Abstract: In a method of manufacturing a liquid crystal display device in which a plurality of pixels are arranged in a matrix, each of the pixels has an insulator wall structure at a boundary of the pixels, and a wall electrode is provided at least at a side of the wall structure, the wall structure being formed by: using a chemically amplified resist as a material of the wall structure, a step of applying the chemically amplified resist; a step of exposing and developing the chemically amplified resist; a step of irradiating light on an entire surface to perform post exposure; a step of pre-calcinating the chemically amplified resist at a temperature lower than a main calcination temperature; and a step of performing main calcination at a temperature higher than a pre-calcination temperature.

Abstract: An organic passivation film having a high transmittance and capable of setting a taper angle of a through hole within a predetermined range in a liquid crystal display device. A pixel electrode and a source electrode of a TFT are connected by way of a through hole formed in an organic passivation film. The organic passivation film having high productivity, high transmittance, and a predetermined taper angle ? of a through hole can be formed by using a chemical amplification photosensitive resin composition comprising, as a base material, an acrylic resin having a molecular weight of 4,000 to 20,000 and containing 1 to 6 wt % of a photoacid generator as the material for the organic passivation film, performing exposure and development for forming a through hole, and then performing post exposure, prebaking, and baking under appropriate conditions.

Abstract: In a liquid crystal display device having wall structures, the generation of low-temperature shock bubbles is suppressed. Also, electrodes and the like within substrates are prevented from being damaged during manufacturing. The liquid crystal display device includes a first substrate, a second substrate that is disposed to face the first substrate, a liquid crystal layer that is disposed between the first substrate and the second substrate, wall structures that are formed on the first substrate, pixel electrodes that are disposed on at least side wall of the wall structures, a common electrode that is formed on the first substrate, and a plurality of pixels including the pixel electrodes and the common electrode, in which higher portions are partially disposed on a surface of the second substrate, and the higher portions come into contact with the wall structures to bring the first substrate into contact with the second substrate.

Abstract: In order to improve the transmissivity of each pixel and the brightness of a high-definition screen, a TFT and a projection are disposed in each pixel, a source electrode of the TFT extends so as to cover the projection, an inorganic passivation film is formed over the TFT and the projection, an organic passivation film is formed on the inorganic passivation film on the TFT, an opposed electrode is formed on the organic passivation film, an upper insulation film is formed over the opposed electrode, a pixel electrode is formed on the upper insulation film, and the pixel electrode is connected to the source electrode through a connection hole formed in the inorganic passivation film and the upper insulation film on the projection. Accordingly, the diameter of a through-hole can be made smaller.

Abstract: In a method of manufacturing a liquid crystal display device in which a plurality of pixels are arranged in a matrix, each of the pixels has an insulator wall structure at a boundary of the pixels, and a wall electrode is provided at least at a side of the wall structure, the wall structure being formed by: using a chemically amplified resist as a material of the wall structure, a step of applying the chemically amplified resist; a step of exposing and developing the chemically amplified resist; a step of irradiating light on an entire surface to perform post exposure; a step of pre-calcinating the chemically amplified resist at a temperature lower than a main calcination temperature; and a step of performing main calcination at a temperature higher than a pre-calcination temperature.

Abstract: The present invention provides a liquid crystal display device including: plural pixels disposed in a matrix shape, each pixel having insulating wall-shaped structures at the boundaries of the pixels and a small wall-shaped structure between the wall-shaped structures; wall electrodes, each having wall-shaped electrodes formed on the side faces of the wall-shaped structures, and planar electrodes that are connected to the wall-shaped electrodes and extend in the planar direction; electrodes, each having a TFT-side electrode covering the small wall-shaped structure and a storage capacitor electrode that is connected to the TFT-side electrode and extends in the planar direction of the substrate; and interlayer insulating films formed between the storage capacitor electrodes and the planar electrodes. And the interlayer insulating films of inorganic films are not formed on the upper and side faces and at the base portions of the wall-shaped structures at the boundaries of the pixels.

Abstract: The present invention provides a manufacturing method for a liquid crystal display device, wherein the liquid crystal display device comprises first and second color filters provided on the liquid crystal side of one of a pair of substrates which are positioned so as to face each other and sandwich liquid crystal in between so as to be adjacent to each other, and a first side portion of the first color filter on the second color filter side overlaps with a second side portion of the second color filter on the first color filter side, characterized in that the border between the light blocking region and the non-light blocking region in a photomask for forming the first color filter, which corresponds to the first side portion, has a zigzag pattern with repeating mountains and valleys along this border, and the border between the light blocking region and the non-light blocking region in a photomask for forming the second color filter, which corresponds to the second side portion, has a zigzag pattern with rep

Abstract: A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing.

Abstract: An organic passivation film having a high transmittance and capable of setting a taper angle of a through hole within a predetermined range in a liquid crystal display device. A pixel electrode and a source electrode of a TFT are connected by way of a through hole formed in an organic passivation film. The organic passivation film having high productivity, high transmittance, and a predetermined taper angle ? of a through hole can be formed by using a chemical amplification photosensitive resin composition comprising, as a base material, an acrylic resin having a molecular weight of 4,000 to 20,000 and containing 1 to 6 wt % of a photoacid generator as the material for the organic passivation film, performing exposure and development for forming a through hole, and then performing post exposure, prebaking, and baking under appropriate conditions.

Abstract: In an IPS-type liquid crystal display device, peeling-off between a common electrode formed in a matted manner in plane and an interlayer insulation film is prevented. The common electrode is formed on an organic passivation film in a matted manner in plane, the interlayer insulation film is formed on the common electrode, and a comb-teeth-shaped pixel electrode is formed on the interlayer insulation film. The pixel electrode is connected with a source electrode via a through hole formed in the organic passivation film and an inorganic passivation film.

Abstract: The present invention provides a manufacturing method for a liquid crystal display device, wherein the liquid crystal display device comprises first and second color filters provided on the liquid crystal side of one of a pair of substrates which are positioned so as to face each other and sandwich liquid crystal in between so as to be adjacent to each other, and a first side portion of the first color filter on the second color filter side overlaps with a second side portion of the second color filter on the first color filter side, characterized in that the border between the light blocking region and the non-light blocking region in a photomask for forming the first color filter, which corresponds to the first side portion, has a zigzag pattern with repeating mountains and valleys along this border, and the border between the light blocking region and the non-light blocking region in a photomask for forming the second color filter, which corresponds to the second side portion, has a zigzag pattern with rep

Abstract: The present invention facilitates a control of a temperature of white color and color tones of respective colors of a color liquid crystal display device. To achieve such an aim, a display device of the present invention includes a display panel which arranges a plurality of color filters which differ in color for each pixel, and at least the color filter of one color is formed of a plurality of filter layers stacked on a transparent substrate.

Abstract: The present invention provides a transflective liquid crystal display device which includes diffusion reflective electrodes suitable for a display of high definition. Into an organic resin film material PET which is formed by mixing NQD as a photosensitive agent in an acrylic resin having a specific gravity of 1.05 and a refractive index of 1.50, spherical particles PTC made of acrylic modified polystyrene which has a specific gravity of 1.00, a refractive index of 1.50 and a particle size of 1.6 ?m are mixed at a rate of 3:1 so as to form an organic insulation film material in which a total solid content is adjusted to 30% and viscosity is adjusted 20 mPa·s. The organic insulation film material is applied and is dried to form an organic insulation film. A portion of the organic insulation film which is to be arranged below a diffusion reflective electrode is exposed using an exposure mask having half exposure apertures which are formed of a large number of slits and the organic insulation film is hardened.

Abstract: A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing.

Abstract: The present invention realizes the two-layered resist structure for obtaining a half exposure pattern of high sensitivity and high accuracy and a manufacturing method of a display device which includes thin film transistors which are formed using the two-layered resist. The resist is constituted of five layers, that is, a base film, a cushion layer, an upper-layer resist, a lower-layer resist and a cover film. Thicknesses of these structural members are set such that base film has a thickness of 50 to 100 ?m, the cushion layer has a thickness of 10 to 30 ?m, the upper-layer resist has a thickness of 0.5 to 1.0 ?m, the lower-layer resist has a thickness of 0.5 to 1.0 ?m, and the cover film has a thickness of 10 to 30 ?m.

Abstract: The present invention provides a transflective liquid crystal display device which includes diffusion reflective electrodes suitable for a display of high definition. Into an organic resin film material PET which is formed by mixing NQD as a photosensitive agent in an acrylic resin having a specific gravity of 1.05 and a refractive index of 1.50, spherical particles PTC made of acrylic modified polystyrene which has a specific gravity of 1.00, a refractive index of 1.50 and a particle size of 1.6 ?m are mixed at a rate of 3:1 so as to form an organic insulation film material in which a total solid content is adjusted to 30% and viscosity is adjusted 20 mPa·s. The organic insulation film material is applied and is dried to form an organic insulation film. A portion of the organic insulation film which is to be arranged below a diffusion reflective electrode is exposed using an exposure mask having half exposure apertures which are formed of a large number of slits and the organic insulation film is hardened.

Abstract: The present invention facilitates a control of a temperature of white color and color tones of respective colors of a color liquid crystal display device. To achieve such an aim, a display device of the present invention includes a display panel which arranges a plurality of color filters which differ in color for each pixel, and at least the color filter of one color is formed of a plurality of filter layers stacked on a transparent substrate.

Abstract: The present invention realizes the two-layered resist structure for obtaining a half exposure pattern of high sensitivity and high accuracy and a manufacturing method of a display device which includes thin film transistors which are formed using the two-layered resist. The resist is constituted of five layers, that is, a base film, a cushion layer, an upper-layer resist, a lower-layer resist and a cover film. Thicknesses of these structural members are set such that base film has a thickness of 50 to 100 ?m, the cushion layer has a thickness of 10 to 30 ?m, the upper-layer resist has a thickness of 0.5 to 1.0 ?m, the lower-layer resist has a thickness of 0.5 to 1.0 ?m, and the cover film has a thickness of 10 to 30 ?m.

Abstract: A color cathode-ray tube providing a nonglare effect which can be regenerated without degradation of its nonglare function and which can be inexpensively formed. A light scattering film composed of metal containing compound micro-particles having a high index of refraction and a particle size of 0.1 &mgr;m to 2 &mgr;m is formed in contact with the internal surface of a faceplate of the color cathode-ray tube, and a black matrix having a multiplicity of holes is formed on the light scattering film. A red phosphor layer, a green phosphor layer and a blue phosphor-layer are formed in the holes of the black matrix on the light scattering film in such a manner that the phosphor layers of red, green and blue are disposed cyclically in that order. External light incident on the faceplate is partly reflected by the external surface of the faceplate, and the remainder of the external light passes through the faceplate and is made incident on the light scattering film.

Abstract: A cathode ray tube and a method of manufacturing the cathode ray tube, wherein a black matrix layer and at least one phosphor layer is formed on inner surface of panel portion, a filming liquid containing an acrylic emulsion having methyl methacrylate as a major component is applied on the at least one phosphor layer, the filming liquid is dried to make an organic film resin on the at least one phosphor layer, a metal is metal deposited on the organic film, and the portion is baked to remove the organic film.