Patents by Inventor Toshikatsu Matsuya

Toshikatsu Matsuya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6595844
    Abstract: A core drill having a shank and a cup shaped base metal section constructed of a disk shaped top wall and a cylindrical side wall provided on a fore-end of the shank. A grinding stone portion is mounted on an outer end part of the base metal section, with abrasive grains fixed to the outer end part of the base metal section. Abrasive grain layers are formed in a spiral pattern on inner and outer side surfaces of the cylindrical side wall of the base metal section, with abrasive grains fixed to the inner and outer side surfaces of the cylindrical side wall thereof. When the grinding stone portion is put into rotational contact with a workpiece, the workpiece is ground through to form a circle hole in section leaving a cylindrical core therein.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: July 22, 2003
    Assignees: Atock Co., Ltd., Shin-Etsu Quartz Products Co., Ltd., Yamagata Shin-Etsu Quartz Co., Ltd.
    Inventors: Toru Mizuno, Ikuo Hattori, Akihiko Sugama, Toshikatsu Matsuya, Yoshiaki Ise
  • Patent number: 6595845
    Abstract: The present invention relates to an outer-diameter blade, an inner-diameter blade and cutting machines which respectively use the outer-diameter blade and the inner-diameter blade for cutting hard material, such as metal, ceramics, semiconductor single crystal, glass, quartz crystal, stone, asphalt or concrete, and a core drill and a core-drill processing machine which drives the core drill for forming a hole in the hard material.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: July 22, 2003
    Assignees: Atock Co., Ltd., Shin-Etsu Quartz Products Co., Ltd., Yamagata Shin-Etsu Quartz Co., Ltd.
    Inventors: Toru Mizuno, Ikuo Hattori, Akihiko Sugama, Toshikatsu Matsuya, Yoshiaki Ise
  • Patent number: 6209353
    Abstract: A known method for producing an object having a flanged tubular portion at the outer periphery, comprises supplying a continuously extended, cylindrical body made of the flange material to a welding zone at the tubular portion of the object and welding the flange material to the welding zone by heating and winding the cylindrical body around the object.
    Type: Grant
    Filed: February 25, 1998
    Date of Patent: April 3, 2001
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Toshikatsu Matsuya, Yoshiaki Ise, Shoji Takahashi
  • Patent number: 6203416
    Abstract: Provided are an outer-diameter blade, an inner-diameter blade and cutting machines using both blades for cutting hard material, and a core drill and a core-drill processing machine for forming a hole into hard material, whereby the mechanical processing with reduction in the cutting and/or contact resistance to the tools is realized, so that in the case of the outer-diamond blade, it is prevented from occurring that a to-be-cut object is warped and put into contact to the blade to cause chipping; in the case of the inner-diameter blade, it is prevented from occurring that the blade is bowed and/or a cutting surface is curved; and in the case of the core drill, not only are grinding powder of a workpiece and loosed-off abrasive grains effectively removed to prevent those from being loaded between the drill and the workpiece, but neither of cracking and chipping occur when the drill passes through the workpiece.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: March 20, 2001
    Assignees: Atock Co., Ltd., Shin-Etsu Quartz Products Co., Ltd., Yamagata Shin-Etsu Quartz Co., Ltd.
    Inventors: Toru Mizuno, Ikuo Hattori, Akihiko Sugama, Toshikatsu Matsuya, Yoshiaki Ise
  • Patent number: 6094941
    Abstract: An excellent quartz glass optical member having stable laser beam resistance, can be obtained by preparing quartz glass in a process having:a first step of subjecting a starting material obtained from silicon halide, alkoxysilane, alkylalkoxysilane, etc. to an oxidizing heat treatment in a temperature range between 600 and 1,500.degree. C., to decrease the hydrogen concentration to 5.times.10.sup.16 molecules/cm.sup.3 or less and at the same time eliminate reducing defects;a second step of subsequently holding the quartz in a hydrogen-containing atmosphere in a temperature range between 200 and 600.degree. C., to establish a hydrogen concentration in the glass of 1.times.10.sup.17 molecules/cm.sup.3 ; anda third step of carrying out a treatment of making the hydrogen concentration of the resultant quartz glass uniform in an atmosphere of air, inert gas, hydrogen, a mixture of hydrogen and inert gas, or a mixture of air and inert gas in a temperature range between 300 and 800.degree. C.
    Type: Grant
    Filed: July 15, 1998
    Date of Patent: August 1, 2000
    Assignee: Shin-Etsu Quartz Products Co., Ltd.
    Inventors: Akira Fujinoki, Toshikatsu Matsuya, Hiroyuki Nishimura
  • Patent number: 5523266
    Abstract: A synthetic quartz glass optical member for an ultraviolet laser, where the quartz glass has a hydroxyl content of 10-100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less.
    Type: Grant
    Filed: August 5, 1994
    Date of Patent: June 4, 1996
    Assignee: Shin-Etsu Quartz Products Company Limited
    Inventors: Hiroyuki Nishimura, Akira Fujinoki, Toshikatsu Matsuya, Kyoichi Inaki, Toshiyuki Kato, Atsushi Shimada
  • Patent number: 5364433
    Abstract: A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1.times.10.sup.-2 Torr or above to a temperature of 1,400 .degree. C.
    Type: Grant
    Filed: May 15, 1993
    Date of Patent: November 15, 1994
    Assignee: Shin-Etsu Quartz Products Company Limited
    Inventors: Hiroyuki Nishimura, Akira Fujinoki, Toshikatsu Matsuya, Kyoichi Inaki, Toshiyuki Kato, Atsushi Shimada