Patents by Inventor Toshihiro IKEYAMA

Toshihiro IKEYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240123752
    Abstract: There are provided a washout processor and a washing method that prevent solid contents from being attached to a developed flexographic printing plate precursor again.
    Type: Application
    Filed: December 28, 2023
    Publication date: April 18, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Fumio MOGI, Manabu HASHIGAYA, Toshihiro WATANABE, Yusuke IKEYAMA
  • Publication number: 20230200249
    Abstract: The present invention is one which prevents the occurrence of cracks in piezo elements and reduces the thermal effects on the control board, and comprises a fluid control valve driven by a piezo actuator, a fluid sensor which measures the pressure or flow rate of the fluid, a control board which controls the fluid control valve based on the measured value measured by the fluid sensor, and a discharge resistor provided on a component different from the control board.
    Type: Application
    Filed: November 15, 2022
    Publication date: June 22, 2023
    Inventors: Takayuki INOUE, Noriaki IKEZAWA, Akihiro TAGUCHI, Toshihiro IKEYAMA, Tsuyoshi ICHINOMIYA, Akihiro NAKAMURA
  • Patent number: 11270878
    Abstract: A quadrupole mass spectrometer includes an ion source that ionizes a sample, a filter unit that includes a quadrupole and separates ions generated from the ion source according to mass, a detector that detects ions passing through the filter unit, a filter voltage controller that controls a filter voltage applied to the quadrupole to switch between a blocking mode in which ions entering the filter unit are not allowed to impinge on the detector and a passing mode in which ions entering the filter unit are allowed to impinge on the detector, the filter voltage including a radio-frequency voltage and a direct-current voltage, a baseline computing unit that computes a baseline based on outputs of the detector in the blocking mode, and an analyzing unit that outputs an analysis result of the sample based on outputs of the detector in the passing mode and the computed baseline.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: March 8, 2022
    Assignees: HORIBA STEC, CO., LTD., HORIBA, LTD.
    Inventors: Kohei Sasai, Kazushi Sasakura, Toshihiro Ikeyama, Takahito Inoue, Hiroshi Uchihara
  • Publication number: 20210318267
    Abstract: An element analysis device is provided, which can quantitatively analyze an H element contained in a sample gas with high accuracy. The element analysis device is provided with a heating furnace for heating a crucible having a sample contained therein while a carrier gas is introduced into the heating furnace to vaporize at least a part of the sample to generate a sample gas containing the H element and then deriving the sample gas with the carrier gas as a mixed gas and a mass spectrometer for quantitatively analyzing at least one element contained in the sample gas in the mixed gas that has been derived from the heating furnace, wherein the mass spectrometer quantitatively analyzes the H element contained as an H2O component in the mixed gas as the H element contained in the sample gas.
    Type: Application
    Filed: May 21, 2019
    Publication date: October 14, 2021
    Inventors: Takahito INOUE, Hiroshi UCHIHARA, Kohei SASAI, Toshihiro IKEYAMA, Hiroyuki SEKI
  • Publication number: 20210166932
    Abstract: A quadrupole mass spectrometer includes an ion source that ionizes a sample, a filter unit that includes a quadrupole and separates ions generated from the ion source according to mass, a detector that detects ions passing through the filter unit, a filter voltage controller that controls a filter voltage applied to the quadrupole to switch between a blocking mode in which ions entering the filter unit are not allowed to impinge on the detector and a passing mode in which ions entering the filter unit are allowed to impinge on the detector, the filter voltage including a radio-frequency voltage and a direct-current voltage, a baseline computing unit that computes a baseline based on outputs of the detector in the blocking mode, and an analyzing unit that outputs an analysis result of the sample based on outputs of the detector in the passing mode and the computed baseline.
    Type: Application
    Filed: November 20, 2020
    Publication date: June 3, 2021
    Applicants: HORIBA STEC, Co., Ltd., HORIBA, Ltd.
    Inventors: Kohei SASAI, Kazushi SASAKURA, Toshihiro IKEYAMA, Takahito INOUE, Hiroshi UCHIHARA
  • Patent number: 10978285
    Abstract: An objective of this invention is to conduct an accurate quantitative analysis on the Ar element contained in a sample gas by an element analysis device comprising a heating furnace and a mass spectrometer for conducting a quantitative analysis on an element in a vacuum atmosphere. The element analysis device comprises: a heating furnace that heats a graphite crucible containing a sample while introducing a carrier gas into the heating furnace, thereby vaporizing the sample to generate a sample gas; a quadrupole mass spectrometer that conducts the quantitative analysis on the Ar element contained in the sample gas in a mixed gas comprising the carrier gas and the sample gas discharged from the heating furnace, a first pressure regulator that controls the pressure of the carrier gas to be introduced into the heating furnace, and a second pressure regulator that controls the pressure of the mixed gas discharged from the heating furnace.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: April 13, 2021
    Assignees: HORIBA, LTD., HORIBA STEC, CO., LTD.
    Inventors: Takahito Inoue, Hiroshi Uchihara, Kohei Sasai, Toshihiro Ikeyama
  • Publication number: 20190206667
    Abstract: An objective of this invention is to conduct an accurate quantitative analysis on the Ar element contained in a sample gas by an element analysis device comprising a heating furnace and a mass spectrometer for conducting a quantitative analysis on an element in a vacuum atmosphere. The element analysis device comprises: a heating furnace that heats a graphite crucible containing a sample while introducing a carrier gas into the heating furnace, thereby vaporizing the sample to generate a sample gas; a quadrupole mass spectrometer that conducts the quantitative analysis on the Ar element contained in the sample gas in a mixed gas comprising the carrier gas and the sample gas discharged from the heating furnace, a first pressure regulator that controls the pressure of the carrier gas to be introduced into the heating furnace, and a second pressure regulator that controls the pressure of the mixed gas discharged from the heating furnace.
    Type: Application
    Filed: September 22, 2017
    Publication date: July 4, 2019
    Inventors: Takahito INOUE, Hiroshi UCHIHARA, Kohei SASAI, Toshihiro IKEYAMA
  • Patent number: 10026582
    Abstract: In order to provide a thermionic emission filament capable of ensuring a long life and improving an analysis accuracy of a mass spectrometer using the thermionic emission filament, in the thermionic emission filament including a core member through which electric current flows and an electron emitting layer which is formed so as to cover a surface of the core member, the electron emitting layer is configured to have denseness for substantial gas-tight integrity.
    Type: Grant
    Filed: December 7, 2016
    Date of Patent: July 17, 2018
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Kohei Sasai, Toshihiro Ikeyama, Toshiaki Sakai
  • Publication number: 20170169981
    Abstract: In order to provide a thermionic emission filament capable of ensuring a long life and improving an analysis accuracy of a mass spectrometer using the thermionic emission filament, in the thermionic emission filament including a core member through which electric current flows and an electron emitting layer which is formed so as to cover a surface of the core member, the electron emitting layer is configured to have denseness for substantial gas-tight integrity.
    Type: Application
    Filed: December 7, 2016
    Publication date: June 15, 2017
    Applicant: HORIBA STEC, CO., LTD.
    Inventors: Kohei SASAI, Toshihiro IKEYAMA, Toshiaki SAKAI