Patents by Inventor Toshihiro Nishisaka

Toshihiro Nishisaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11061340
    Abstract: A mount includes: A. a mount body including a holding unit that detachably holds a target generation device configured to output a target substance for extreme ultraviolet light generation as a droplet into a chamber; and B. a target position adjustment unit that is provided to the holding unit and configured to adjust a position of the target generation device relative to the chamber; and C. a movement mechanism that moves the mount body at least in a horizontal direction. The target position adjustment unit is a stage configured to move the target generation device in two directions orthogonal to a droplet emission axis.
    Type: Grant
    Filed: August 4, 2020
    Date of Patent: July 13, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Toshihiro Nishisaka
  • Publication number: 20210029811
    Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
    Type: Application
    Filed: June 5, 2020
    Publication date: January 28, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Kouichiro KOUGE, Yusuke HOSHINO, Toshihiro NISHISAKA, Takashi OKADA
  • Publication number: 20200363733
    Abstract: A mount includes: A. a mount body including a holding unit that detachably holds a target generation device configured to output a target substance for extreme ultraviolet light generation as a droplet into a chamber; and B. a target position adjustment unit that is provided to the holding unit and configured to adjust a position of the target generation device relative to the chamber; and C. a movement mechanism that moves the mount body at least in a horizontal direction. The target position adjustment unit is a stage configured to move the target generation device in two directions orthogonal to a droplet emission axis.
    Type: Application
    Filed: August 4, 2020
    Publication date: November 19, 2020
    Applicant: Gigaphoton Inc.
    Inventor: Toshihiro NISHISAKA
  • Patent number: 10698316
    Abstract: A target generation device replacement trolley includes: A. a linear movement mechanism configured to hold a target generation device configured to output a target material and linearly move the target generation device in a direction in which the target material is output; and B. a positioning portion configured to position the linear movement mechanism relative to a mounting part of a chamber on which the target generation device is mounted. The target generation device replacement trolley further includes C. a drive unit configured to drive the linear movement mechanism. The target generation device replacement trolley further includes D. a mount configured to hold the linear movement mechanism. The positioning portion is provided to the mount.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: June 30, 2020
    Assignee: Gigaphoton Inc.
    Inventor: Toshihiro Nishisaka
  • Patent number: 10674590
    Abstract: A tank may include: a tank main body having a space and an opening; a lid body covering the opening and a peripheral portion of the opening; a bolt for fixing the tank main body and the lid body in the peripheral portion; a first support portion arranged to surround the opening in a region on a side of the opening with respect to the bolt to support the lid body; a second support portion arranged to surround the opening in a region on the opening side with respect to the first support portion and having a height lower than a height of the first support portion; and a sealing member arranged to surround the opening in the region on the opening side with respect to the first support portion.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: June 2, 2020
    Assignee: Gigaphoton Inc.
    Inventors: Toshiyuki Hirashita, Toshihiro Nishisaka
  • Patent number: 10524343
    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: December 31, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Takanobu Ishihara, Toshihiro Nishisaka, Yutaka Shiraishi
  • Publication number: 20190289705
    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
    Type: Application
    Filed: June 3, 2019
    Publication date: September 19, 2019
    Applicant: Gigaphoton Inc.
    Inventors: Takanobu ISHIHARA, Toshihiro NISHISAKA, Yutaka SHIRAISHI
  • Publication number: 20190271914
    Abstract: A target generation device replacement trolley includes: A. a linear movement mechanism configured to hold a target generation device configured to output a target material and linearly move the target generation device in a direction in which the target material is output; and B. a positioning portion configured to position the linear movement mechanism relative to a mounting part of a chamber on which the target generation device is mounted. The target generation device replacement trolley further includes C. a drive unit configured to drive the linear movement mechanism. The target generation device replacement trolley further includes D. a mount configured to hold the linear movement mechanism. The positioning portion is provided to the mount.
    Type: Application
    Filed: April 9, 2019
    Publication date: September 5, 2019
    Applicant: Gigaphoton Inc.
    Inventor: Toshihiro NISHISAKA
  • Patent number: 10372041
    Abstract: A target generation device according to one aspect of the present disclosure includes a tank for containing a target substance, a heater provided at the tank, a nozzle communicating with the inside of the tank, a lid having a gas inlet port communicating with the inside of the tank, and a plurality of shielding plates that are disposed inside the tank and suppress entry of the target substance to the gas inlet port. Each of the shielding plates includes at least one non-shielding region for allowing the gas to pass through. The non-shielding regions of at least two of the shielding plates are arranged at positions in which one of the non-shielding regions of the at least two of the shielding plates is not seen into the other of the non-shielding regions of the at least two of the shielding plates.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: August 6, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Yutaka Shiraishi, Toshihiro Nishisaka
  • Patent number: 10349508
    Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: July 9, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Yutaka Shiraishi, Toshihiro Nishisaka, Toshiyuki Hirashita, Takuya Ishii
  • Publication number: 20190155163
    Abstract: A target generation device according to one aspect of the present disclosure includes a tank for containing a target substance, a heater provided at the tank, a nozzle communicating with the inside of the tank, a lid having a gas inlet port communicating with the inside of the tank, and a plurality of shielding plates that are disposed inside the tank and suppress entry of the target substance to the gas inlet port. Each of the shielding plates includes at least one non-shielding region for allowing the gas to pass through. The non-shielding regions of at least two of the shielding plates are arranged at positions in which one of the non-shielding regions of the at least two of the shielding plates is not seen into the other of the non-shielding regions of the at least two of the shielding plates.
    Type: Application
    Filed: January 29, 2019
    Publication date: May 23, 2019
    Applicant: Gigaphoton Inc.
    Inventors: Yutaka SHIRAISHI, Toshihiro NISHISAKA
  • Publication number: 20190008026
    Abstract: A tank may include: a tank main body having a space and an opening; a lid body covering the opening and a peripheral portion of the opening; a bolt for fixing the tank main body and the lid body in the peripheral portion; a first support portion arranged to surround the opening in a region on a side of the opening with respect to the bolt to support the lid body; a second support portion arranged to surround the opening in a region on the opening side with respect to the first support portion and having a height lower than a height of the first support portion; and a sealing member arranged to surround the opening in the region on the opening side with respect to the first support portion.
    Type: Application
    Filed: September 10, 2018
    Publication date: January 3, 2019
    Applicant: Gigaphoton Inc.
    Inventors: Toshiyuki HIRASHITA, Toshihiro NISHISAKA
  • Patent number: 10136510
    Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
    Type: Grant
    Filed: May 1, 2017
    Date of Patent: November 20, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Georg Soumagne, Toshihiro Nishisaka
  • Patent number: 10009991
    Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.
    Type: Grant
    Filed: February 9, 2016
    Date of Patent: June 26, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Toshihiro Nishisaka, Yoshiaki Kato, Fumio Iwamoto
  • Publication number: 20180160518
    Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.
    Type: Application
    Filed: February 5, 2018
    Publication date: June 7, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Yutaka SHIRAISHI, Toshihiro NISHISAKA, Toshiyuki HIRASHITA, Takuya ISHII
  • Publication number: 20170238407
    Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
    Type: Application
    Filed: May 1, 2017
    Publication date: August 17, 2017
    Applicant: Gigaphoton Inc.
    Inventors: Shinji NAGAI, Georg SOUMAGNE, Toshihiro NISHISAKA
  • Patent number: 9429847
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: August 30, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Toshihiro Nishisaka, Yukio Watanabe, Osamu Wakabayashi, Kouji Kakizaki, Michio Shinozaki
  • Publication number: 20160187787
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Application
    Filed: March 8, 2016
    Publication date: June 30, 2016
    Applicant: Gigaphoton Inc.
    Inventors: Toshihiro NISHISAKA, Yukio WATANABE, Osamu WAKABAYASHI, Kouji KAKIZAKI, Michio SHINOZAKI
  • Publication number: 20160165708
    Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.
    Type: Application
    Filed: February 9, 2016
    Publication date: June 9, 2016
    Applicant: GIGAPHOTON INC.
    Inventors: Toshihiro NISHISAKA, Yoshiaki KATO, Fumio IWAMOTO
  • Patent number: 9332625
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: May 3, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Toshihiro Nishisaka, Yukio Watanabe, Osamu Wakabayashi, Kouji Kakizaki, Michio Shinozaki