Patents by Inventor Toshinobu Furusho
Toshinobu Furusho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11342198Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.Type: GrantFiled: August 2, 2018Date of Patent: May 24, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Yuichi Terashita, Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa
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Patent number: 11099480Abstract: A treatment solution supply apparatus supplies a treatment solution to a solution treatment apparatus which applies the treatment solution to a substrate to perform a predetermined treatment. Plural solution treatment apparatuses are supply destinations of the treatment solution. The treatment solution supply apparatus includes: a sending unit common among the solution treatment apparatuses, the sending unit sends the treatment solution stored in a treatment solution supply source to each of the solution treatment apparatuses; and a control unit that controls the sending unit. The sending unit includes pumps that suck the treatment solution and load the treatment solution thereinto and send the loaded treatment solution. The control unit controls suction timing of each of the pumps so that one (or more) of the pumps becomes in a state capable of sending the treatment solution to the solution treatment apparatuses at all times.Type: GrantFiled: April 24, 2019Date of Patent: August 24, 2021Assignee: Tokyo Electron LimitedInventors: Takahiro Ookubo, Suguru Enokida, Toshinobu Furusho
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Patent number: 10734251Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.Type: GrantFiled: December 10, 2013Date of Patent: August 4, 2020Assignee: Tokyo Electron LimitedInventors: Koji Takayanagi, Yukie Minekawa, Yuichi Yoshida, Kousuke Yoshihara, Yuichi Terashita, Toshinobu Furusho, Takashi Sasa
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Publication number: 20200227286Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.Type: ApplicationFiled: August 2, 2018Publication date: July 16, 2020Inventors: Yuichi Terashita, Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa
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Publication number: 20190332014Abstract: A treatment solution supply apparatus for supplying a treatment solution to a solution treatment apparatus which applies the treatment solution to a substrate to perform a predetermined treatment, there being a plurality of solution treatment apparatuses which are supply destinations of the treatment solution, the treatment solution supply apparatus includes: a sending unit common among the plurality of solution treatment apparatuses, the sending unit being configured to send the treatment solution stored in a treatment solution supply source to each of the plurality of solution treatment apparatuses; and a control unit configured to control the sending unit, wherein the sending unit includes a plurality of pumps configured to suck the treatment solution and load the treatment solution thereinto and to send the loaded treatment solution, and wherein the control unit is configured to control suction timing of each of the plurality of pumps so that at least one of the plurality of pumps becomes a state capableType: ApplicationFiled: April 24, 2019Publication date: October 31, 2019Inventors: Takahiro OOKUBO, Suguru ENOKIDA, Toshinobu FURUSHO
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Patent number: 10268116Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: GrantFiled: November 17, 2017Date of Patent: April 23, 2019Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
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Patent number: 10074546Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.Type: GrantFiled: September 15, 2014Date of Patent: September 11, 2018Assignee: Tokyo Electron LimitedInventors: Yuichi Terashita, Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa
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Patent number: 10035173Abstract: A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.Type: GrantFiled: June 11, 2015Date of Patent: July 31, 2018Assignee: Tokyo Electron LimitedInventors: Toshinobu Furusho, Takahiro Ookubo, Kousuke Yoshihara, Yusuke Yamamoto, Steffen Hornig
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Patent number: 10022652Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.Type: GrantFiled: November 21, 2017Date of Patent: July 17, 2018Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
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Patent number: 9975073Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.Type: GrantFiled: September 1, 2015Date of Patent: May 22, 2018Assignee: Tokyo Electron LimitedInventors: Yuichi Yoshida, Ryouichirou Naitou, Toshinobu Furusho
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Publication number: 20180093205Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.Type: ApplicationFiled: November 21, 2017Publication date: April 5, 2018Inventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
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Publication number: 20180074407Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: ApplicationFiled: November 17, 2017Publication date: March 15, 2018Applicant: Tokyo Electron LimitedInventors: Kousuke YOSHIHARA, Koji TAKAYANAGI, Toshinobu FURUSHO, Takashi SASA, Daisuke ISHIMARU
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Patent number: 9878267Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.Type: GrantFiled: June 30, 2017Date of Patent: January 30, 2018Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
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Patent number: 9846363Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: GrantFiled: October 30, 2014Date of Patent: December 19, 2017Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
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Publication number: 20170296944Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.Type: ApplicationFiled: June 30, 2017Publication date: October 19, 2017Inventors: Kousuke YOSHIHARA, Katsunori ICHINO, Toshinobu FURUSHO, Takashi SASA, Katsuhiro TSUCHIYA, Yuichi TERASHITA, Hirofumi TAKEGUCHI
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Patent number: 9732910Abstract: A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.Type: GrantFiled: September 26, 2014Date of Patent: August 15, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Koji Takayanagi, Kousuke Yoshihara, Yuichi Terashita, Toshinobu Furusho, Takashi Sasa
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Patent number: 9731226Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.Type: GrantFiled: February 22, 2013Date of Patent: August 15, 2017Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
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Patent number: 9372405Abstract: The pressure sensor detects a pressure in the operation chamber when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation chamber.Type: GrantFiled: January 17, 2012Date of Patent: June 21, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Toshinobu Furusho, Takahiro Ookubo, Takashi Sasa, Tsuyoshi Nogami
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Publication number: 20150367266Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.Type: ApplicationFiled: September 1, 2015Publication date: December 24, 2015Inventors: Yuichi Yoshida, Ryouichirou Naitou, Toshinobu Furusho
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Patent number: 9162163Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.Type: GrantFiled: September 24, 2013Date of Patent: October 20, 2015Assignee: Tokyo Electron LimitedInventors: Yuichi Yoshida, Ryouichirou Naitou, Toshinobu Furusho