Patents by Inventor Toshinobu Furusho

Toshinobu Furusho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10734251
    Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: August 4, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Koji Takayanagi, Yukie Minekawa, Yuichi Yoshida, Kousuke Yoshihara, Yuichi Terashita, Toshinobu Furusho, Takashi Sasa
  • Publication number: 20200227286
    Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.
    Type: Application
    Filed: August 2, 2018
    Publication date: July 16, 2020
    Inventors: Yuichi Terashita, Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa
  • Publication number: 20190332014
    Abstract: A treatment solution supply apparatus for supplying a treatment solution to a solution treatment apparatus which applies the treatment solution to a substrate to perform a predetermined treatment, there being a plurality of solution treatment apparatuses which are supply destinations of the treatment solution, the treatment solution supply apparatus includes: a sending unit common among the plurality of solution treatment apparatuses, the sending unit being configured to send the treatment solution stored in a treatment solution supply source to each of the plurality of solution treatment apparatuses; and a control unit configured to control the sending unit, wherein the sending unit includes a plurality of pumps configured to suck the treatment solution and load the treatment solution thereinto and to send the loaded treatment solution, and wherein the control unit is configured to control suction timing of each of the plurality of pumps so that at least one of the plurality of pumps becomes a state capable
    Type: Application
    Filed: April 24, 2019
    Publication date: October 31, 2019
    Inventors: Takahiro OOKUBO, Suguru ENOKIDA, Toshinobu FURUSHO
  • Patent number: 10268116
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: April 23, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
  • Patent number: 10074546
    Abstract: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: September 11, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Yuichi Terashita, Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa
  • Patent number: 10035173
    Abstract: A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: July 31, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Toshinobu Furusho, Takahiro Ookubo, Kousuke Yoshihara, Yusuke Yamamoto, Steffen Hornig
  • Patent number: 10022652
    Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: July 17, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
  • Patent number: 9975073
    Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.
    Type: Grant
    Filed: September 1, 2015
    Date of Patent: May 22, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Yuichi Yoshida, Ryouichirou Naitou, Toshinobu Furusho
  • Publication number: 20180093205
    Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
    Type: Application
    Filed: November 21, 2017
    Publication date: April 5, 2018
    Inventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
  • Publication number: 20180074407
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Application
    Filed: November 17, 2017
    Publication date: March 15, 2018
    Applicant: Tokyo Electron Limited
    Inventors: Kousuke YOSHIHARA, Koji TAKAYANAGI, Toshinobu FURUSHO, Takashi SASA, Daisuke ISHIMARU
  • Patent number: 9878267
    Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: January 30, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
  • Patent number: 9846363
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: December 19, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
  • Publication number: 20170296944
    Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
    Type: Application
    Filed: June 30, 2017
    Publication date: October 19, 2017
    Inventors: Kousuke YOSHIHARA, Katsunori ICHINO, Toshinobu FURUSHO, Takashi SASA, Katsuhiro TSUCHIYA, Yuichi TERASHITA, Hirofumi TAKEGUCHI
  • Patent number: 9732910
    Abstract: A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: August 15, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Koji Takayanagi, Kousuke Yoshihara, Yuichi Terashita, Toshinobu Furusho, Takashi Sasa
  • Patent number: 9731226
    Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: August 15, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Katsunori Ichino, Toshinobu Furusho, Takashi Sasa, Katsuhiro Tsuchiya, Yuichi Terashita, Hirofumi Takeguchi
  • Patent number: 9372405
    Abstract: The pressure sensor detects a pressure in the operation chamber when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation chamber.
    Type: Grant
    Filed: January 17, 2012
    Date of Patent: June 21, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Toshinobu Furusho, Takahiro Ookubo, Takashi Sasa, Tsuyoshi Nogami
  • Publication number: 20150367266
    Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.
    Type: Application
    Filed: September 1, 2015
    Publication date: December 24, 2015
    Inventors: Yuichi Yoshida, Ryouichirou Naitou, Toshinobu Furusho
  • Patent number: 9162163
    Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: October 20, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Yuichi Yoshida, Ryouichirou Naitou, Toshinobu Furusho
  • Publication number: 20150279702
    Abstract: A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
    Type: Application
    Filed: June 11, 2015
    Publication date: October 1, 2015
    Inventors: Toshinobu FURUSHO, Takahiro OOKUBO, Kousuke YOSHIHARA, Yusuke YAMAMOTO, Steffen HORNIG
  • Patent number: 9086190
    Abstract: A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
    Type: Grant
    Filed: March 16, 2011
    Date of Patent: July 21, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Toshinobu Furusho, Takahiro Ookubo, Kousuke Yoshihara, Yusuke Yamamoto, Steffen Hornig