Patents by Inventor Toshiki Kadota

Toshiki Kadota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • X-ray lithography mask and method for manufacturing the same
    Patent number: 4152601
    Abstract: An x-ray lithography mask including a thick silicon peripheral rib with a window formed therein and a multi-layered membrane transparent to x-rays and visible light supported by the rib and covering the window. The membrane consists essentially of at least two silicon nitride layers and at least one silicon oxide layer sandwiched between the silicon nitride layers. The silicon nitride layers are preferably positioned at opposite surfaces of the multi-layered membrane.
    Type: Grant
    Filed: October 19, 1977
    Date of Patent: May 1, 1979
    Assignees: Nippon Telegraph & Telephone Public Corporation, Nippon Electric Co., Ltd.
    Inventors: Toshiki Kadota, Toshiro Ono, Katsumi Suzuki, Yasuo Iida