Patents by Inventor Toshinori Ishii

Toshinori Ishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8086449
    Abstract: A VF detecting apparatus capable of highly accurate vocal fry (VF) detection includes: a very-short-term peak detection processing unit framing a speech signal with a first frame of a first frame length and first frame shift amount and detecting each power peak; a short-term periodicity detecting unit framing the speech signal with a second frame of a second frame length longer than the first frame length and a second frame shift amount larger than the first frame length and determining presence/absence of periodicity in each of the resulting frame; a periodicity checking unit for detecting power peaks in those frames determined to have no periodicity, from among the detected power peaks; and a similarity checking unit for detecting, for each of the selected power peaks, neighboring power peaks having high cross-correlation and detecting the section therebetween as the VF section.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: December 27, 2011
    Assignee: Advanced Telecommunications Research Institute International
    Inventors: Carlos Toshinori Ishii, Hiroshi Ishiguro, Norihiro Hagita
  • Patent number: 7820007
    Abstract: This silicon electrode plate for plasma etching is a silicon electrode plate for plasma etching with superior durability including silicon single crystal which, in terms of atomic ratio, contains 3 to 11 ppba of boron, and further contains a total of 0.5 to 6 ppba of either or both of phosphorus and arsenic.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: October 26, 2010
    Assignees: Sumco Corporation, Mitsubishi Materials Corporation
    Inventors: Hideki Fujiwara, Kazuhiro Ikezawa, Hiroaki Taguchi, Naofumi Iwamoto, Toshinori Ishii, Takashi Komekyu
  • Publication number: 20090089051
    Abstract: A VF detecting apparatus capable of highly accurate vocal fry (VF) detection includes: a very-short-term peak detection processing unit framing a speech signal with a first frame of a first frame length and first frame shift amount and detecting each power peak; a short-term periodicity detecting unit framing the speech signal with a second frame of a second frame length longer than the first frame length and a second frame shift amount larger than the first frame length and determining presence/absence of periodicity in each of the resulting frame; a periodicity checking unit for detecting power peaks in those frames determined to have no periodicity, from among the detected power peaks; and a similarity checking unit for detecting, for each of the selected power peaks, neighboring power peaks having high cross-correlation and detecting the section therebetween as the VF section.
    Type: Application
    Filed: December 20, 2005
    Publication date: April 2, 2009
    Inventors: Carlos Toshinori Ishii, Hiroshi Ishiguro, Norihiro Hagita
  • Publication number: 20070181868
    Abstract: This silicon electrode plate for plasma etching is a silicon electrode plate for plasma etching with superior durability including silicon single crystal which, in terms of atomic ratio, contains 3 to 11 ppba of boron, and further contains a total of 0.5 to 6 ppba of either or both of phosphorus and arsenic.
    Type: Application
    Filed: March 30, 2005
    Publication date: August 9, 2007
    Applicants: SUMCO CORPORATION, Mitsubishi Materials Corporation
    Inventors: Hideki Fujiwara, Kazuhiro Ikezawa, Hiroaki Taguchi, Naofumi Iwamoto, Toshinori Ishii, Takashi Komekyu
  • Patent number: 7015710
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: March 21, 2006
    Assignee: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Patent number: 7006907
    Abstract: In control apparatus and method for an automatic transmission, an initial hydraulic reference value is calculated which provides a reference value of an initial hydraulic from a shift kind and a throttle opening angle or from the parameter value corresponding to the throttle opening angle and a correction quantity is calculated for the reference value of the initial hydraulic on the basis of squares of a revolution speed of a piston calculated and of the revolution speed of the piston detected, the initial hydraulic reference value being set to the initial hydraulic during the ordinary gear shift and the initial hydraulic reference value being corrected by a correction quantity to set the corrected initial hydraulic reference value to the initial hydraulic when the gear shift to a predetermined target gear shift stage is carried out at a drive point different from during the ordinary gear shift.
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: February 28, 2006
    Assignee: JATCO LTD
    Inventors: Katsutoshi Usuki, Yuzo Yano, Toshinori Ishii, Masahiro Hamano, Yuichi Imamura, Mitsuo Kunou
  • Publication number: 20050222735
    Abstract: In control apparatus and method for an automatic transmission, an initial hydraulic reference value is calculated which provides a reference value of an initial hydraulic from a shift kind and a throttle opening angle or from the parameter value corresponding to the throttle opening angle and a correction quantity is calculated for the reference value of the initial hydraulic on the basis of squares of a revolution speed of a piston calculated and of the revolution speed of the piston detected, the initial hydraulic reference value being set to the initial hydraulic during the ordinary gear shift and the initial hydraulic reference value being corrected by a correction quantity to set the corrected initial hydraulic reference value to the initial hydraulic when the gear shift to a predetermined target gear shift stage is carried out at a drive point different from during the ordinary gear shift.
    Type: Application
    Filed: March 23, 2005
    Publication date: October 6, 2005
    Inventors: Katsutoshi Usuki, Yuzo Yano, Toshinori Ishii, Masahiro Hamano, Yuichi Imamura, Mitsuo Kunou
  • Patent number: 6937042
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: August 30, 2005
    Assignee: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Patent number: 6919732
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: July 19, 2005
    Assignee: Genesis Technology Incorporation
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Patent number: 6917211
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: July 12, 2005
    Assignee: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Patent number: 6903563
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: June 7, 2005
    Assignee: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Patent number: 6900647
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: May 31, 2005
    Assignee: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20050007130
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 13, 2005
    Applicant: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20050001644
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Applicant: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20050001641
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Applicant: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Kato, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20050001643
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Applicant: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20050001642
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Applicant: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Kato, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20040160236
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: February 12, 2004
    Publication date: August 19, 2004
    Applicant: Genesis Technology Incorporated
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Patent number: 6710608
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: March 23, 2004
    Assignee: Mitsubishi Materials Corporation
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda
  • Publication number: 20020186030
    Abstract: A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
    Type: Application
    Filed: February 19, 2002
    Publication date: December 12, 2002
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Hideaki Yoshida, Toshinori Ishii, Atushi Matsuda, Mituyoshi Ueki, Noriyoshi Tachikawa, Tadashi Nakamura, Naoki Katou, Shou Tai, Hayato Sasaki, Naohumi Iwamoto, Akihumi Mishima, Toshiharu Hiji, Akihiro Masuda