Patents by Inventor Toshiki Kito

Toshiki Kito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7208263
    Abstract: A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray of active light, (2) the development step of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer that forms the latent image into a developer that contains water as a main component, and (3) the drying step of removing the developer from the printing plate having the relief image, the method being characterized in that a photosensitive resin layer component-dissolved or dispersed developer produced in the development step is subjected to a reduced pressure distillation, and is therefore reused as a developer, and a residue produced by the reduced pressure distillation is solidified.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: April 24, 2007
    Assignee: Toray Industries, Inc.
    Inventors: Kumiko Asato, Shinji Tanaka, Toshiki Kito, Katsuhiro Uehara
  • Publication number: 20040182266
    Abstract: A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray of active light, (2) the development step of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer that forms the latent image into a developer that contains water as a main component, and (3) the drying step of removing the developer from the printing plate having the relief image, the method being characterized in that a photosensitive resin layer component-dissolved or dispersed developer produced in the development step is subjected to a reduced pressure distillation, and is therefore reused as a developer, and a residue produced by the reduced pressure distillation is solidified.
    Type: Application
    Filed: December 30, 2003
    Publication date: September 23, 2004
    Inventors: Kumiko Asato, Shinji Tanaka, Toshiki Kito, Katsuhiro Uehara