Patents by Inventor Toshiichi Ota

Toshiichi Ota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process of forming nanocrystal layer
    Patent number: 8382919
    Abstract: A process of forming an ultrafine crystal layer in a workpiece constituted by a metallic material. The process includes: performing a machining operation on a surface of the workpiece, so as to impart a large local strain to the machined surface of the workpiece, where the machining operation causes the machined surface of the workpiece to be subjected to a plastic working that causes to have large local strain in the form of a true strain of at least one, such that the ultrafine crystal layer is formed in a surface layer portion of the workpiece that defines the machined surface of the workpiece. Also disclosed are a nanocrystal layer forming process, a machine component having the ultrafine crystal layer or the nanocrystal layer, and a machine component producing process of producing the machine component.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: February 26, 2013
    Assignees: Toyohashi University of Technology, Univance Corporation
    Inventors: Minoru Umemoto, Yoshikazu Todaka, Tadashi Suzuki, Toshiichi Ota, Akihiro Yamashita, Shuji Tanaka
  • Process of forming ultrafine crystal layer, machine component having ultrafine crystal layer formed by the ultrafine crystal layer forming process, process of producing the machine component, process of forming nanocrystal layer, machine component having nanocrystal layer formed by the nanocrystal layer forming process, and process of producing the machine component
    Publication number: 20100151270
    Abstract: A process of forming an ultrafine crystal layer in a workpiece constituted by a metallic material. The process includes: performing a machining operation on a surface of the workpiece, so as to impart a large local strain to the machined surface of the workpiece, where the machining operation causes the machined surface of the workpiece to be subjected to a plastic working that causes to have large local strain in the form of a true strain of at least one, such that the ultrafine crystal layer is formed in a surface layer portion of the workpiece that defines the machined surface of the workpiece. Also disclosed are a nanocrystal layer forming process, a machine component having the ultrafine crystal layer or the nanocrystal layer, and a machine component producing process of producing the machine component.
    Type: Application
    Filed: November 10, 2009
    Publication date: June 17, 2010
    Inventors: Minoru Umemoto, Yoshikazu Todaka, Tadashi Suzuki, Toshiichi Ota, Akihiro Yamashita, Shuji Tanaka
  • Process of Forming Ultrafine Crystal Layer, Machine Component Having Ultrafine Crystal Layer Formed by the Ultrafine Crystal Layer Forming Process, Process of Producing the Machine Component, Process of Forming Nanocrystal Layer, Machine Component Having Nanocrystal Layer Formed by the Nanocrystal Layer Forming Process, and Process of Producing the Machine Component
    Publication number: 20080286597
    Abstract: An ultrafine crystal layer forming process of forming an ultrafine crystal layer in a workpiece constituted by a metallic material. The process includes: performing a machining operation on a surface of the workpiece using a machining tool, so as to impart a large local strain to the machined surface of the workpiece, where the machining operation using the machining tool causes the machined surface of the workpiece to be subjected to a plastic working that causes to have large local strain in the form of a true strain of at least 1, such that the ultrafine crystal layer is formed in a surface layer portion of the workpiece that defines the machined surface of the workpiece. Also disclosed are a nanocrystal layer forming process, a machine component having the ultrafine crystal layer or the nanocrystal layer, and a machine component producing process of producing the machine component.
    Type: Application
    Filed: December 14, 2004
    Publication date: November 20, 2008
    Inventors: Minoru Umemoto, Yoshikazu Todaka, Tadashi Suzuki, Toshiichi Ota, Akihiro Yamashita, Shuji Tanaka