Patents by Inventor Toshikazu Takata
Toshikazu Takata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180057450Abstract: The present invention provides a compound of the formula (I): wherein, A is R6(R7)s, N, O, S, or —NR5—; R6 is an s-valent organic group; R7 is each independently, —O—, —S—, —NR5— or —O—P(?O)OR4?—; R2 and R3 are each independently a hydrogen atom or a hydrocarbon group; R4? is each independently, a hydrocarbon group; R5 is each independently, a hydrogen atom or a hydrocarbon group; and s is an integer of 1-10.Type: ApplicationFiled: March 10, 2016Publication date: March 1, 2018Applicants: DAIKIN INDUSTRIES, LTD., TOKYO INSTITUTE OF TECHNOLOGYInventors: Tadashi KANBARA, Tsuyoshi NOGUCHI, Toshikazu TAKATA, Hiromitsu SOGAWA, Toyokazu TSUTSUBA
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Publication number: 20180057635Abstract: Disclosed is a production method comprising a step of obtaining a poly(arylene sulfonium salt) comprising a terminal group including at least one functional group selected from the group consisting of a carboxy group, a hydroxy group and an amino group, and a step of dealkylating or dearylating the poly(arylene sulfonium salt) to obtain a polyarylene sulfide resin, and a polyarylene sulfide resin comprising a terminal group including a functional group obtainable by the production method.Type: ApplicationFiled: February 23, 2016Publication date: March 1, 2018Applicants: DIC Corporation, National University Corporation, Iwate UniversityInventors: Shun ARAKI, Hajime WATANABE, Satoshi OGAWA, Toshikazu TAKATA
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Publication number: 20180050983Abstract: The present invention provides a compound of the formula (I): wherein, R1 is a hydrogen atom or a hydrocarbon group; R2 is —R4—R5; R3 is —R4—R5 or —R4—R6; R4 is a divalent organic group; R5 is OH, SH, COOH or NHR9; R9 is a hydrogen atom or an alkyl group having 1-6 carbon atoms; and R6 is a hydrogen atom or an alkyl group having 1-6 carbon atoms.Type: ApplicationFiled: March 10, 2016Publication date: February 22, 2018Applicants: DAIKIN INDUSTRIES, LTD., TOKYO INSTITUTE OF TECHNOLOGYInventors: Tadashi KANBARA, Tsuyoshi NOGUCHI, Toshikazu TAKATA, Hiromitsu SOGAWA, Shunsuke MONJIYAMA, Toyokazu TSUTSUBA
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Publication number: 20170218125Abstract: The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: a step of reacting a poly(arylenesulfonium salt) having a constitutional unit represented by the following formula (1) with an aliphatic amide compound to obtain a polyarylene sulfide resin having a constitutional unit represented by the following formula (2): wherein R1 represents a direct bond, —Ar2—, —Ar2—S— or —Ar2—O—; Ar1 and Ar2 each represent an arylene group optionally having a functional group as a substituent; R2 represents an alkyl group having 1 to 10 carbon atoms or an aromatic group optionally having an alkyl group having 1 to 10 carbon atoms as a substituent; and X? represents an anion, wherein R1 and Ar1 are the same as described above.Type: ApplicationFiled: April 18, 2017Publication date: August 3, 2017Inventors: Hajime Watanabe, Takashi Furusawa, Satoshi Ogawa, Toshikazu Takata
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Publication number: 20170218126Abstract: The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit, wherein R1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar1 and Ar2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.Type: ApplicationFiled: April 11, 2017Publication date: August 3, 2017Inventors: Hajime Watanabe, Takashi Furusawa, Satoshi Ogawa, Toshikazu Takata
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Patent number: 9657142Abstract: The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit, wherein R1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar1 and Ar2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.Type: GrantFiled: September 2, 2014Date of Patent: May 23, 2017Assignees: DIC Corporation, National University Corporation, Iwate UniversityInventors: Hajime Watanabe, Takashi Furusawa, Satoshi Ogawa, Toshikazu Takata
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Patent number: 9657141Abstract: The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: a step of reacting a poly(arylenesulfonium salt) having a constitutional unit represented by the following formula (1) with an aliphatic amide compound to obtain a polyarylene sulfide resin having a constitutional unit represented by the following formula (2): wherein R1 represents a direct bond, —Ar2—, —Ar2—S— or —Ar2—O—; Ar1 and Ar2 each represent an arylene group optionally having a functional group as a substituent; R2 represents an alkyl group having 1 to 10 carbon atoms or an aromatic group optionally having an alkyl group having 1 to 10 carbon atoms as a substituent; and X? represents an anion, wherein R1 and Ar1 are the same as described above.Type: GrantFiled: September 2, 2014Date of Patent: May 23, 2017Assignees: DIC Corporation, National University Corporation, Iwate UniversityInventors: Hajime Watanabe, Takashi Furusawa, Satoshi Ogawa, Toshikazu Takata
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Patent number: 9637446Abstract: A stable and easily producible compound of the formula (I): wherein R1 represents a hydrocarbon group; and R2 and R3 represent each independently a hydrogen atom or a hydrocarbon group: provided that in at least one of R1, R2 and R3, at least one hydrogen atoms are substituted by a fluorine atom, and each of R1, R2 and R3 is attached via its carbon atom to a carbon atom to which a nitrileoxide group is attached.Type: GrantFiled: March 7, 2014Date of Patent: May 2, 2017Assignees: DAIKIN INDUSTRIES, LTD., TOKYO INSTITUTE OF TECHNOLOGYInventors: Tadashi Kanbara, Tsuyoshi Noguchi, Haruhiko Mouri, Toshikazu Takata, Yasuhito Koyama, Satoshi Uchida, ChenGang Wang, Cheawchan Sumitra
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Patent number: 9518009Abstract: The present invention provides a compound of the formula (I): wherein: R2 and R3 represent each independently a hydrogen atom or a hydrocarbon group; A represents an s-valent organic group; and s is an integer of 2-10. This nitrileoxide compound has stable and can be easily produced.Type: GrantFiled: March 6, 2015Date of Patent: December 13, 2016Assignees: DAIKIN INDUSTRIES, LTD., TOKYO INSTITUTE OF TECHNOLOGYInventors: Tadashi Kanbara, Tsuyoshi Noguchi, Haruhisa Masuda, Haruhiko Mouri, Toshikazu Takata, Satoshi Uchida, Yasuhito Koyama, ChenGang Wang, Shunsuke Monjiyama, Hiromitsu Sogawa
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Publication number: 20160200874Abstract: The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit, wherein R1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar1 and Ar2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.Type: ApplicationFiled: September 2, 2014Publication date: July 14, 2016Inventors: Hajime Watanabe, Takashi Furusawa, Satoshi Ogawa, Toshikazu Takata
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Publication number: 20160194450Abstract: The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: a step of reacting a poly(arylenesulfonium salt) having a constitutional unit represented by the following formula (1) with an aliphatic amide compound to obtain a polyarylene sulfide resin having a constitutional unit represented by the following formula (2): wherein R1 represents a direct bond, —Ar2—, —Ar2—S— or —Ar2—O—; Ar1 and Ar2 each represent an arylene group optionally having a functional group as a substituent; R2 represents an alkyl group having 1 to 10 carbon atoms or an aromatic group optionally having an alkyl group having 1 to 10 carbon atoms as a substituent; and X? represents an anion, wherein R1 and Ar1 are the same as described above.Type: ApplicationFiled: September 2, 2014Publication date: July 7, 2016Applicants: DIC Corporation, National University Corporation, Iwate University, National University Corporation, Iwate UniversityInventors: Hajime Watanabe, Takashi Furusawa, Satoshi Ogawa, Toshikazu Takata
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Publication number: 20160002153Abstract: A stable and easily producible compound of the formula (I): wherein R1 represents a hydrocarbon group; and R2 and R3 represent each independently a hydrogen atom or a hydrocarbon group: provided that in at least one of R1, R2 and R3, at least one hydrogen atoms are substituted by a fluorine atom, and each of R1, R2 and R3 is attached via its carbon atom to a carbon atom to which a nitrileoxide group is attached.Type: ApplicationFiled: March 7, 2014Publication date: January 7, 2016Applicants: TOKYO INSTITUTE OF TECHNOLOGY, DAIKIN INDUSTRIES, LTD.Inventors: Tadashi KANBARA, Tsuyoshi NOGUCHI, Haruhiko MOURI, Toshikazu TAKATA, Yasuhito KOYAMA, Satoshi UCHIDA, ChenGang WANG, Cheawchan SUMITRA
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Publication number: 20150251995Abstract: The present invention provides a compound of the formula (I): wherein: R2 and R3 represent each independently a hydrogen atom or a hydrocarbon group; A represents an s-valent organic group; and s is an integer of 2-10. This nitrileoxide compound has stable and can be easily produced.Type: ApplicationFiled: March 6, 2015Publication date: September 10, 2015Applicants: TOKYO INSTITUTE OF TECHNOLOGY, DAIKIN INDUSTRIES, LTD.Inventors: Tadashi KANBARA, Tsuyoshi NOGUCHI, Haruhisa MASUDA, Haruhiko MOURI, Toshikazu TAKATA, Satoshi UCHIDA, Yasuhito KOYAMA, ChenGang WANG, Shunsuke MONJIYAMA, Hiromitsu SOGAWA
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Patent number: 9018339Abstract: A diol from which a resin material having high processability and a high refractive index can be manufactured, a polycarbonate resin and a polyester resin which is a polymer of the diol, and a molded article and an optical element formed of the polymer. The diol is represented by the general formula (1) shown below; the polycarbonate resin and the polyester resin are polymers thereof; and the molded article and the optical element are formed of the polymers, wherein R1 and R2 each independently denote one of a hydrogen atom and an alkyl group having 1 or more and 6 or less carbon atoms; Q denotes one of an oxyethylene group, a thioethylene group and a single bond.Type: GrantFiled: March 10, 2010Date of Patent: April 28, 2015Assignee: Canon Kabushiki KaishaInventors: Katsumoto Hosokawa, Takahiro Kojima, Toshikazu Takata, Kazuko Nakazono, Yasuhiro Kohsaka, Yasuhito Koyama, Toshihide Hasegawa, Ryota Seto
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Patent number: 8809454Abstract: A pressure-sensitive adhesive layer of pressure-sensitive adhesive sheet is formed by using: a pressure-sensitive adhesive composition comprising (A) a polyrotaxane having a linear-chain molecule passing through opening portions of at least two cyclic molecules, the cyclic molecules having a reactive group, the polyrotaxane having blocking groups at both ends of the linear-chain molecule, and (B) a pressure-sensitive adhesive polymer having two or more functional groups capable of reacting with the reactive group; or, a pressure-sensitive adhesive composition comprising (A) a polyrotaxane having a linear-chain molecule passing through opening portions of at least two cyclic molecules, the cyclic molecules having a reactive group, the polyrotaxane having blocking groups at both ends of the linear-chain molecule, (B?) a pressure-sensitive adhesive polymer having two or more reactive groups, and (C) a compound having two or more functional groups capable of reacting with the reactive group of the polyrotaxane (AType: GrantFiled: February 21, 2007Date of Patent: August 19, 2014Assignee: Lintec CorporationInventors: Takayuki Arai, Mikihiro Kashio, Toshikazu Takata
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Patent number: 8735531Abstract: A diol from which a resin material having high processability and a high refractive index can be manufactured, a polycarbonate resin and a polyester resin which is a polymer of the diol, and a molded article and an optical element formed of the polymer. The diol is represented by the general formula (1) shown below; the polycarbonate resin and the polyester resin are polymers thereof; and the molded article and the optical element are formed of the polymers, wherein R1 and R2 each independently denote one of a hydrogen atom and an alkyl group having 1 or more and 6 or less carbon atoms; Q denotes one of an oxyethylene group, a thioethylene group and a single bond.Type: GrantFiled: March 13, 2013Date of Patent: May 27, 2014Assignee: Canon Kabushiki KaishaInventors: Katsumoto Hosokawa, Takahiro Kojima, Toshikazu Takata, Kazuko Nakazono, Yasuhiro Kohsaka, Yasuhito Koyama, Toshihide Hasegawa, Ryota Seto
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Crosslinker, crosslinked polymer material, and production method of the crosslinked polymer material
Patent number: 8530585Abstract: The present invention provides a crosslinker used for crosslinking a polymer material having, in the molecule thereof, a multiple bond reactable with a nitrile oxide, the crosslinker including a bifunctional nitrile oxide having an aromatic nitrile oxide derivative structure in which one hydrogen atom of an aromatic ring is substituted with a nitrile oxide group and all hydrogen atoms at an ortho-position of the nitrile oxide group are substituted with a substituent other than a nitrile oxide group, wherein two such aromatic nitrile oxide derivative structures are bonded to either two oxy groups of a di-oxy structure having the two oxy groups or two carbonyl groups of a di-carbonyl structure having the two carbonyl groups.Type: GrantFiled: February 18, 2011Date of Patent: September 10, 2013Assignees: Toyoda Gosei Co., Ltd., Tokyo Institute of TechnologyInventors: Akishige Seo, Hideyuki Imai, Naoki Iwase, Toshikazu Takata, Yasuhito Koyama, Morio Yonekawa -
Patent number: 8507611Abstract: The present invention provides a production method of a crosslinkable polymer material which includes adding 2 -(glycidyloxy)-1-naphthonitrile oxide or 2-[5 -(ethoxycarbonyl)pentyloxy]-1-naphthonitrile oxide by an addition reaction to a polymer material having a multiple bond to which a nitrile oxide is added by an addition reaction so as to introduce a glycidyl group or an ethoxycarbonyl group into the polymer material.Type: GrantFiled: February 21, 2011Date of Patent: August 13, 2013Assignees: Toyoda Gosei Co., Ltd., Tokyo Institute of TechnologyInventors: Akishige Seo, Hideyuki Imai, Naoki Iwase, Yusuke Katono, Toshikazu Takata, Yasuhito Koyama, Kaori Miura
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Patent number: 8507610Abstract: The present invention provides a production method of a modified polymer material produced by modifying a polymer material having in a molecule thereof a multiple bond that reacts with a nitrile oxide, includes reacting the polymer material with an aromatic nitrile oxide derivative having a substituent at an ortho-position of a nitrile oxide group of an aromatic nitrile oxide in which the nitrile oxide group is bonded to an aromatic ring.Type: GrantFiled: February 25, 2010Date of Patent: August 13, 2013Assignees: Toyoda Gosei Co., Ltd., Tokyo Institute of TechnologyInventors: Akishige Seo, Hideyuki Imai, Naoki Iwase, Toshikazu Takata, Yasuhito Koyama
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Patent number: 8207357Abstract: An antitumor agent which is not easily excreted from tumor cells and is suitable for a topical treatment. Specifically disclosed is a rotaxane compound with contains a compound represented by chemical formula 1 as the base structure. (In chemical formula 1, m?2, n?3, and X represents an anionic molecule or an anionic atom.Type: GrantFiled: October 21, 2009Date of Patent: June 26, 2012Assignees: Wan Station Co., Ltd., Tokyo Institute of Technology, Fukuoka University, Kinki UniversityInventors: Toshikazu Takata, Yasuhito Koyama, Kazuko Nakazono, Toshihide Hasegawa, Young-Gi Lee, Nobufumi Ono, Kazuto Nishio, Yoshihiko Fujita