Patents by Inventor Toshihiro Yano

Toshihiro Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10717852
    Abstract: Provided are an abrasion resistance improver for inorganic filler-containing rubber composition capable of giving high abrasion resistance to a rubber composition containing an inorganic filler, a rubber composition containing the abrasion resistance improver for rubber composition, a tire using the rubber composition, and a method for producing the abrasion resistance improver for rubber composition.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: July 21, 2020
    Assignee: KAO CORPORATION
    Inventors: Koichi Kawamoto, Motoi Konishi, Toshihiro Yano, Hayato Yoshikawa
  • Publication number: 20180142088
    Abstract: Provided are an abrasion resistance improver for inorganic filler-containing rubber composition capable of giving high abrasion resistance to a rubber composition containing an inorganic filler, a rubber composition containing the abrasion resistance improver for rubber composition, a tire using the rubber composition, and a method for producing the abrasion resistance improver for rubber composition.
    Type: Application
    Filed: April 22, 2016
    Publication date: May 24, 2018
    Applicant: KAO CORPORATION
    Inventors: Koichi KAWAMOTO, Motoi KONISHI, Toshihiro YANO, Hayato YOSHIKAWA
  • Publication number: 20150037848
    Abstract: The invention provides a method for producing saccharide, the method including the following steps (1) and (2). In step (1), a cellulose raw material is heated in the presence of one or more additives selected from the group consisting of a nonionic surfactant and polyethylene glycol; and water, at a pH lower than 7, to thereby prepare a heat treatment product. In step (2), the treatment product prepared in step (1) to is subjected to a saccharification treatment by use of an enzyme.
    Type: Application
    Filed: February 21, 2013
    Publication date: February 5, 2015
    Applicant: KAO CORPORATION
    Inventor: Toshihiro Yano
  • Patent number: 8889044
    Abstract: The present invention relates to a method for producing mesoporous silica particles including a silica-containing outer shell portion with a mesoporous structure. The method includes the steps of: (I) pressurizing a mixed solution containing a hydrophobic organic compound, a surfactant, and an aqueous solvent by a high-pressure emulsification method so as to form an emulsion that includes emulsion droplets containing the hydrophobic organic compound; (II) adding a silica source to the emulsion so as to form a silica-containing outer shell portion with a mesoporous structure on a surface of the emulsion droplets, and precipitating composite silica particles including the outer shell portion and the emulsion droplets on an inner side relative to the outer shell portion; and (III) removing the emulsion droplets from the composite silica particles.
    Type: Grant
    Filed: December 14, 2010
    Date of Patent: November 18, 2014
    Assignee: Kao Corporation
    Inventors: Toshihiro Yano, Masaki Komatsu, Hiroji Hosokawa, Jun Yoshida
  • Patent number: 8785522
    Abstract: The present invention relates to a low-dielectric resin composition having sufficiently low dielectric constant and dissipation factor, a low-dielectric film formed of the low-dielectric resin composition, processes for producing the low-dielectric resin composition and the low-dielectric film, and a coating agent for low-dielectric films. According to the present invention, there are provided (1) a low-dielectric resin composition including hollow silica particles having an average particle size of from 0.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: July 22, 2014
    Assignee: Kao Corporation
    Inventors: Toshihiro Yano, Masaki Komatsu
  • Patent number: 8449856
    Abstract: The present invention relates to (1) hollow silica particles including an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, wherein the silica particles have an average particle diameter of from 0.05 to 10 ?m, and 80% or more of the whole silica particles have a particle diameter falling within the range of ±30% of the average particle diameter; (2) composite silica particles including silica particles which include an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, and have a BET specific surface area of 100 m2/g or more, and a hydrophobic organic compound or a polymeric organic compound incorporated inside of the silica particles; and a process for producing the hollow silica particles.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: May 28, 2013
    Assignee: Kao Corporation
    Inventors: Toshihiro Yano, Takuya Sawada
  • Patent number: 8304028
    Abstract: The present invention relates to (1) a mesoporous silica film having a mesoporous structure including meso pores having an average pore period of from 1.5 to 6 nm, wherein the meso pores are oriented in the direction of an angle of from 75 to 90° relative to a surface of the film; (2) a structure including a substrate and the mesoporous silica film formed on the substrate; and (3) a process for producing a mesoporous silica film structure which includes the steps of preparing an aqueous solution containing a specific amount of a specific cationic surfactant; immersing a substrate in the aqueous solution and then adding a specific amount of a silica source capable of forming a silanol compound when hydrolyzed, to the aqueous solution, followed by stirring the resulting mixture at a temperature of from 10 to 100° C., to form a mesoporous silica film on a surface of the substrate; and removing the cationic surfactant from the resulting mesoporous silica film structure.
    Type: Grant
    Filed: April 2, 2008
    Date of Patent: November 6, 2012
    Assignee: Kao Corporation
    Inventor: Toshihiro Yano
  • Publication number: 20120264599
    Abstract: Disclosed is a method for producing composite silica particles and hollow silica particles that can improve the utilization efficiency of a hydrophobic organic substance. It is a method for producing composite silica particles each of which is provided with an outer shell part having a mesoporous structure formed from a silica-containing component and which includes a hydrophobic organic substance in the interior of the aforementioned outer shell part, and involves adding an aqueous solvent to the hydrophobic organic substance and emulsifying, and forming the outer shell part having the mesoporous structure formed from the silica-containing component on the surface of an emulsified oil droplet of the aforementioned hydrophobic organic substance.
    Type: Application
    Filed: June 21, 2012
    Publication date: October 18, 2012
    Applicant: Kao Corporation
    Inventors: Masaki KOMATSU, Toshihiro Yano, Tomonari Okada
  • Publication number: 20120256336
    Abstract: The present invention relates to a method for producing mesoporous silica particles including a silica-containing outer shell portion with a mesoporous structure. The method includes the steps of: (I) pressurizing a mixed solution containing a hydrophobic organic compound, a surfactant, and an aqueous solvent by a high-pressure emulsification method so as to form an emulsion that includes emulsion droplets containing the hydrophobic organic compound; (II) adding a silica source to the emulsion so as to form a silica-containing outer shell portion with a mesoporous structure on a surface of the emulsion droplets, and precipitating composite silica particles including the outer shell portion and the emulsion droplets on an inner side relative to the outer shell portion; and (III) removing the emulsion droplets from the composite silica particles.
    Type: Application
    Filed: December 14, 2010
    Publication date: October 11, 2012
    Applicant: Kao Corporation
    Inventors: Toshihiro Yano, Masaki Komatsu, Hiroji Hosokawa, Jun Yoshida
  • Publication number: 20120123021
    Abstract: The present invention relates to a low-dielectric resin composition having sufficiently low dielectric constant and dissipation factor, a low-dielectric film formed of the low-dielectric resin composition, processes for producing the low-dielectric resin composition and the low-dielectric film, and a coating agent for low-dielectric films. According to the present invention, there are provided (1) a low-dielectric resin composition including hollow silica particles having an average particle size of from 0.
    Type: Application
    Filed: July 6, 2010
    Publication date: May 17, 2012
    Applicant: Kao Corporation
    Inventors: Toshihiro Yano, Masaki Komatsu
  • Publication number: 20120045646
    Abstract: The present invention relates to (1) hollow silica particles including an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, wherein the silica particles have an average particle diameter of from 0.05 to 10 ?m, and 80% or more of the whole silica particles have a particle diameter falling within the range of ±30% of the average particle diameter; (2) composite silica particles including silica particles which include an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, and have a BET specific surface area of 100 m2/g or more, and a hydrophobic organic compound or a polymeric organic compound incorporated inside of the silica particles; and a process for producing the hollow silica particles.
    Type: Application
    Filed: September 23, 2011
    Publication date: February 23, 2012
    Applicant: KAO CORPORATION
    Inventors: Toshihiro YANO, Takuya Sawada
  • Patent number: 8048394
    Abstract: The present invention relates to (1) hollow silica particles including an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, wherein the silica particles have an average particle diameter of from 0.05 to 10 ?m, and 80% or more of the whole silica particles have a particle diameter falling within the range of ±30% of the average particle diameter; (2) composite silica particles including silica particles which include an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, and have a BET specific surface area of 100 m2/g or more, and a hydrophobic organic compound or a polymeric organic compound incorporated inside of the silica particles; and a process for producing the hollow silica particles.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: November 1, 2011
    Assignee: Kao Corporation
    Inventors: Toshihiro Yano, Takuya Sawada
  • Publication number: 20100119809
    Abstract: The present invention relates to (1) a mesoporous silica film having a mesoporous structure including meso pores having an average pore period of from 1.5 to 6 nm, wherein the meso pores are oriented in the direction of an angle of from 75 to 90° relative to a surface of the film; (2) a structure including a substrate and the mesoporous silica film formed on the substrate; and (3) a process for producing a mesoporous silica film structure which includes the steps of preparing an aqueous solution containing a specific amount of a specific cationic surfactant; immersing a substrate in the aqueous solution and then adding a specific amount of a silica source capable of forming a silanol compound when hydrolyzed, to the aqueous solution, followed by stirring the resulting mixture at a temperature of from 10 to 100° C., to form a mesoporous silica film on a surface of the substrate; and removing the cationic surfactant from the resulting mesoporous silica film structure.
    Type: Application
    Filed: April 2, 2008
    Publication date: May 13, 2010
    Applicant: Kao Corporation
    Inventor: Toshihiro Yano
  • Publication number: 20100069237
    Abstract: The present invention relates to (1) hollow silica particles including an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, wherein the silica particles have an average particle diameter of from 0.05 to 10 ?m, and 80% or more of the whole silica particles have a particle diameter falling within the range of ±30% of the average particle diameter; (2) composite silica particles including silica particles which include an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, and have a BET specific surface area of 100 m2/g or more, and a hydrophobic organic compound or a polymeric organic compound incorporated inside of the silica particles; and a process for producing the hollow silica particles.
    Type: Application
    Filed: October 15, 2007
    Publication date: March 18, 2010
    Applicant: KAO CORPORATION
    Inventors: Toshihiro Yano, Takuya Sawada
  • Publication number: 20050244559
    Abstract: A method for manufacturing a drink made from beans as a raw material and a solid fermented food. It is characterized in that it comprises the steps of: preparing a stabilized suspension by homogenization-treating an aqueous slurry of whole grain-mash of beans once or a plurality of times using a homogenizer; denaturing protein by adding a coagulant and/or a pH adjustor to the stabilized suspension; and performing the dispersing treatment for making the relevant protein denaturation raw material dispersed by a physical dispersing means. In a solid fermented food, it comprises a step of fermenting for fermenting/solidifying by adding a lactic bacterium starter following the step of performing a homogenization treatment, and manufactures it via the step of maturating it if it is necessary.
    Type: Application
    Filed: June 2, 2003
    Publication date: November 3, 2005
    Inventors: Ikuo Kato, Toshihiro Yano, Hiroshi Ogawa, Nobuhiro Yajima