Patents by Inventor Toshiki Nakajima

Toshiki Nakajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210375597
    Abstract: A plasma processing apparatus includes a baffle structure between a mounting table and a processing chamber. The baffle structure has a first member and a second member. The first member has a first cylindrical part extending between the mounting cable and the processing chamber, and a plurality of through-holes elongated in the vertical direction is formed in an array in the circumferential direction in the first cylindrical part. The second member has a second cylindrical part having an inner diameter greater than the outer diameter of the cylindrical part for the first member. The second member moves up and down in a region that includes the space between the first member and the processing chamber.
    Type: Application
    Filed: August 13, 2021
    Publication date: December 2, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA
  • Publication number: 20210320009
    Abstract: A plasma processing apparatus includes a baffle plate, a shutter, and a driving device. The baffle plate has a cylindrical shape, and has a plurality of through holes formed in a sidewall thereof. The shutter has a cylindrical shape and is provided around the baffle plate to be movable in an axial direction of the baffle plate along the sidewall of the baffle plate. The driving device moves the shutter along the sidewall of the baffle plate. The plurality of through holes are disposed in the sidewall of the baffle plate so that synthesized conductance of the through holes, which are not covered by the shutter, is increased with respect to a movement amount of the shutter as the shutter is moved downward.
    Type: Application
    Filed: June 24, 2021
    Publication date: October 14, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA, Mayo UDA
  • Patent number: 11101114
    Abstract: A plasma processing apparatus includes a baffle structure between a mounting table and a processing chamber. The baffle structure has a first member and a second member. The first member has a first cylindrical part extending between the mounting table and the processing chamber, and a plurality of through-holes elongated in the vertical direction is formed in an array in the circumferential direction in the first cylindrical part. The second member has a second cylindrical part having an inner diameter greater than the outer diameter of the cylindrical part for the first member. The second member moves up and down in a region that includes the space between the first member and the processing chamber.
    Type: Grant
    Filed: June 5, 2015
    Date of Patent: August 24, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima
  • Patent number: 10950467
    Abstract: The mechanism includes a pipe and a valve provided in the pipe. The pipe is configured to connect a gas source and a semiconductor manufacturing apparatus. The valve is configured to control a flow rate of the gas. The valve includes a housing and a columnar shaft. The housing includes an inlet and an outlet. A gas flows from the gas source into the internal space through the inlet. A gas flows from the internal space to the semiconductor manufacturing apparatus through the outlet. A gap is provided between an outer peripheral surface of the shaft and an inner wall surface of the housing. The shaft is accommodated in the internal space of the housing and is rotatable. A through hole which penetrates the shaft is formed on the outer peripheral surface of the shaft. Both ends of the through hole correspond to the inlet and the outlet.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: March 16, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima, Mayo Uda, Kenichi Shimono
  • Publication number: 20200266034
    Abstract: A plasma processing apparatus includes a processing container; a placement table provided in the processing container and including a placement region on which a workpiece is placed for a plasma processing; a baffle structure that defines a first space and a second space, and including a first member and at least one second member; a gas supply portion connected to the first space; a first pressure gauge connected to the first space; an exhaust apparatus connected to the second space; a second pressure gauge connected to the second space; a driving mechanism that moves the at least one second member in a vertical direction; a displacement gauge configured to measure a position or a distance of the second member; and a controller that controls the driving mechanism. The controller controls the driving mechanism such that a pressure of the first space becomes a predetermined pressure designated by a recipe.
    Type: Application
    Filed: May 7, 2020
    Publication date: August 20, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA, Mayo UDA
  • Patent number: 10636683
    Abstract: The mechanism includes a pipe and a valve provided in the pipe. The pipe is configured to connect a gas source and a semiconductor manufacturing apparatus. The valve is configured to control a flow rate of the gas. The valve includes a housing and a columnar shaft. The housing includes an inlet and an outlet. A gas flows from the gas source into the internal space through the inlet. A gas flows from the internal space to the semiconductor manufacturing apparatus through the outlet. A gap is provided between an outer peripheral surface of the shaft and an inner wall surface of the housing. The shaft is accommodated in the internal space of the housing and is rotatable. A through hole which penetrates the shaft is formed on the outer peripheral surface of the shaft. Both ends of the through hole correspond to the inlet and the outlet.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: April 28, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima, Mayo Uda, Kenichi Shimono
  • Publication number: 20190131136
    Abstract: A plasma processing apparatus includes a baffle plate, a shutter, and a driving device. The baffle plate has a cylindrical shape, and has a plurality of through holes formed in a sidewall thereof. The shutter has a cylindrical shape and is provided around the baffle plate to be movable in an axial direction of the baffle plate along the sidewall of the baffle plate. The driving device moves the shutter along the sidewall of the baffle plate. The plurality of through holes are disposed in the sidewall of the baffle plate so that synthesized conductance of the through holes, which are not covered by the shutter, is increased with respect to a movement amount of the shutter as the shutter is moved downward.
    Type: Application
    Filed: December 2, 2016
    Publication date: May 2, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA, Mayo UDA
  • Publication number: 20190098740
    Abstract: A plasma processing apparatus includes an antenna configured to generate plasma of a processing gas in a chamber. The antenna includes: an inner coil provided around the gas supply unit to surround a gas supply unit; and an outer coil provided around the gas supply unit and the inner coil to surround them. The outer coil is configured such that both ends of a wire forming the outer coil are opened; power is supplied from a power supply unit to a central point of the wire; the vicinity of the central point of the wire is grounded; and the outer coil resonates at a wavelength that is a half of a wavelength of the high frequency power. The inner coil is configured such that both ends of a wire forming the inner coil are connected through a capacitor and the inner coil is inductively coupled with the inner coil.
    Type: Application
    Filed: September 27, 2018
    Publication date: March 28, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yohei YAMAZAWA, Takehisa SAITO, Mayo UDA, Keigo TOYODA, Alok RANJAN, Toshiki NAKAJIMA
  • Patent number: 10192774
    Abstract: A temperature control device includes a moving stage allowed to be heated and configured to mount a processing target object on a top surface thereof; a cooling body allowed to be cooled and fixed at a position under the moving stage; a shaft, having one end connected to the moving stage; the other end positioned under the cooling body; a first flange provided at the other end; and a second flange provided between the first flange and the cooling body, extended between the one end and the other end; a driving plate, provided between the first flange and the second flange, having a top surface facing the second flange and a bottom surface opposite to the top surface; an elastic body provided between the bottom surface of the driving plate and the first flange; and a driving unit configured to move the driving plate up and down.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: January 29, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima, Koichi Nagakura
  • Publication number: 20170301568
    Abstract: The mechanism includes a pipe and a valve provided in the pipe. The pipe is configured to connect a gas source and a semiconductor manufacturing apparatus. The valve is configured to control a flow rate of the gas. The valve includes a housing and a columnar shaft. The housing includes an inlet and an outlet. A gas flows from the gas source into the internal space through the inlet. A gas flows from the internal space to the semiconductor manufacturing apparatus through the outlet. A gap is provided between an outer peripheral surface of the shaft and an inner wall surface of the housing. The shaft is accommodated in the internal space of the housing and is rotatable. A through hole which penetrates the shaft is formed on the outer peripheral surface of the shaft. Both ends of the through hole correspond to the inlet and the outlet.
    Type: Application
    Filed: April 11, 2017
    Publication date: October 19, 2017
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA, Mayo UDA, Kenichi SHIMONO
  • Publication number: 20170301579
    Abstract: A temperature control device includes a moving stage allowed to be heated and configured to mount a processing target object on a top surface thereof; a cooling body allowed to be cooled and fixed at a position under the moving stage; a shaft, having one end connected to the moving stage; the other end positioned under the cooling body; a first flange provided at the other end; and a second flange provided between the first flange and the cooling body, extended between the one end and the other end; a driving plate, provided between the first flange and the second flange, having a top surface facing the second flange and a bottom surface opposite to the top surface; an elastic body provided between the bottom surface of the driving plate and the first flange; and a driving unit configured to move the driving plate up and down.
    Type: Application
    Filed: September 24, 2015
    Publication date: October 19, 2017
    Inventors: Yuki Hosaka, Yoshihiro Umezawa, Toshiki Nakajima, Koichi Nagakura
  • Publication number: 20170092513
    Abstract: A plasma processing apparatus includes a baffle structure between a mounting table and a processing chamber. The baffle structure has a first member and a second member. The first member has a first cylindrical part extending between the mounting table and the processing chamber, and a plurality of through-holes elongated in the vertical direction is formed in an array in the circumferential direction in the first cylindrical part. The second member has a second cylindrical part having an inner diameter greater than the outer diameter of the cylindrical part for the first member. The second member moves up and down in a region that includes the space between the first member and the processing chamber.
    Type: Application
    Filed: June 5, 2015
    Publication date: March 30, 2017
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA
  • Publication number: 20160260582
    Abstract: A baffle structure of a plasma processing apparatus includes a first member and at least one second member. The first member includes a cylindrical portion extending between a placement table and a processing container. A plurality of vertically elongated through holes are formed in the cylindrical portion to be arranged in the circumferential direction. The at least one second member is disposed in the outside of the cylindrical portion of the first member in the radial direction. The at least one second member is arranged to form a cylindrical body having an inner diameter larger than the outer diameter of the cylindrical portion. The vertical positions of a plurality of second members may be individually changed. Or, the horizontal position of a single second member may be changed. Or, the single second member may be made to be inclined.
    Type: Application
    Filed: February 29, 2016
    Publication date: September 8, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuki HOSAKA, Yoshihiro UMEZAWA, Toshiki NAKAJIMA, Mayo UDA
  • Patent number: 8894763
    Abstract: The present invention relates to a pigment composition containing a pigment and chondroitin sulfate or its salt, in which a content of chondroitin sulfate or its salt is equal to or larger than 0.1 part by weight (pbw) over 1 pbw of the pigment, and such pigment composition is available in the use for drug medicines and the like, and exhibits better dispersibility.
    Type: Grant
    Filed: March 14, 2011
    Date of Patent: November 25, 2014
    Assignee: Taisho Pharmaceutical Co., Ltd
    Inventors: Toshiki Nakajima, Masakiyo Urabe, Mariko Numao, Hiroki Tada, Kenji Yamabe
  • Publication number: 20130008343
    Abstract: The present invention relates to a pigment composition containing a pigment and chondroitin sulfate or its salt, in which a content of chondroitin sulfate or its salt is equal to or larger than 0.1 part by weight (pbw) over 1 pbw of the pigment, and such pigment composition is available in the use for drug medicines and the like, and exhibits better dispersibility.
    Type: Application
    Filed: March 14, 2011
    Publication date: January 10, 2013
    Applicant: TAISHO PHARMACEUTICAL CO., LTD
    Inventors: Toshiki Nakajima, Masakiyo Urabe, Mariko Numao, Hiroki Tada, Kenji Yamabe
  • Publication number: 20130005874
    Abstract: The present invention relates to a pigment composition containing a) a pigment, and b) a polyvinyl alcohol/acrylic acid/methyl methacrylate copolymer or an aminoalkyl methacrylate copolymer, and such pigment composition is available in the use for drug medicines and the like, and exhibits better dispersibility.
    Type: Application
    Filed: March 14, 2011
    Publication date: January 3, 2013
    Applicant: TAISHO PHARMACEUTICAL CO., LTD
    Inventors: Toshiki Nakajima, Masakiyo Urabe, Mariko Numao, Masatoshi Ikeda, Kenji Yamabe
  • Patent number: 8266236
    Abstract: A scanner sharing device includes a scanner device connection terminal for a scanner device to be connected thereto, a plurality of computer connection terminals for a plurality of computers to be connected thereto, a connection switching unit selectively connecting one of the plurality of computer connection terminals with the scanner device connection terminal, and a switch control unit controlling the operations of the connection switching unit. When the scanner sharing device is in an automatic switching mode, the switch control unit maintains the connection between the computer connection terminal associated with that one computer and the scanner device connection terminal until the switch control unit receives a processing completion signal.
    Type: Grant
    Filed: July 22, 2009
    Date of Patent: September 11, 2012
    Assignee: PFU Limited
    Inventors: Naoto Konishi, Toshiki Nakajima, Yutaka Koshinou
  • Patent number: 7875557
    Abstract: A semiconductor substrate treating method is disclosed that can selectively remove contaminants or unnecessary substances present on the surface of a semiconductor substrate. Also disclosed are a semiconductor component of enhanced reliability produced by this method and an electronic appliance incorporating the semiconductor component. The semiconductor substrate treating method comprises the step of treating a semiconductor substrate with a treating fluid containing NH4OH and HF wherein the relationships 0.30?X/Y?0.78 and 0.03?Y?6.0 are satisfied, where X represents a concentration [mol/L] of NH4OH in the treating fluid and Y represents a concentration [mol/L] of HF in the treating fluid. Preferably, the treating fluid is substantially free from H2O2. The semiconductor substrate has a surface, at least a part of which is composed of high melting point metal.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: January 25, 2011
    Assignees: Seiko Epson Corporation, Kabushiki Kaisha Toshiba
    Inventors: Hiroyuki Matsuo, Kunihiro Miyazaki, Toshiki Nakajima
  • Publication number: 20100077089
    Abstract: A scanner sharing device includes a scanner device connection terminal for a scanner device to be connected thereto, a plurality of computer connection terminals for a plurality of computers to be connected thereto, a connection switching unit selectively connecting one of the plurality of computer connection terminals with the scanner device connection terminal, and a switch control unit controlling the operations of the connection switching unit. When the scanner sharing device is in an automatic switching mode, the switch control unit maintains the connection between the computer connection terminal associated with that one computer and the scanner device connection terminal until the switch control unit receives a processing completion signal.
    Type: Application
    Filed: July 22, 2009
    Publication date: March 25, 2010
    Applicant: PFU LIMITED
    Inventors: Naoto KONISHI, Toshiki Nakajima, Yutaka Koshinou
  • Patent number: 7439183
    Abstract: A method of manufacturing a semiconductor device. In the method, a thin film is formed on an Si substrate having face orientation (100), that part of the thin film, which lies on an element-isolating region, is removed. Then, the Si substrate is subjected to selective etching, making a trench in the substrate to isolate an element, by using the thin film as mask and a mixture solution of hydrofluoric acid and ozone water.
    Type: Grant
    Filed: August 26, 2005
    Date of Patent: October 21, 2008
    Assignees: Kabushiki Kaisha Toshiba, Seiko Epson Corporation
    Inventors: Kunihiro Miyazaki, Hiroyuki Matsuo, Toshiki Nakajima