Patents by Inventor Toshimitsu Morihana
Toshimitsu Morihana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11139188Abstract: A purging nozzle unit of a gas supply device according to the present invention including: a housing that is capable of passing a predetermined gas so as to replace the internal atmosphere of a FOUP with the predetermined gas; a nozzle coming into intimate contact with the proximity of a port that is provided on one face of the FOUP, the nozzle being pressed to thereby open the port; an operation adjustment space configured to increase or decrease so as to operate the nozzle between a use posture in which the predetermined gas can be supplied into the target container via the port and a standby posture in which the predetermined gas cannot be supplied into the target container via the port; and a gas introducing part configured to export or import compression air relative to the operation adjustment space to thereby control an operation of the nozzle.Type: GrantFiled: April 24, 2018Date of Patent: October 5, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Yasushi Taniyama, Toshimitsu Morihana
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Patent number: 10923377Abstract: There is provided a load port provided to a loading/unloading port of a semiconductor-processing apparatus to transfer a semiconductor wafer, including: a FOUP support configured to support a FOUP that includes a FOUP lid and move the FOUP in a front-rear direction with respect to the loading/unloading port; a lid configured to open and close the loading/unloading port; a FOUP lid sensor provided to perform a detection operation between a position of the lid in a closed state and a position of the FOUP lid when unloading is normally completed by retreating the FOUP by a predetermined distance with respect to the loading/unloading port; and an observer configured to observe that the FOUP lid sensor has performed the detection operation after the unloading is completed.Type: GrantFiled: October 3, 2019Date of Patent: February 16, 2021Assignee: Sinfonia Technology Co., Ltd.Inventor: Toshimitsu Morihana
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Publication number: 20200111695Abstract: There is provided a load port provided to a loading/unloading port of a semiconductor-processing apparatus to transfer a semiconductor wafer, including: a FOUP support configured to support a FOUP that includes a FOUP lid and move the FOUP in a front-rear direction with respect to the loading/unloading port; a lid configured to open and close the loading/unloading port; a FOUP lid sensor provided to perform a detection operation between a position of the lid in a closed state and a position of the FOUP lid when unloading is normally completed by retreating the FOUP by a predetermined distance with respect to the loading/unloading port; and an observer configured to observe that the FOUP lid sensor has performed the detection operation after the unloading is completed.Type: ApplicationFiled: October 3, 2019Publication date: April 9, 2020Applicant: Sinfonia Technology Co., Ltd.Inventor: Toshimitsu Morihana
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Publication number: 20180315632Abstract: A purging nozzle unit of a gas supply device according to the present invention including: a housing that is capable of passing a predetermined gas so as to replace the internal atmosphere of a FOUP with the predetermined gas; a nozzle coming into intimate contact with the proximity of a port that is provided on one face of the FOUP, the nozzle being pressed to thereby open the port; an operation adjustment space configured to increase or decrease so as to operate the nozzle between a use posture in which the predetermined gas can be supplied into the target container via the port and a standby posture in which the predetermined gas cannot be supplied into the target container via the port; and a gas introducing part configured to export or import compression air relative to the operation adjustment space to thereby control an operation of the nozzle.Type: ApplicationFiled: April 24, 2018Publication date: November 1, 2018Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Yasushi Taniyama, Toshimitsu Morihana
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Patent number: 9916997Abstract: There is provided an end structure of a nozzle (11) including a gas-flow passage (13) communicable with an opening (104) provided through a bottom of a container (100) configured to contain an object, the nozzle (11) configured so that gas is injected into or discharged from the container (100) through the gas-flow passage (13) and the opening (104). The end structure includes a contact portion (19) provided at an upper end portion of the nozzle (11) and around the gas-flow passage (13), and the contact portion (19) is configured to be brought into contact with a contacted portion (103) provided around the opening (104). The contact portion (19) includes a flat portion (19b) and protruding portions (19a and 19c) each protruding upward relative to the flat portion (19b), and the flat portion (19b) is made of material softer than that of the protruding portions (19a and 19c).Type: GrantFiled: March 17, 2016Date of Patent: March 13, 2018Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshimitsu Morihana, Yuki Matsumoto, Mitsuo Natsume
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Publication number: 20160276188Abstract: There is provided an end structure of a nozzle 11 including a gas-flow passage 13 communicable with an opening 104 provided through a bottom of a container 100 configured to contain an object, the nozzle 11 configured so that gas is injected into or discharged from the container 100 through the gas-flow passage 13 and the opening 104. The end structure includes a contact portion 19 provided at an upper end portion of the nozzle 11 and around the gas-flow passage 13, and the contact portion 19 is configured to be brought into contact with a contacted portion 103 provided around the opening 104. The contact portion 19 includes a flat portion 19b and protruding portions 19a and 19c each protruding upward relative to the flat portion 19b, and the flat portion 19b is made of material softer than that of the protruding portions 19a and 19c.Type: ApplicationFiled: March 17, 2016Publication date: September 22, 2016Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshimitsu MORIHANA, Yuki MATSUMOTO, Mitsuo NATSUME
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Patent number: 9239228Abstract: The left-right span between a light projection section 5a and a light receiving section 5b of a mapping sensor 5 having an optical axis L1 extending in a left-right horizontal direction is arranged to be narrower than the span of a front opening of a open cassette 12 which is a smaller one of differently-sized containers conveyed to a load port, and the mapping sensor is attached to a mapping device 4. A first protrusion sensor 6 having an optical axis L2 extending in the left-right horizontal direction is attached to the mapping device 4 to be separated from the mapping sensor 5 in a moving direction of the mapping sensor 5. Furthermore, a second protrusion sensor 7 having an optical axis extending in the up-down moving direction of the mapping sensor 5 is provided.Type: GrantFiled: April 17, 2015Date of Patent: January 19, 2016Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Mitsuo Natsume, Masahiro Osawa, Toshimitsu Morihana, Mitsutoshi Ochiai
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Publication number: 20150308812Abstract: The left-right span between a light projection section 5a and a light receiving section 5b of a mapping sensor 5 having an optical axis L1 extending in a left-right horizontal direction is arranged to be narrower than the span of a front opening of a open cassette 12 which is a smaller one of differently-sized containers conveyed to a load port, and the mapping sensor is attached to a mapping device 4. A first protrusion sensor 6 having an optical axis L2 extending in the left-right horizontal direction is attached to the mapping device 4 to be separated from the mapping sensor 5 in a moving direction of the mapping sensor 5. Furthermore, a second protrusion sensor 7 having an optical axis extending in the up-down moving direction of the mapping sensor 5 is provided.Type: ApplicationFiled: April 17, 2015Publication date: October 29, 2015Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Mitsuo NATSUME, Masahiro Osawa, Toshimitsu Morihana, Mitsutoshi Ochiai