Patents by Inventor Toshiju Kunibe

Toshiju Kunibe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion source and plasma processing apparatus
    Patent number: 8356575
    Abstract: It is an object of this invention to provide an ion source and a plasma processing apparatus capable of generating stable and long-life plasma. The ion source is provided with a high-frequency antenna (16) installed on the outer peripheral side of a partition wall (15) made of a dielectric material and partitioning a plasma generating chamber (14) and a shield body (26) made of a dielectric material and preventing deposition on the inner peripheral surface of the partition wall (15) facing the high-frequency antenna (16) inside the plasma generating chamber (14). The structure made of a dielectric material can prevent an increase in high-frequency power required for inductive coupling with plasma. The shield body (26) is formed with a slot (26a) in a direction crossing a winding direction of the high-frequency antenna (16).
    Type: Grant
    Filed: September 7, 2006
    Date of Patent: January 22, 2013
    Assignee: Ulvac, Inc.
    Inventors: Naruyasu Sasaki, Saburou Shimizu, Toshiju Kunibe
  • Ion source and plasma processing apparatus
    Publication number: 20090250340
    Abstract: It is an object of this invention to provide an ion source and a plasma processing apparatus capable of generating stable and long-life plasma. The ion source is provided with a high-frequency antenna (16) installed on the outer peripheral side of a partition wall (15) made of a dielectric material and partitioning a plasma generating chamber (14) and a shield body (26) made of a dielectric material and preventing deposition on the inner peripheral surface of the partition wall (15) facing the high-frequency antenna (16) inside the plasma generating chamber (14). The structure made of a dielectric material can prevent an increase in high-frequency power required for inductive coupling with plasma. The shield body (26) is formed with a slot (26a) in a direction crossing a winding direction of the high-frequency antenna (16).
    Type: Application
    Filed: September 7, 2006
    Publication date: October 8, 2009
    Inventors: Naruyasu Sasaki, Saburou Shimizu, Toshiju Kunibe