Patents by Inventor Toshihiro Sakamoto

Toshihiro Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11939217
    Abstract: According to one embodiment, a magnesium-recycling hydrogen generation system includes: a by-product acquisition unit that separates a by-product from a post-reaction solution, which is a solution after reacting with a hydrogen generation material containing a hydrogen-containing magnesium compound that generates hydrogen via a reaction with the solution, to acquire the by-product including more than one type of oxygen-containing magnesium compound that contains oxygen produced by the reaction, a raw material production unit that reacts the by-product with a halogen-containing substance containing halogen and other atoms than the halogen to produce a raw material containing magnesium halide, a hydrogen generation material production unit that reduces the raw material with plasma containing hydrogen to produce the hydrogen generation material, and a hydrogen generator that reacts the hydrogen generation material with the solution to generate hydrogen.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: March 26, 2024
    Assignee: SE CORPORATION
    Inventors: Tsutomu Takizawa, Toshihiro Oishi, Yoshiharu Sawaki, Mineo Morimoto, Yuichi Sakamoto
  • Publication number: 20230049402
    Abstract: The present invention provides a phenol compound represented by the following Formula (I) or a salt thereof: wherein R1, R2, R5, L1, L2, L3, A, X, and m are as described in the specification.
    Type: Application
    Filed: December 6, 2019
    Publication date: February 16, 2023
    Inventors: TOSHIHIRO SAKAMOTO, HIDEKI KAZUNO, HITOMI KONDO, TOMOHIRO YAMAMOTO, TETSUYA SUGIMOTO
  • Publication number: 20230023023
    Abstract: The present invention provides an antitumor agent comprising a compound or a pharmaceutically acceptable salt thereof that covalently binds to GTP-bound KRASG12C as an active ingredient.
    Type: Application
    Filed: October 29, 2020
    Publication date: January 26, 2023
    Inventors: KAZUAKI SHIBATA, YUICHI KAWAI, HIROKI ASAKURA, TETSUYA SUGIMOTO, NAOKI EGASHIRA, TOMOHIRO YAMAMOTO, TATSUYA SUZUKI, YUKI KATAOKA, TAKESHI SAGARA, TOSHIHIRO SAKAMOTO, HITOMI KONDO, CHRISTOPHER CHARLES FREDERICK HAMLETT, PATRICK SCHÖPF, DAVID GEOFFREY TWIGG
  • Publication number: 20210395234
    Abstract: An indazole compound represented by the following Formula (I) or a salt thereof: wherein X, R1, R2, ring A, L1, L2, L3, and R5 are as defined in this specification.
    Type: Application
    Filed: October 25, 2019
    Publication date: December 23, 2021
    Inventors: TOSHIHIRO SAKAMOTO, HIDEKI KAZUNO, TETSUYA SUGIMOTO, HITOMI KONDO, TOMOHIRO YAMAMOTO
  • Patent number: 10538528
    Abstract: The invention of the present application provides a compound represented by Formula (I) or a salt thereof, which exhibits an inhibitory activity against at least one kinase selected from the group consisting of Akt kinase, Rsk kinase, and S6K kinase and/or a cell proliferation inhibiting effect and is useful as a prophylactic and/or therapeutic agent for diseases associated with the above-mentioned kinases, particularly cancer.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: January 21, 2020
    Assignee: Taiho Pahrmaceutical Co., Ltd.
    Inventors: Tetsuya Sugimoto, Toshihiro Sakamoto, Fuyuki Yamamoto, Yu Kobayakawa, Naoki Egashira, Koji Ichikawa, Takumitsu Machida
  • Publication number: 20190292190
    Abstract: The invention of the present application provides a compound represented by Formula (I) or a salt thereof, which exhibits an inhibitory activity against at least one kinase selected from the group consisting of Akt kinase, Rsk kinase, and S6K kinase and/or a cell proliferation inhibiting effect and is useful as a prophylactic and/or therapeutic agent for diseases associated with the above-mentioned kinases, particularly cancer.
    Type: Application
    Filed: May 19, 2017
    Publication date: September 26, 2019
    Applicant: Taiho Pharmaceutical Co., Ltd.
    Inventors: Tetsuya SUGIMOTO, Toshihiro SAKAMOTO, Fuyuki YAMAMOTO, Yu KOBAYAKAWA, Naoki EGASHIRA, Koji ICHIKAWA, Takumitsu MACHIDA
  • Publication number: 20190170713
    Abstract: The thin layer chromatography plate includes a substrate and a separation layer. The separation layer is disposed on the substrate and is configured to separate multiple components included in a sample from each other. The separation layer includes a first layer and a second layer. The first layer has a porous structure and extends in a first direction. The second layer has a porous structure and extends in the first direction. The first layer and the second layer are arrayed in a second direction orthogonal to the first direction. A zeta potential of the first layer is different from a zeta potential of the second layer.
    Type: Application
    Filed: December 6, 2017
    Publication date: June 6, 2019
    Inventors: TOSHIHIRO SAKAMOTO, TOSHINOBU MATSUNO
  • Publication number: 20190170683
    Abstract: Provided is a thin layer chromatography plate that makes it possible to separate a plurality of components from each other more simply and more quickly. Thin layer chromatography plate includes substrate and separation layer that is disposed on substrate for separating multiple components included in a sample from each other. Separation layer has first layer that has a band shape and extends in first development direction and second layer that extends in second development direction orthogonal to first development direction. Second layer is in contact with first layer. First layer includes a hydrophilic porous body. Second layer includes a hydrophobic porous body.
    Type: Application
    Filed: December 13, 2017
    Publication date: June 6, 2019
    Inventors: TOSHIHIRO SAKAMOTO, CHIAKI SHIDO
  • Publication number: 20170281392
    Abstract: The present invention is to provide a shirt for correcting bone alignment that has a capability to correct the alignment of the sternum and the ribs and reduce burden on user's body. The shirt for correcting bone alignment 1 includes a shirt part 10 that is formed from a stretch fabric; a first restraint part 20 that is formed on the right or the left side in the upper-half of the front body of the shirt part 10, the first restraint part 20 being less stretch than the fabric of the shirt part 10; and a second restraint part 30 that is formed on the different side from the first restraint part 20 in the upper-half of the back body of the shirt part 10, the second restraint part being less stretch than the fabric of the shirt part 10.
    Type: Application
    Filed: August 9, 2016
    Publication date: October 5, 2017
    Inventor: Toshihiro SAKAMOTO
  • Patent number: 9145414
    Abstract: The present invention provides a compound represented by the following general formula (I) or a salt thereof which has a Syk inhibitory effect (in the formula R1 represents a hydrogen atom or an optionally substituted C1-C6 alkyl group; A represents a hydrogen atom, an optionally substituted C1-C8 alkyl group, an optionally substituted C2-C6 alkenyl group, an optionally substituted C2-C6 alkynyl group, an optionally substituted C3-C10 cycloalkyl group, an optionally substituted C6-C14 aromatic hydrocarbon group, an optionally substituted 4- to 10-membered unsaturated heterocyclic group, or an optionally substituted 4- to 10-membered saturated heterocyclic group, or optionally forms a 4- to 10-membered unsaturated heterocyclic ring or a 4- to 10-membered saturated heterocyclic ring together with R1 and the nitrogen atom bonded thereto; R2 represents a hydrogen atom or an optionally substituted C1-C6 alkyl group; and B represents an optionally substituted unsaturated heterocyclic group).
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: September 29, 2015
    Assignee: TAIHO PHARMACEUTICAL CO., LTD.
    Inventors: Toshihiro Sakamoto, Takashi Mita, Kazuaki Shibata, Yoshio Ogino, Hideya Komatani
  • Publication number: 20140343038
    Abstract: The present invention provides a compound represented by the following general formula (I) or a salt thereof which has a Syk inhibitory effect (in the formula R1 represents a hydrogen atom or an optionally substituted C1-C6 alkyl group; A represents a hydrogen atom, an optionally substituted C1-C8 alkyl group, an optionally substituted C2-C6 alkenyl group, an optionally substituted C2-C6 alkynyl group, an optionally substituted C3-C10 cycloalkyl group, an optionally substituted C6-C14 aromatic hydrocarbon group, an optionally substituted 4- to 10-membered unsaturated heterocyclic group, or an optionally substituted 4- to 10-membered saturated heterocyclic group, or optionally forms a 4- to 10-membered unsaturated heterocyclic ring or a 4- to 10-membered saturated heterocyclic ring together with R1 and the nitrogen atom bonded thereto; R2 represents a hydrogen atom or an optionally substituted C1-C6 alkyl group; and B represents an optionally substituted unsaturated heterocyclic group).
    Type: Application
    Filed: September 28, 2012
    Publication date: November 20, 2014
    Applicant: TAIHO PHARMACEUTICAL CO., LTD.
    Inventors: Toshihiro Sakamoto, Takashi Mita, Kazuaki Shibata, Yoshio Ogino, Hideya Komatani
  • Publication number: 20140303178
    Abstract: The invention relates to compounds of a general formula (I): wherein Ar1 is an optionally-substituted aryl or heteroaromatic group; R1 is an optionally-substituted lower alkyl, lower alkenyl, lower alkynyl or cyclo-lower alkyl group, or is an aryl, aralkyl or heteroaromatic group optionally having a substituent; R2 is a hydrogen atom, a lower alkyl group, a lower alkenyl group or a lower alkynyl group, or is an aryl, aralkyl or heteroaromatic group optionally having a substituent; R3 is a hydrogen atom or a lower alkyl group; R4 is a hydrogen atom, a halogen atom, a hydroxyl group, a lower alkyl group or a group of —N(R1k)R1m; T and U are a nitrogen atom or a methine group, etc. The compounds of the invention have excellent Weel kinase-inhibitory effect and are therefore useful in the field of medicines, especially treatment of various cancers.
    Type: Application
    Filed: June 24, 2014
    Publication date: October 9, 2014
    Inventors: Takeshi Sagara, Sachie Otsuki, Satoshi Sunami, Toshihiro Sakamoto, Kenji Niiyama, Fuyuki Yamamoto, Takashi Yoshizumi, Hidetomo Furuyama, Yasuhiro Goto, Makoto Bamba, Keiji Takahashi, Hiroshi Hirai, Toshihide Nishibata
  • Patent number: 8791125
    Abstract: The invention relates to compounds of a general formula (I): wherein Ar1 is an optionally-substituted aryl or heteroaromatic group; R1 is an optionally-substituted lower alkyl, lower alkenyl, lower alkynyl or cyclo-lower alkyl group, or is an aryl, aralkyl or heteroaromatic group optionally having a substituent; R2 is a hydrogen atom, a lower alkyl group, a lower alkenyl group or a lower alkynyl group, or is an aryl, aralkyl or heteroaromatic group optionally having a substituent; R3 is a hydrogen atom or a lower alkyl group; R4 is a hydrogen atom, a halogen atom, a hydroxyl group, a lower alkyl group or a group of —N(R1k)R1m; T and U are a nitrogen atom or a methine group, etc. The compounds of the invention have excellent Weel kinase-inhibitory effect and are therefore useful in the field of medicines, especially treatment of various cancers.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: July 29, 2014
    Assignee: MSD K.K.
    Inventors: Takeshi Sagara, Sachie Otsuki, Satoshi Sunami, Toshihiro Sakamoto, Kenji Niiyama, Fuyuki Yamamoto, Takashi Yoshizumi, Hidetomo Furuyama, Yasuhiro Goto, Makoto Bamba, Keiji Takahashi, Hiroshi Hirai, Toshihide Nishibata
  • Patent number: 8779523
    Abstract: According to one embodiment, a semiconductor device includes a semiconductor substrate with a p-type conductivity, a buried layer with an n-type conductivity provided on the semiconductor substrate, a back gate layer with a p-type conductivity provided on the buried layer, a drain layer with an n-type conductivity provided on the back gate layer, a source layer with an n-type conductivity provided spaced from the drain layer, a gate electrode provided in a region immediately above a portion of the back gate layer between the drain layer and the source layer, and a drain electrode in contact with a part of an upper surface of the drain layer. A thickness of the drain layer in a region immediately below a contact surface between the drain layer and the drain electrode is half a total thickness of the back gate and drain layers in the region.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: July 15, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Shirai, Ken Inadumi, Tsuyoshi Hirayu, Toshihiro Sakamoto
  • Patent number: 8614221
    Abstract: The instant invention provides for substituted fused naphthyridine derivatives that inhibit Akt activity. In particular, the compounds disclosed selectively inhibit one or two of the Akt isoforms. The invention also provides for compositions comprising such inhibitory compounds and methods of inhibiting Akt activity by administering the compound to a patient in need of treatment of cancer.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: December 24, 2013
    Assignees: Merck Sharp & Dohme Corp., MSD K.K.
    Inventors: Weiming Fan, Thomas F. N. Haxell, Matthew G. Jenks, Nobuhiko Kawanishi, Shuliang Lee, Hao Liu, Michael J. Malaska, Joseph A. Moore, III, Yoshio Ogino, Yu Onozaki, Bharathi Pandi, Michael R. Peel, Toshihiro Sakamoto, Tony Siu
  • Patent number: 8536193
    Abstract: The instant invention provides for substituted [1,2,4]triazolo[4,3-a]-1,5-naphthyridine compounds that inhibit Akt activity. In particular, the compounds disclosed selectively inhibit one or two of the Akt isoforms, preferably Akt1. The invention also provides for compositions comprising such inhibitory compounds and methods of inhibiting Akt activity, especially Akt1 by administering the compound to a patient in need of treatment of cancer.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: September 17, 2013
    Assignees: Merck Sharp & Dohme Corp., MSD K.K.
    Inventors: Hidetomo Furuyama, Yasuhiro Goto, Nobuhiko Kawanishi, Mark E. Layton, Takashi Mita, Yoshio Ogino, Yu Onozaki, Michael A. Rossi, Toshihiro Sakamoto, Philip E. Sanderson, Jiabing Wang
  • Patent number: 8507505
    Abstract: The present invention relates to a compound of General Formula (I) below, among others. In the Formula, Ar1 is an optionally substituted aryl or heteroaryl group; R1 is a hydrogen atom, an optionally substituted C1-C6 alkyl group, or an optionally substituted aryl, aralkyl, or heteroaryl group; R2 is an optionally substituted aryl, aralkyl, or heteroaryl group; and R3 is a hydrogen atom or a C1-C6 alkyl group. A compound of the present invention has an excellent Wee1 kinase inhibiting effect, and is therefore useful in the filed of medicine, particularly in various types of cancer therapy.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: August 13, 2013
    Assignee: MSD K.K.
    Inventors: Makoto Bamba, Hidetomo Furuyama, Toshihiro Sakamoto, Satoshi Sunami, Keiji Takahashi, Fuyuki Yamamoto, Takashi Yoshizumi
  • Publication number: 20130181296
    Abstract: According to one embodiment, a semiconductor device includes a semiconductor substrate with a p-type conductivity, a buried layer with an n-type conductivity provided on the semiconductor substrate, a back gate layer with a p-type conductivity provided on the buried layer, a drain layer with an n-type conductivity provided on the back gate layer, a source layer with an n-type conductivity provided spaced from the drain layer, a gate electrode provided in a region immediately above a portion of the back gate layer between the drain layer and the source layer, and a drain electrode in contact with a part of an upper surface of the drain layer. A thickness of the drain layer in a region immediately below a contact surface between the drain layer and the drain electrode is half a total thickness of the back gate and drain layers in the region.
    Type: Application
    Filed: June 8, 2012
    Publication date: July 18, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Koji SHIRAI, Ken INADUMI, Tsuyoshi HIRAYU, Toshihiro SAKAMOTO
  • Patent number: 8436004
    Abstract: The invention relates to a compound of a general formula (I): wherein A1 and A2 each mean a nitrogen atom or an optionally-substituted methine group; Ring B means a 5-membered to 7-membered aliphatic ring, or a spiro or bicyclo ring formed from the aliphatic ring and any other 3-membered to 7-membered aliphatic ring; R1 means a hydrogen atom, or an optionally-substituted C1-C6 alkyl group, or an optionally-substituted aryl, aralkyl or heteroaryl group; R2 means an optionally-substituted aryl, aralkyl or heteroaryl group; and X means a group of ?NH or ?O, etc. Based on its excellent Wee1 kinase-inhibitory effect, the compound of the invention has cell growth-inhibitory effect and has an additive/synergistic effect with any other anticancer agent, and is therefore useful in the field of medicine.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: May 7, 2013
    Assignee: MSD K.K.
    Inventors: Makoto Bamba, Hidetomo Furuyama, Kenji Niiyama, Toshihiro Sakamoto, Satoshi Sunami, Keiji Takahashi, Fuyuki Yamamoto, Takashi Yoshizumi
  • Patent number: 8329711
    Abstract: The invention relates to compounds of general formula (I-0): wherein R1, R2, R3, R4, R5, R6, R7a, R8a, X, and Y are as defined herein. Compounds of the invention have, based on excellent Wee1 kinase-inhibitory effect, a cell growth-inhibitory effect and an additive/synergistic effect with any other anticancer agent, and are therefore useful in the field of medicine.
    Type: Grant
    Filed: October 20, 2008
    Date of Patent: December 11, 2012
    Assignee: MSD K.K.
    Inventors: Hidetomo Furuyama, Mikako Kawamura, Toshihiro Sakamoto, Fuyuki Yamamoto, Takashi Yoshizumi