Patents by Inventor Toshihiro OHUCHI

Toshihiro OHUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PRODUCING EPITAXIAL SILICON WAFER
    Publication number: 20110132255
    Abstract: Since vapor-phase growth of an epitaxial film is performed on the surface of a mirror surface silicon wafer which is not subjected to final polishing, and the surface of the epitaxial film is thereafter subjected to HCl gas etching, the mirror polishing step is simplified, and the productivity is improved, that enables a reduction in cost, and it is possible to suppress the surface roughness of the epitaxial film as well.
    Type: Application
    Filed: September 22, 2010
    Publication date: June 9, 2011
    Applicant: SUMCO CORPORATION
    Inventors: Hideaki KINBARA, Naoyuki WADA, Toshihiro OHUCHI, Shinichi OGATA, Hironori NISHIMURA