Patents by Inventor Toshio Enami

Toshio Enami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240088570
    Abstract: Provided are a structure and a building material that are capable of reflecting radio waves over a wide range of space.
    Type: Application
    Filed: January 28, 2022
    Publication date: March 14, 2024
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Hiroyuki NOMOTO, Toshio ENAMI
  • Patent number: 10131826
    Abstract: An adhesive film for a semiconductor chip with a through electrode, which is used for stacking multiple semiconductor chips each with a through electrode on a semiconductor wafer, which can favorably connect the through electrodes while suppressing formation of voids, and which can reduce the length of burrs protruding around the semiconductor chips. An adhesive film for a semiconductor chip with a through electrode, to be used for stacking multiple semiconductor chips each with a through electrode on a semiconductor wafer, the adhesive film having a minimum melt viscosity of 50 to 2500 Pa·s and a thixotropic index at 140° C. of 8 or lower.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: November 20, 2018
    Assignee: SEKISUI CHEMICAL CO., LTD.
    Inventors: Mai Nagata, Kohei Takeda, Toshio Enami
  • Publication number: 20170183548
    Abstract: The present invention aims to provide an adhesive film for a semiconductor chip with a through electrode, which is used for stacking multiple semiconductor chips each with a through electrode on a semiconductor wafer, which can favorably connect the through electrodes while suppressing formation of voids, and which can reduce the length of burrs protruding around the semiconductor chips. The present invention relates to an adhesive film for a semiconductor chip with a through electrode, to be used for stacking multiple semiconductor chips each with a through electrode on a semiconductor wafer, the adhesive film having a minimum melt viscosity of 50 to 2500 Pa·s and a thixotropic index at 140° C. of 8 or lower.
    Type: Application
    Filed: March 25, 2015
    Publication date: June 29, 2017
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Mai NAGATA, Kohei TAKEDA, Toshio ENAMI
  • Patent number: 8119323
    Abstract: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern.
    Type: Grant
    Filed: October 19, 2006
    Date of Patent: February 21, 2012
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Hiroji Fukui, Kenichi Aoki, Kunihiro Ichimura, Minoru Suezaki, Toshio Enami, Hideaki Ishizawa, Takao Unate, Hiroshi Kobayashi
  • Patent number: 7645514
    Abstract: It is an object of the invention to provide a curable resin composition excellent in mechanical strength, heat resistance, moisture resistance, flexibility, resistance to thermal cycles, resistance to solder reflow, dimensional stability, and the like after curing and providing high adhesion reliability and conduction reliability and an adhesive epoxy resin paste, an adhesive epoxy resin sheet, a conductive connection paste, and a conductive connection sheet using the curable resin composition, and an electronic component joined body. The invention relates to a curable resin composition, which contains an epoxy resin, a solid polymer having a functional group to react with the epoxy group and a curing agent for an epoxy resin, no phase separation structure being observed in a matrix of a resin when a cured product is dyed with a heavy metal and observed with a transmission electron microscope.
    Type: Grant
    Filed: December 26, 2003
    Date of Patent: January 12, 2010
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Koji Watanabe, Toshio Enami, Yoshiyuki Takebe, Tatsuo Suzuki
  • Patent number: 7591921
    Abstract: Provided is a heat-decaying material that hardly deteriorates and decomposed at ordinary service temperatures, but decays within a short period of time when heated at relatively low temperatures. This comprises a polyoxyalkylene resin as the principal ingredient thereof, and has an oxygen atom content of from 15 to 55% by mass. When heated at a predetermined temperature falling between 150 and 350° C., at least 95% by mass of the material decays within 10 minutes. The heat-decaying material has many applications for production of porous materials, conductive particles transfer sheets, transfer sheets for circuit formation, pattern formation, etc.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: September 22, 2009
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Hiroji Fukui, Toshio Enami
  • Publication number: 20090202942
    Abstract: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern.
    Type: Application
    Filed: October 19, 2006
    Publication date: August 13, 2009
    Inventors: Hiroji Fukui, Kenichi Aoki, Kunihiro Ichimura, Minoru Suezaki, Toshio Enami, Hideaki Ishizawa, Takao Unate, Hiroshi Kobayashi
  • Publication number: 20060154078
    Abstract: It is an object of the invention to provide a curable resin composition excellent in mechanical strength, heat resistance, moisture resistance, flexibility, resistance to thermal cycles, resistance to solder reflow, dimensional stability, and the like after curing and providing high adhesion reliability and conduction reliability and an adhesive epoxy resin paste, an adhesive epoxy resin sheet, a conductive connection paste, and a conductive connection sheet using the curable resin composition, and an electronic component joined body. The invention relates to a curable resin composition, which contains an epoxy resin, a solid polymer having a functional group to react with the epoxy group and a curing agent for an epoxy resin, no phase separation structure being observed in a matrix of a resin when a cured product is dyed with a heavy metal and observed with a transmission electron microscope.
    Type: Application
    Filed: December 26, 2003
    Publication date: July 13, 2006
    Inventors: Koji Watanabe, Toshio Enami, Yoshiyuki Takebe, Tatsuo Suzuki
  • Publication number: 20050276934
    Abstract: Provided is a heat-decaying material that hardly deteriorates and decomposed at ordinary service temperatures, but decays within a short period of time when heated at relatively low temperatures. This comprises a polyoxyalkylene resin as the principal ingredient thereof, and has an oxygen atom content of from 15 to 55% by mass. When heated at a predetermined temperature falling between 150 and 350° C., at least 95% by mass of the material decays within 10 minutes. The heat-decaying material has many applications for production of porous materials, conductive particles transfer sheets, transfer sheets for circuit formation, pattern formation, etc.
    Type: Application
    Filed: November 26, 2003
    Publication date: December 15, 2005
    Inventors: Hiroji Fukui, Toshio Enami
  • Patent number: 6635962
    Abstract: In the case where a plurality of second semiconductor chips (2a and 2b) are bonded to the surface side of a first semiconductor chip (1) via bump electrodes (11 and 21), an interconnection (9) for directly connecting electrode terminals (22a and 22b) of the two second semiconductor chips (2a and 2b) is formed on the surface of a passivation film (17) of the first semiconductor chip (1). As a result, a semiconductor device of a COC type in which a plurality of second semiconductor chips are mounted, while obtaining generalization of the first semiconductor chip, a signal can be transmitted/received between the second semiconductor chips without changing the design of the semiconductor device in the first semiconductor chip and a method for manufacturing the semiconductor device can be provided.
    Type: Grant
    Filed: September 12, 2001
    Date of Patent: October 21, 2003
    Assignee: Rohm Co. Ltd.
    Inventors: Kazutaka Shibata, Shigeyuki Ueda, Toshio Enami
  • Publication number: 20020031904
    Abstract: In the case where a plurality of second semiconductor chips (2a and 2b) are bonded to the surface side of a first semiconductor chip (1) via bump electrodes (11 and 21), an interconnection (9) for directly connecting electrode terminals (22a and 22b) of the two second semiconductor chips (2a and 2b) is formed on the surface of a passivation film (17) of the first semiconductor chip (1). As a result, a semiconductor device of a COC type in which a plurality of second semiconductor chips are mounted, while obtaining generalization of the first semiconductor chip, a signal can be transmitted/received between the second semiconductor chips without changing the design of the semiconductor device in the first semiconductor chip and a method for manufacturing the semiconductor device can be provided.
    Type: Application
    Filed: September 12, 2001
    Publication date: March 14, 2002
    Inventors: Kazutaka Shibata, Shigeyuki Ueda, Toshio Enami