Abstract: A planar antenna includes a dielectric layer including a first surface and a second surface on a side opposite from the first surface, an antenna conductor provided on the first surface, a ground conductor provided on the first surface or the second surface, or provided on both of the first surface and the second surface, and a transmission line including a signal line that is connected to the antenna conductor or provided in proximity to the antenna conductor, wherein a dielectric portion of the dielectric layer that is in contact with the signal line has a loss tangent of 0.007 or less at 28 GHz.

Abstract: An input device includes a touch panel having an operation surface and configured to receive a touch input and a hover input by an operation body; a display device configured to display a plurality of selection items; a memory; and a processor coupled to the memory. The processor is configured to highlight a selection item, a selection of the selection item being made by the hover input from the plurality of selection items, confirm the selection of the selection item by the hover input in a case where a duration during which the selection item is selected by the hover input reaches a first predetermined threshold, and confirm a selection of the selection item by the touch input in a case where the touch input is detected on the selection item before the duration reaches the first predetermined threshold.

Abstract: A lithium ion conductive material that excels in mechanical strength, exhibiting high ion conductivity; a bacterial cellulose composite material having an inorganic material and/or organic material incorporated therein; and a bacterial cellulose aerogel. The water of bacterial cellulose hydrogel is replaced by a nonaqueous solvent containing a lithium compound. Bacterial cellulose producing bacteria are grown in a culture medium having an inorganic material and/or organic material added thereto. The bacterial cellulose hydrogel is dehydrated and dried.

Abstract: The invention relates to a porous nano material polymer composite. The porous nano material polymer composite according to the invention is prepared by impregnating monomer in the nanometer order holes of a nano material by supercritical carbon dioxide fluid, and by polymerizing the monomer in situ. Therefore, the polymer composite has a network structure in which polymer penetrates into nano pores.

Abstract: An ethylene-vinyl alcohol copolymer, represented by the formula (1): wherein n represents a number in the range of 15 to 15,000, and a method of producing an ethylene-vinyl alcohol copolymer wherein an 1,4 -polybutadiene is hydroborated in non-gel state in a solvent, followed by oxidation to be hydroxylated so as to derive an ethylene-vinyl alcohol copolymer represented by the formula (1): wherein n represents a number in the range of 15 to 15,000.

Abstract: According to the present invention, an ethylene-vinyl alcohol copolymer having a novel structure, and a method of producing the same are provided.

Abstract: A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 35 &mgr;m film made by imidating ring closure on a silicon substrate has a light transmittance at a wavelength of 365 nm of at least 1% and a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.

Abstract: A 6,6′-dialkyl-3,3′,4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern. wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.

Abstract: A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 35 &mgr;m film made by imidating ring closure on a silicon substrate has a light transmittance at a wavelength of 365 nm of at least 1% and a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.

Abstract: A 6,6′-dialkyl-3,3′,4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to 1-line, developed and heated to form a polyimide relief pattern.

Abstract: A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 10 &mgr;m thick layer of precursor has light transmittance at a wavelength of 365 nm of at least 1% and a 10 &mgr;m thick polyimide film made from the resin composition by imidation ring closure and deposited on a silicon substrate results in a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.

Abstract: A 6,6′-dialkyl-3,3′4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.