamber and analysis chamber; a data processor for receiving and processing the mass signal from the mass spectrometer; and vacuum gauges for measuring the total pressure of the reduced pressure atmosphere of the reduced pressure atmosphere reaction chamber, a differential evacuation chamber, and an analysis chamber. The total pressure signal from the vacuum gauge measured during the measurement is input to one of the data processor, introduction mechanism, and evacuation mechanism.Type: ApplicationFiled: June 1, 2001Publication date: December 6, 2001Applicant: ANELVA CORPORATIONInventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
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Publication number: 20010023922Abstract: An ion source of an ion attachment mass spectrometry apparatus has an emitter and a voltage-impressed portion for impressing a bias voltage to the emitter. In the ion source, the emitter is heated to emit positive charge metal ions that are attached to a detected gas to ionize it. By changing the material of the emitter, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced. By shortening the distance between the reference-voltage-impressed portion and the ion emission point, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced to not more than 1010&OHgr;. It is also possible to form a thin film emitter on the surface of the reference-voltage-impressed portion.Type: ApplicationFiled: March 23, 2001Publication date: September 27, 2001Applicant: ANELVA CORPORATIONInventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
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Publication number: 20010004102Abstract: A mass spectrometry apparatus is provided with an emitter for emitting metal ions, a reaction chamber where the detected gas is introduced and ionized by the metal ions, an aperture for guiding molecules of the ionized detected gas, and a mass spectrometer for measuring the guided molecules. The metal ions emitted from the emitter are caused to fly to the reaction chamber to ionize said detected gas. The detected gas is a halide compound. Further provision is made of a sample gas source for feeding a halide compound to the reaction chamber and an N2 gas source for feeding to the reaction chamber a gas (N2 etc.) to which the metal ions attach less easily than to the halide compound. It is therefore made possible to apply cation attachment of the Fujii system to mass spectrometry of a halide compound and enable precise measurement of fluoride compounds etc. having a large impact on global warming.Type: ApplicationFiled: December 15, 2000Publication date: June 21, 2001Inventors: Yoshiro Shiokawa, Toshihiro Fujii
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Patent number: 5682410Abstract: A method for determining the core flow rate from pump differential pressure method equations and a heat balance equation for determining the temperature and density of the reactor water in the downcomer and lower plenum region. The measured reactor water temperature is used only as an initial estimate for this new method. This allows the first estimate of the core flow to be determined based upon the reactor water density that corresponds to this temperature and the pump differential pressure and pump rotational speed measurements. Then, with this intial core flow measurement value, and other available plant measurements and assumed nominal values for the heat balance equation, revised values for the reactor water temperature and density can be calculated. Using a standard numerical method, such as the successive approximation technique, a more accurate estimate for the reactor water density can be obtained.Type: GrantFiled: October 17, 1995Date of Patent: October 28, 1997Assignee: General Electric CompanyInventors: Joseph Alva McGrady, Heung Tae Kim, Toshihiro Fujii
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Patent number: 5283265Abstract: A photopolymerizable rubber being obtained by copolymerizing four compounds consisting of a dienic liquid rubber having hydroxyl groups, an ethylenically unsaturated monomer having hydroxyl groups, a dihydric alcohol having a molecular weight of less than 2,000 and a diisocyanate compound. The photocured product of this composition has higher tensile strength and elongation than that of the prior photopolymerizable rubbers.Type: GrantFiled: April 18, 1988Date of Patent: February 1, 1994Assignee: Hayakawa Rubber Company LimitedInventors: Tetsuya Kimura, Syuno Suto, Fujii Toshihiro, Toshihiro Fujii, Kimio Mori, Tsuguo Yamaoka
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Patent number: 5200438Abstract: An excellent ultraviolet ray-curable ink for printing which shrinks little at the time of curing, and exhibits high adhesion, followability, aging-crack resistance, elasticity, elongation, tenacity, chemical resistance, and a scratch resistant property, by a novel ultraviolet ray-curable ink comprising by weight; 100 parts of an ultraviolet ray-curable rubbery copolymer having the general formula ##STR1## wherein R represents an alkylene group having 2-8 carbon atoms, R.sub.1 is H or CH.sub.3, R.sub.2 is a residue of diisocyanate, R.sub.3 is a residue of dihydric alcohol from which at least one or more hydroxyl group is removed, X is a moiety of dienic liquidus rubber having at least one or more hydroxyl groups from which at least one or more hydroxyl groups is removed, l is a number of 1-4, m is a number of 1.0<m<3.Type: GrantFiled: December 30, 1991Date of Patent: April 6, 1993Assignee: Hayakawa Rubber Co., Ltd.Inventors: Toshihiro Fujii, Hiroki Nii, Makoto Ikeda, Masao Etori, Ban Tanaka
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Patent number: 5185234Abstract: The disclosed photosensitive flexographic printing plate composition is to impart a soft printing plate by rubber compounding photosensitive resin which comprises(A) 5-50 wt % of a photopolymerizable prepolymer consisting essentially of a component having the general formula ##STR1## where, R is an alkylene group or polyoxyalkylene group having 2-8 carbons, R.sub.1 is an H or CH.sub.3 group, R.sub.2 and R.sub.3 are diisocyanate residues, R.sub.4 is a portion excluding a hydroxyl group of dienic liquid rubber having a hydroxyl group of dihydric alcohol having less than 2000 molecular weight of the general formula ##STR2## where, R.sub.5 is an alkylene group having 2-8 carbons, R.sub.6 and R.sub.7 are an H, CH.sub.Type: GrantFiled: July 26, 1991Date of Patent: February 9, 1993Assignees: Hayakawa Rubber Co., Ltd., Nippon Paint Co., Ltd.Inventors: Sadayoshi Nakatsukasa, Toshihiro Fujii, Ban Tanaka, Kosaku Yamada
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Patent number: 5085697Abstract: A splendid tentative surface protective coating which is useful in treating a surface of a substance by soldering or plating and which is peeled off easily from the surface after the treating is formed by preparing a solventless or solvent free type screen ink based on essentially an ultraviolet ray-curable rubbery elastomer, applying a coating of the ink on the surface of the substrate by screen printing or thin film coating, and curing the coating of the ink by irradiation with an ultraviolet ray. The tentative surface protective coating can reproduce exactly a pattern of a mask or screen, have a high chemical resistance and heat resistance, even if it has a thin thickness of 30 .mu.m, and have no afraid of deformation caused by heat curing, whereby a precise and shortened surface treatment of the surface of the substance can be afforded. Also, working environment is improved, and air conditioning equipment can be dispensed with owing to an absence or diminishment of an organic solvent.Type: GrantFiled: March 12, 1990Date of Patent: February 4, 1992Assignee: Hayakawa Rubber Co., Ltd.Inventors: Tetsuya Kimura, Toshihiro Fujii, Hiroki Nii
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Patent number: 5014009Abstract: A detector device for a gas chromatograph, for detecting surface ionization wherein ions will be detected which are formed upon contacting amine compounds and ammonia with the surface of metallic oxides having a large work function. The detector enables detection of poisonous amine compounds and ammonia with high sensitivity.Type: GrantFiled: January 25, 1990Date of Patent: May 7, 1991Assignee: Shimadzu CorporationInventors: Hiromi Arimoto, Toshihiro Fujii
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Patent number: 4929469Abstract: A splendid tentative surface protective coating which is useful in treating a surface of a substance by soldering or plating and which is peeled off easily from the surface after the treating is formed by preparing a solventless or solvent free type screen ink based on essentially an ultraviolet ray-curable rubbery elastomer, applying a coating of the ink on the surface of the substrate by screen printing or thin film coating, and curing the coating of the ink by irradiation with an ultraviolet ray. The tentative surface protective coating can reproduce exactly a pattern of a mask or screen, have a high chemical resistance and heat resistance, even if it has a thin thickness of 30 .mu.m, and have no afraid of deformation caused by heat curing, whereby a precise and shortened surface treatment of the surface of the substance can be afforded. Also, working environment is improved, and air conditioning equipment can be dispensed with owing to an absence or diminishment of an organic solvent.Type: GrantFiled: July 6, 1988Date of Patent: May 29, 1990Assignee: Hayakawa Rubber Co., Ltd.Inventors: Tetsuya Kimura, Toshihiro Fujii, Hiroki Nii
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Patent number: 4845595Abstract: A meter panel device for a vehicle having a light-transmissive base plate having a dial face and marking, and a light emitting unit, which comprises translucent colored layers differing in color from each other provided respectively on the front side and backside of the dial face, and translucent colored layers differing in color from each other provided respectively on the front side and backside of the marking, thus enabling changes in colors of the dial face and the marking between the daytime in which the vehicle interior is relatively lighter than the backside of the meter device and the night in which the light emitting unit disposed at the rear side of the meter device is lit and the vehicle interior is relatively darker than the backside of the meter device.Type: GrantFiled: July 20, 1988Date of Patent: July 4, 1989Assignee: Mitsubishi Jidosha Kogyo Kabushiki KaishaInventors: Toshihiro Fujii, Shunjiro Fukui
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Patent number: 4677153Abstract: A method for modifying a rubber having unsaturated bonds, characterized by reacting said rubber with (a) an organic compound (I) having a group represented by the formula --CH.dbd.N-- and (b) an organic acid halide (II) having a group represented by the formula --COX (X is a halogen atom), in the place of a Lewis acid.Type: GrantFiled: March 25, 1986Date of Patent: June 30, 1987Assignee: Nippon Zeon Co., Ltd.Inventors: Shizuo Kitahara, Yoshitsugu Hirokawa, Toshihiro Fujii