Abstract: There are provided an imaging optical system and imaging equipment, which are compatible with a solid-state imaging device having a size of ½ inches or less and which include an optical system having a small size and lightness in weight and also having an excellent mass productivity and a low cost while keeping optical performance at a wide field angle, for example, at a total angle of view of 80 degrees or more. When predetermined conditions are satisfied for a plurality of lenses constituting the imaging optical system, the absolute value of power of each lens group is suppressed to be small, and thus the generation of aberration is suppressed and a preferable aberration is obtained.

Abstract: There are provided an imaging optical system and imaging equipment, which are compatible with a solid-state imaging device having a size of ½ inches or less and which include an optical system having a small size and lightness in weight and also having an excellent mass productivity and a low cost while keeping optical performance at a wide field angle, for example, at a total angle of view of 80 degrees or more. When predetermined conditions are satisfied for a plurality of lenses constituting the imaging optical system, the absolute value of power of each lens group is suppressed to be small, and thus the generation of aberration is suppressed and a preferable aberration is obtained.

Abstract: A high-performance projection exposure apparatus and method which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. In exemplary embodiments, the projection exposure apparatus includes an illumination optical system, a projection optical system and a plurality of optical elements. The illumination optical system illuminates a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical elements are set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical elements can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system remaining in the projection optical system.

Abstract: A high-performance projection exposure apparatus and method which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. In exemplary embodiments, the projection exposure apparatus includes an illumination optical system, a projection optical system and a plurality of optical elements. The illumination optical system illuminates a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical elements are set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical elements can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system remaining in the projection optical system.

Abstract: A high-performance projection exposure apparatus excellent in durability and reproducibility, which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. The projection exposure apparatus comprises an illumination optical system, a projection optical system and an optical means. The illumination optical system illuminate a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical means is set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical means can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system, remaining in the projection optical system.

Abstract: A method of characterizing photolithographic tool performance is presented. Variations in performance over an image or exposure field are evaluated and contributions to the variation due to the partial coherence factor of the tool separated from other contributing factors. Methods of determining the relative magnitude of these variations is provided and a photolithographic tool that incorporates these methods described.

Abstract: A method of manufacturing an exposure apparatus includes a step of providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. Additionally, a surface of a correction member having a predetermined thickness is locally tooled or processed in order to correct random aberration that remains in the projection optical system. The tooled correction member is arranged between the mask and the substrate, irrespective of the mask. Furthermore, when the projection optical system is provided, an aberration caused due to the predetermined thickness of the correction member is taken into account in advance.

Abstract: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of said projection optical system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, the distance from said first object to the lens surface that is closest to said first group of lenses is represented by d.sub.0, the focal length of said first group of lenses is represented by f.sub.1, and the focal length of said third group of lenses is represented by f.sub.

Abstract: A projection optical system that projects an image of an object in an object surface onto an image surface with a fixed reduction magnification comprises, in light path order from the object surface: a first group of lenses with positive refractive power; a second group of lenses forming an approximately afocal system; and a third group of lenses with positive refractive power. The projection optical system has a focal length F, the projection optical system has a projection magnification B, the object surface and the image surface are separated by a distance L, and a lens surface in the first group of lenses that is closest to the object surface is separated from the object surface by a distance d.sub.0. A paraxial marginal ray from an axial object point on the object surface enters the second group of lenses G.sub.2 at an entrance height h.sub.1 from an optical axis, and the paraxial marginal ray from the axial object point on the object surface emerges from the second group of lenses G.sub.

Abstract: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first ob

Abstract: A zoom lens comprises a magnification changing system and a relay lens system succeeding the magnification changing system. The magnification changing system comprises, in succession from the object side, a first group as a focusing portion having a positive refractive power, a second group as a variator portion having a negative refractive power and movable along the optical axis to thereby change chiefly the focal length, and a third group as a compensator portion having a negative refractive power and maintaining the image plane fluctuated by movement of the variator portion at a predetermined position. The relay lens system comprises a fourth group as a forward relay system group having a positive refractive power and a fifth group as a rearward relay system group having a positive refractive power. The fourth group has three positive lens components of which at least the middle lens component is a cemented lens component having a convex cemented surface in the direction of the image side.

Abstract: In a focusing screen capable of passing light therethrough and disposed between an objective lens and an eyepiece to enable the focused condition of the objective lens with respect to an object to be observed through the eyepiece and having a surface formed with a number of pyramidical faces, the angle of inclination .alpha. of each of said pyramids satisfies an inequality that ##EQU1## where F represents the F-number of the optical system from the objective lens to the focusing screen, f the focal length of the eyepiece, n the refractive index of the focusing screen and .DELTA. the required range finding accuracy, and the focusing screen satisfies ##EQU2## where A represents the visual angle whereat a length cos .alpha. times as great as the length of the slant face extending from the bottom surface to the vertex of the pyramid at the angle of inclination .alpha. is seen through said eyepiece.

Abstract: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first ob