Patents by Inventor Toshimasa Hamada

Toshimasa Hamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090214240
    Abstract: A developing device capable of improving the image density and the dot reproducibility, and an image forming apparatus including the same are provided. A developing device applies an alternating voltage superimposed on a direct current voltage to a developing roller to thereby develop an electrostatic latent image formed on a photoreceptor with toner. A bias voltage waveform superimposed at this time has an original period (first period) in which each of a development-side electrical potential and an opposite development-side electrical potential is applied one time and a period (second period) in which a Vpp is gradually increased from the initial value to the maximum value.
    Type: Application
    Filed: February 26, 2009
    Publication date: August 27, 2009
    Inventors: Toshimasa Hamada, Nobuhiro Maezawa
  • Publication number: 20090175661
    Abstract: This invention, by a layer thickness restricting member, restricts a layer thickness of a developer born on a peripheral surface of a developer bearing member which feeds the developer at a developing region in a developer feeding direction which is opposite to an electrostatic latent image feeding direction, at a position upstream of the developing region in the developer feeding direction. In addition, this invention, by a spike-height restricting member, restricts a spike height of the developer caused to project like spikes on the peripheral surface of the developer bearing member, at a predetermined position upstream of a proximal position at which an electrostatic latent image bearing member and the developer bearing member are closest to each other and downstream of the layer thickness restricting member in the developer feeding direction.
    Type: Application
    Filed: December 31, 2008
    Publication date: July 9, 2009
    Inventor: Toshimasa HAMADA
  • Publication number: 20080298850
    Abstract: A developing device and an image forming apparatus capable of restraining density irregularity and restraining a decline in image quality caused by adherence of carrier to a photoreceptor, are provided. An angle ? is in a range of no less than 45 degrees nor more than 57 degrees, which is formed between a plane comprising a central line of magnetic pole formed by a regulating pole in a magnet roller and a rotating central axis of a developing sleeve and a plane comprising a central line of magnetic pole formed by a pumping pole and a rotating central axis of the developing sleeve. Further, an absolute value of the maximum value of strength of the magnetic pole formed by a main pole is in a range of no less than 120 mT nor more than 140 mT.
    Type: Application
    Filed: May 30, 2008
    Publication date: December 4, 2008
    Inventors: Nobuhiro MAEZAWA, Toshimasa Hamada
  • Publication number: 20080145077
    Abstract: In an embodiment in which an electrostatic latent image formed on the surface of a photoreceptor is developed with a toner by applying an oscillating bias voltage in which a development-side electrical potential and an opposite development-side electrical potential alternate with each other, between a development sleeve of a development roller and the photoreceptor, the development-side electrical potential is applied in two stages, and, in the two-staged development-side electrical potential, the absolute value of a first electrical potential V1 that is initially applied is larger than the absolute value of a second electrical potential V2 that is subsequently applied.
    Type: Application
    Filed: December 12, 2007
    Publication date: June 19, 2008
    Inventor: Toshimasa HAMADA
  • Patent number: 7067656
    Abstract: A sulfamoyl compound of the general formulae (1): wherein R1 and R2 are each independently C1-4 alkyl, or R1 and R2 together are C4-6 alkylene or C4-6 alkyleneoxy, Y is H, halogen, C1-8 alkyl, C1-8 alkoxy, C1-8 alkylthio, C1-8 haloalkyl, C1-8 haloalkoxy or C1-8 haloalkylthio, A is a predetermined heterocyclic group, B is a predetermined heterocyclic group which is identical with or different from A, W is a chemical bond or O, V is O or S, D, E, F and G are each independently N, CR7, CR8, CR9 or CR10, and R3, R4, R5, R6, R7, R8, R9, R10 and R11 are each independently predetermined group such as H, or an unsubstituted or substituted aliphatic, aromatic or heterocyclic group. The sulfamoyl compound is useful as an agricultural and horticultural fungicide.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: June 27, 2006
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Toshiaki Takeyama, Toshimasa Hamada, Hiroaki Takahashi, Junichi Watanabe, Kazuhiro Yamagishi, Masanori Nishioka, Hiroyuki Suzuki
  • Publication number: 20040143116
    Abstract: A sulfamoyl compound of the general formulae (1): 1
    Type: Application
    Filed: July 9, 2003
    Publication date: July 22, 2004
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Toshiaki Takeyama, Toshimasa Hamada, Hiroaki Takahashi, Junichi Watanabe, Kazuhiro Yamagishi, Masanori Nishioka, Hiroyuki Suzuki
  • Patent number: 6620744
    Abstract: A method for forming an insulator film at a semiconductor temperature of 600° C. or less comprises the steps of forming a first insulator film by oxidizing a surface of a semiconductor in an atmosphere containing oxygen atom radicals, and forming a second insulator film on the first insulator film by deposition without exposing the first insulator film to outside air.
    Type: Grant
    Filed: January 4, 2002
    Date of Patent: September 16, 2003
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yukihiko Nakata, Takashi Itoga, Tetsuya Okamoto, Toshimasa Hamada
  • Patent number: 6620812
    Abstract: A sulfamoyl compound of the general formulae (1): wherein R1 and R2 are each independently C1-4 alkyl, or R1 and R2 together are C4-6 alkylene or C4-6 alkyleneoxy, Y is H, halogen, C1-8 alkyl, C1-8 alkoxy, C1-8 alkylthio, C1-8 haloalkyl, C1-8 haloalkoxy or C1-8 haloalkylthio, A is a predetermined heterocyclic group, B is a predetermined heterocyclic group which is identical with or different from A, W is a chemical bond or O, V is O or S, D, E, F and G are each independently N, CR7, CR8, CR9 or CR10, and R3, R4, R5, R6, R7, R8, R9, R10 and R11 are each independently predetermined group such as H, or an unsubstituted or substituted aliphatic, aromatic or heterocyclic group. The sulfamoyl compound is useful as an agricultural and horticultural fungicide.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: September 16, 2003
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Toshiaki Takeyama, Toshimasa Hamada, Hiroaki Takahashi, Junichi Watanabe, Kazuhiro Yamagishi, Masanori Nishioka, Hiroyuki Suzuki
  • Publication number: 20020103243
    Abstract: A sulfamoyl compound of the general formulae (1): 1
    Type: Application
    Filed: September 28, 2001
    Publication date: August 1, 2002
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Toshiaki Takeyama, Toshimasa Hamada, Hiroaki Takahashi, Junichi Watanabe, Kazuhiro Yamagishi, Masanori Nishioka, Hiroyuki Suzuki
  • Publication number: 20020090776
    Abstract: A method for forming an insulator film at a semiconductor temperature of 600° C. or less comprises the steps of forming a first insulator film by oxidizing a surface of a semiconductor in an atmosphere containing oxygen atom radicals, and forming a second insulator film on the first insulator film by deposition without exposing the first insulator film to outside air.
    Type: Application
    Filed: January 4, 2002
    Publication date: July 11, 2002
    Inventors: Yukihiko Nakata, Takashi Itoga, Tetsuya Okamoto, Toshimasa Hamada
  • Patent number: 6350748
    Abstract: A sulfamoyl compound of the general formulae (1): wherein R1 and R2 are each independently C1-4 alkyl, or R1 and R2 together are C4-6 alkylene or C4-6 alkyleneoxy, Y is H, halogen, C1-8 alkyl, C1-8 alkoxy, C1-8 alkylthio, C1-8 haloalkyl, C1-8 haloalkoxy or C1-8 haloalkylthio, A is a predetermined heterocyclic group, B is a predetermined heterocyclic group which is identical with or different from A, W is a chemical bond or O, V is O or S, D, E, F and G are each independently N, CR7, CR8, CR9 or CR10, and R3, R4, R5, R6, R7, R8, R9, R10 and R11 are each independently predetermined group such as H, or an unsubstituted or substituted aliphatic, aromatic or heterocyclic group. The sulfamoyl compound is useful as an agricultural and horticultural fungicide.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: February 26, 2002
    Assignee: Nissan Chemical Industries Ltd.
    Inventors: Toshiaki Takeyama, Toshimasa Hamada, Hiroaki Takahashi, Junichi Watanabe, Kazuhiro Yamagishi, Masanori Nishioka, Hiroyuki Suzuki
  • Patent number: 5926735
    Abstract: There is disclosed a manufacturing method of highly integrated circuits with thin-film transistors (TFTs) for use as peripheral driver circuitry in active-matrix liquid crystal display (LCD) panel with a pixel array each having a charge transfer control TFT, capable of facilitating formation of contact holes otherwise being difficult in cases where an anode oxide film is formed on gate electrodes of TFTs and lead wires both of which are made of anodizable metal, such as aluminum. The method includes execution of anodization while causing a resist mask to be disposed on part of the lead wire and electrode made of aluminum, thereby partly eliminating formation of the anode oxide film on the lead wire and electrode. At a later step of fabrication, each contact is formed by use of such portion that has no anode oxide film formed thereon. This may allow aluminum to be employed as lead wires while enabling easy fabrication of contacts therefor.
    Type: Grant
    Filed: February 19, 1997
    Date of Patent: July 20, 1999
    Assignees: Semiconductor Energy Laboratory Co., Ltd., Sharp Kabushiki Kaisha
    Inventors: Shunpei Yamazaki, Naoaki Yamaguchi, Yuugo Goto, Satoshi Teramoto, Katunobu Awane, Yoshitaka Yamamoto, Toshimasa Hamada
  • Patent number: 5763365
    Abstract: A fluoropropylthiazoline represented by the formula (1), a herbicide containing it and intermediates for it.
    Type: Grant
    Filed: July 11, 1996
    Date of Patent: June 9, 1998
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kenji Makino, Hideaki Suzuki, Takeshi Nagaoka, Toshio Niki, Yoshiyuki Kusuoka, Toshimasa Hamada, Tsutomu Nawamaki, Shigeomi Watanabe, Yoichi Ito, Kazuhisa Sudo
  • Patent number: 5648146
    Abstract: On a metallic wiring substrate, a first metallic layer is connected to a second metallic layer at a non-anodic-oxide section of the first metallic layer exposed at a bottom of a contact hole. The surface of the first metallic layer is anodically oxidized except for the non-anodic-oxide section. After resist is patterned so as to be entirely positioned on the surface of the first metallic layer, the first metallic layer is anodically oxidized, and the resist is removed therefrom. In such a manner, the non-anodic oxide section and the anodic oxide section are formed. This method makes it possible to produce the metallic wiring substrate having good insulation properties between layers easier than a method for forming the non-anodic-oxide section by etching the anodic oxide section.
    Type: Grant
    Filed: October 19, 1995
    Date of Patent: July 15, 1997
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Masahito Gotou, Hirohisa Tanaka, Toshimasa Hamada
  • Patent number: 5644124
    Abstract: Disclosed is a photodetector with a multilayer filter. A light-receiving substrate is mounted on a recessed portion of a ceramic stem. An electrode pad is formed on a P-type layer of the light-receiving substrate while another electrode pad is formed on an N-type layer of the light-receiving substrate. An optical multilayer filter is formed on the light-receiving substrate except the regions of the electrode pads. Further, an epoxy transparent resin is poured into the recessed portion of the stem and then cured, so that a resin portion to cover the light-receiving substrate is formed. The optical multilayer filter is formed of amorphous low refractive index films made of SiC.sub.2 and amorphous high refractive index films made of TiO.sub.2. The amorphous high and low refractive index films are alternately stacked.
    Type: Grant
    Filed: May 1, 1996
    Date of Patent: July 1, 1997
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Toshimasa Hamada, Masaru Iwasaki, Tetsuya Hanamoto, Shohichi Katoh, Takahiro Funakoshi, Koji Miyake, Masumi Nakamichi
  • Patent number: 5450237
    Abstract: A hyper-resolution optical device which can focus a beam of light to a diameter less than the diffraction limit. The optical device has an optical system disposed on a transmissive substrate. One component in the optical system is a hyper-resolution optical component which passes or reflects light and which has a central portion which does not pass or reflect light, respectively. The hyper-resolution optical component can be integrated with the transmissive substrate. Such optical devices are particularly suitable for optical pick-up devices, laser printers, sensors.
    Type: Grant
    Filed: September 2, 1994
    Date of Patent: September 12, 1995
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Toshihiko Yoshida, Osamu Yamamoto, Saburo Yamamoto, Shohichi Kato, Masumi Nakamichi, Toshimasa Hamada, Sadayoshi Matsui
  • Patent number: 5162797
    Abstract: The inventive VITERBI decoder employs a memory for delivering a new path-metric and path selecting information. The memory stores path-metrics and path selecting information corresponding to all combinations of all possible values of input data, path-metric and control signal. The memory has its address lines connected with an input data output line, branch information output line and output line for a metric of the past.
    Type: Grant
    Filed: May 15, 1991
    Date of Patent: November 10, 1992
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Junichi Murata, Toshimasa Hamada
  • Patent number: 4586664
    Abstract: A bearing supporting system for cone crushers of the type which has a head center securely mounted on an upper portion of a main shaft for mounting a mantle thereon and has the main shaft supported by the eccentric drive shaft in radial direction, the support system including a self-aligning thrust bearing mounted on an intermediate portion of the mantle shaft, supporting the main shaft on the eccentric drive shaft through the thrust bearing.
    Type: Grant
    Filed: March 29, 1984
    Date of Patent: May 6, 1986
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Takeshi Tanaka, Masao Jotatsu, Masaaki Higaki, Toshimasa Hamada, Tadashi Hashikawa, Toneri Ohashi, Seigo Togawa