Patents by Inventor Toshiji Nishiguchi

Toshiji Nishiguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8344094
    Abstract: An optical material is provided that has a high transmittance, a high refractive index, a low Abbe constant, a high secondary dispersion property, and a low water absorption rate. The optical material includes a polymer of a mixture which contains: a sulfur-containing compound represented by the following general formula (1): a sulfur-containing compound represented by the following general formula (2): and an energy polymerization initiator, in which a content of the sulfur-containing compound represented by the chemical formula (2) is 10% by weight or more to 60% by weight or less, an Abbe constant (?d) of the polymer of the mixture satisfies 18<?d<23, and a secondary dispersion property (?g,F) thereof satisfies 0.68<?g,F<0.69.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: January 1, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidefumi Iwasa, Shigeo Kiso, Terunobu Saitoh, Toshiji Nishiguchi
  • Publication number: 20100076106
    Abstract: Provided is an optical material which has a high transmittance, a high refractive index, a low Abbe constant, a high secondary dispersion property, and a low water absorption rate. The optical material includes a polymer of a mixture which contains: a sulfur-containing compound represented by the following general formula (1): a sulfur-containing compound represented by the following general formula (2): and an energy polymerization initiator, in which a content of the sulfur-containing compound represented by the chemical formula-2 is 10% by weight or more to 60% by weight or less, an Abbe constant (?d) of the polymer of the mixture satisfies 18<?d<23, and a secondary dispersion property (?g,F) thereof satisfies 0.68<?g,F<0.69.
    Type: Application
    Filed: September 8, 2009
    Publication date: March 25, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hidefumi Iwasa, Shigeo Kiso, Terunobu Saitoh, Toshiji Nishiguchi
  • Publication number: 20090095619
    Abstract: A gas treating method including: generating non-equilibrium plasma in a gas flow space; and treating a gas to be treated containing a substance to be treated using the non-equilibrium plasma, the non-equilibrium plasma being generated by using at least two wire-like high-voltage applying electrodes that are arranged away from each other, in between at least two flat-plate ground electrodes that are arranged face to face in parallel to each other to define the gas flow space, in a direction perpendicular to opposite sides of the flat-plate ground electrodes.
    Type: Application
    Filed: December 11, 2008
    Publication date: April 16, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Junichi Tamura, Yoshiaki Kaneko, Toshiji Nishiguchi
  • Patent number: 7279845
    Abstract: A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a high-frequency square wave at the same or substantially the same frequency and at the same or substantially the same phase are provided.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: October 9, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koji Yamaguchi, Toshiji Nishiguchi
  • Publication number: 20070053805
    Abstract: A gas decomposition apparatus including at least a set of a high-voltage electrode and a ground electrode, an electric power supply for applying a voltage between the high-voltage electrode and the ground electrode to induce a plasma discharge therebetween, a dielectric substance, and a plasma processing unit. The dielectric substance is disposed between the high-voltage electrode and the ground electrode, and is capable of allowing a gas to be decomposed to flow therethrough. The high-voltage electrode, the ground electrode, and the dielectric substance are disposed in the plasma processing unit. At least one of the high-voltage electrode and the ground electrode is composed of an elastic conductive material and is capable of matching a surface profile of the dielectric substance.
    Type: Application
    Filed: August 31, 2006
    Publication date: March 8, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yoshiaki Kaneko, Toshiji Nishiguchi, Hideo Iwama, Junichi Tamura
  • Publication number: 20050274599
    Abstract: Provided is a gas treating method, including: generating non-equilibrium plasma in a gas flow space; and treating a gas to be treated containing a substance to be treated using the non-equilibrium plasma, the non-equilibrium plasma being generated by using at least two wire-like high-voltage applying electrodes that are arranged away from each other, in between at least two flat-plate ground electrodes that are arranged face to face in parallel to each other to define the gas flow space, in a direction perpendicular to opposite sides of the flat-plate ground electrodes.
    Type: Application
    Filed: June 10, 2005
    Publication date: December 15, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Junichi Tamura, Yoshiaki Kaneko, Toshiji Nishiguchi
  • Publication number: 20050249646
    Abstract: The present invention provides a gas treatment apparatus having a plasma reactor. The plasma reactor includes plural linear ground electrodes, plural linear high-voltage electrodes, and an inorganic dielectric layer having a porous structure. The plural linear ground electrodes are disposed on a first plane in parallel to one another. The plural linear high-voltage electrodes are disposed in parallel to one another on a second plane that is parallel with the first plane. The porous inorganic dielectric layer having the porous structure is provided between the plural linear high-voltage electrodes and the plural linear ground electrodes. At least one of a set of the plural linear ground electrodes and a set of the plural linear high-voltage electrodes is entirely covered with an inorganic dielectric.
    Type: Application
    Filed: April 28, 2005
    Publication date: November 10, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hideo Iwama, Toshiji Nishiguchi
  • Publication number: 20050244310
    Abstract: A gas treatment apparatus for treating gas with non-thermal plasma includes dielectric elements disposed in a space between electrodes. The dielectric elements each include a ferroelectric core covered with adsorbent that supports a metal catalyst or that is mixed with a metal catalyst.
    Type: Application
    Filed: December 30, 2004
    Publication date: November 3, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Junichi Tamura, Toshiji Nishiguchi
  • Publication number: 20050212441
    Abstract: A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a high-frequency square wave at the same or substantially the same frequency and at the same or substantially the same phase are provided.
    Type: Application
    Filed: March 16, 2005
    Publication date: September 29, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Koji Yamaguchi, Toshiji Nishiguchi
  • Publication number: 20050214181
    Abstract: A plasma generator for producing plasma under normal pressure by applying a voltage between a ground electrode and a high-voltage electrode, the plasma generator including the ground electrode, the high-voltage electrode, and a dielectric member arranged between the ground electrode and the high-voltage electrode, in which the dielectric member has a structure including a porous ceramic substrate covered with an inorganic dielectric substance.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 29, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yoshiaki Kaneko, Toshiji Nishiguchi
  • Patent number: 6635996
    Abstract: A plasma generating apparatus comprises a pair of electrodes consisting of an electrode connected to an AC power source and a grounded electrode. An inorganic dielectric substance containing barium titanate as a principal component is filled between the electrodes. It is possible to generate a stable and uniform glow discharge under the atmospheric pressure at low cost by applying a considerably low voltage between said electrodes.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: October 21, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ikuo Nakajima, Toshiji Nishiguchi
  • Patent number: 6621227
    Abstract: Provided are a discharge generating apparatus, a discharge generating method, and a gas decomposing method capable of generating a large amount of an atmospheric plasma and increasing processing efficiency of a plasma processing, gas decomposition, or the like, by such a configuration that at least either one of high-potential and low-potential electrodes is comprised of a plurality of electrodes, a space between the electrodes is filled with an inorganic dielectric having a structure permitting flow of a gas, and a glow discharge is generated between the electrodes to change the gas existing between the electrodes, into a plasma under ordinary pressure.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: September 16, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiji Nishiguchi, Ikuo Nakajima, Hiromi Aoyagi
  • Publication number: 20020148562
    Abstract: A plasma reaction apparatus or a plasma reaction method have a configuration in which high-potential and low-potential electrodes are placed in a reactor and in which an inorganic dielectric having a structure permitting a gas to flow therethrough is filled between the electrodes, and is adapted to generate a discharge between the electrodes to change a gas existing between the electrodes into a plasma. The plasma reaction apparatus and method are configured to control the temperature inside the reactor and thereby process the gas on the basis of a stable plasma reaction.
    Type: Application
    Filed: April 2, 2002
    Publication date: October 17, 2002
    Inventors: Hiromi Aoyagi, Toshiji Nishiguchi, Junichi Tamura
  • Patent number: 5334258
    Abstract: Disclosed is a washing method in which parts and products are washed free of residual smudges without using fleon-family solvents. The method of washing members such as parts or products comprises a first degreasing step for degreasing in nonaqueous liquid the members to be washed after worked, a second degreasing step for degreasing the members being washed in an aqueous liquid which dissolves the nonaqueous liquid, a finish washing step for washing in the aqueous liquid, a rinsing step, and a drying step, wherein the drying step is performed in a plurality of pure water baths, the temperature of a last pure water bath is established to a range of 70.degree. to 85.degree. C., and the washed members are taken out from the pure water bath for drying the surfaces thereof.Also, the washing method is disclosed in which pure water in a plurality of the pure water baths has temperature gradient in the sequence of washing steps.
    Type: Grant
    Filed: July 14, 1992
    Date of Patent: August 2, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nagato Osano, Yukihiro Imai, Akihito Hosaka, Ikuo Nakajima, Toshiji Nishiguchi, Akira Horie
  • Patent number: 5026395
    Abstract: An intraocular lens having a lens base and a coating layer disposed on or otherwise operably associated with a first surface of the lens base. The coating layer is formed by, for example, plasma polymerization of a monomer gas while simultaneously sublimating or evaporating an ultraviolet absorber, thereby forming an intraocular lens which absorbs ultraviolet rays and prevents any free monomer or other substance from oozing out of the lens base and permeating the eye. The properties of the intraocular lens can be readily varied by selecting different monomer gases.
    Type: Grant
    Filed: May 25, 1989
    Date of Patent: June 25, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ikuo Nakajima, Moriyuki Okamura, Toshiji Nishiguchi
  • Patent number: 5007928
    Abstract: The intraocular implant comprises a lens substrate and a coating layer with an adhesion layer provided therebetween, the adhesion layer comprising a specific compound.
    Type: Grant
    Filed: May 26, 1989
    Date of Patent: April 16, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Moriyuki Okamura, Ikuo Nakajima, Toshiji Nishiguchi
  • Patent number: 4955901
    Abstract: An intraocular implant comprises a lens substrate having on the surface thereof a coating layer, the coating layer being comprised of a specific compound.
    Type: Grant
    Filed: May 30, 1989
    Date of Patent: September 11, 1990
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiji Nishiguchi, Moriyuki Okamura, Ikuo Nakajima