Patents by Inventor Toshiki Hosaka

Toshiki Hosaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum processing apparatus and substrate transfer method
    Patent number: 7201851
    Abstract: An etching processing apparatus 1 has a transfer chamber 2, a plurality of processing chambers 3 and 4, and a plurality of cassette chambers 7 and 8. Inside the transfer chamber 2, a transfer mechanism 14 is provided. A control device 17 pauses the operation of the vacuum pump 16 after closing an opening/closing valve 15 of a vacuum evacuating mechanism, which vacuum evacuates the transfer chamber 2 in which the transfer mechanism 14 is provided, when the operation of the transfer mechanism 14 is paused for a predetermined time or longer. Accordingly, conservation of energy becomes possible without causing decrease of productivity.
    Type: Grant
    Filed: October 27, 2005
    Date of Patent: April 10, 2007
    Assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Toshihiko Kitoku, Shinji Niwa, Toshiki Hosaka, Takashi Kitazawa, Atsuo Sanda, Yoshitaka Sato
  • Vacuum processing apparatus and substrate transfer method
    Publication number: 20060032074
    Abstract: An etching processing apparatus 1 has a transfer chamber 2, a plurality of processing chambers 3 and 4, and a plurality of cassette chambers 7 and 8. Inside the transfer chamber 2, a transfer mechanism 14 is provided. A control device 17 pauses the operation of the vacuum pump 16 after closing an opening/closing valve 15 of a vacuum evacuating mechanism, which vacuum evacuates the transfer chamber 2 in which the transfer mechanism 14 is provided, when the operation of the transfer mechanism 14 is paused for a predetermined time or longer. Accordingly, conservation of energy becomes possible without causing decrease of productivity.
    Type: Application
    Filed: October 27, 2005
    Publication date: February 16, 2006
    Applicants: TOKYO ELECTRON LIMITED, KABUSHIKI KAISHA TOSHIBA
    Inventors: Toshihiko Kitoku, Shinji Niwa, Toshiki Hosaka, Takashi Kitazawa, Atsuo Sanda, Yoshitaka Sato
  • Vacuum processing apparatus and substrate transfer method
    Patent number: 6990747
    Abstract: An etching processing apparatus 1 has a transfer chamber 2, a plurality of processing chambers 3 and 4, and a plurality of cassette chambers 7 and 8. Inside the transfer chamber 2, a transfer mechanism 14 is provided. A control device 17 pauses the operation of the vacuum pump 16 after closing an opening/closing valve 15 of a vacuum evacuating mechanism, which vacuum evacuates the transfer chamber 2 in which the transfer mechanism 14 is provided, when the operation of the transfer mechanism 14 is paused for a predetermined time or longer. Accordingly, conservation of energy becomes possible without causing decrease of productivity.
    Type: Grant
    Filed: April 12, 2004
    Date of Patent: January 31, 2006
    Assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Toshihiko Kitoku, Shinji Niwa, Toshiki Hosaka, Takashi Kitazawa, Atsuo Sanda, Yoshitaka Sato
  • Vacuum processing apparatus and substrate transfer method
    Publication number: 20040255485
    Abstract: An etching processing apparatus 1 has a transfer chamber 2, a plurality of processing chambers 3 and 4, and a plurality of cassette chambers 7 and 8. Inside the transfer chamber 2, a transfer mechanism 14 is provided. A control device 17 pauses the operation of the vacuum pump 16 after closing an opening/closing valve 15 of a vacuum evacuating mechanism, which vacuum evacuates the transfer chamber 2 in which the transfer mechanism 14 is provided, when the operation of the transfer mechanism 14 is paused for a predetermined time or longer. Accordingly, conservation of energy becomes possible without causing decrease of productivity.
    Type: Application
    Filed: April 12, 2004
    Publication date: December 23, 2004
    Applicants: TOKYO ELECTRON LIMITED, KABUSHIKI KAISHA TOSHIBA
    Inventors: Toshihiko Kitoku, Shinji Niwa, Toshiki Hosaka, Takashi Kitazawa, Atsuo Sanda, Yoshitaka Sato