Patents by Inventor Toshio Kitamura

Toshio Kitamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12115032
    Abstract: The present disclosure relates to a dental cutting zirconia blank having high relative density for preparing a dental restoration. More specifically, the present disclosure relates to a dental cutting zirconia blank which consists of a zirconia ceramics used for the cutting with the CAD/CAM system in the dental field, a semi-sinter zirconia blank (pre-sintered body) of which has high relative density, and which can provide a prosthesis device having high aesthetics after sintering. There is provided a dental cutting zirconia blank wherein the dental cutting zirconia blank has at least one layer consisting of zirconia powder containing 4 to 15 mol % of yttria or erbium oxide as a stabilizer, a relationship among pre-sintering density, final-sintering density and relative density satisfies the following relation: 54?Relative density (%)={(Pre-sintering density)/(Perfect-sintering density)}×100?70.
    Type: Grant
    Filed: April 19, 2023
    Date of Patent: October 15, 2024
    Assignee: SHOFU INC.
    Inventors: Toshio Kitamura, Rieko Aiba
  • Publication number: 20240315815
    Abstract: To provide a zirconia perfect sintered body which has a chroma of an excellent color tone and excellent translucency as compared with a zirconia mill blank for dental cutting and machining prepared from a zirconia raw material powder containing various stabilizing materials while maintaining high strength, and does not cause deformation.
    Type: Application
    Filed: May 31, 2024
    Publication date: September 26, 2024
    Applicant: SHOFU INC.
    Inventors: Seiji Ban, Shuhei Takahashi, Toshio Kitamura, Rieko Aiba
  • Publication number: 20240315816
    Abstract: To provide a zirconia perfect sintered body which has a chroma of an excellent color tone and excellent translucency as compared with a zirconia mill blank for dental cutting and machining prepared from a zirconia raw material powder containing various stabilizing materials while maintaining high strength, and does not cause deformation.
    Type: Application
    Filed: May 31, 2024
    Publication date: September 26, 2024
    Applicant: SHOFU INC.
    Inventors: Seiji BAN, Shuhei TAKAHASHI, Toshio KITAMURA, Rieko AIBA
  • Patent number: 11737957
    Abstract: A dental curable composition capable of use as a dental material that can substitute part or all of a natural tooth, in particular, a resin material for dental cutting and machining in the field of dental care. When a block shape usable as the resin material is produced, while mechanical properties and aesthetic properties required for a crown prosthetic appliance are maintained, the dental curable composition can be molded and processed with pressure and heating while strain generated in the block is reduced and no cracks and chipping occur. The dental curable composition includes (a) a polymerizable monomer and (b) a filler in a weight ratio of 10:90 to 70:30, and 0.01 to 10 parts by weight of (c) a polymerization initiator and 0.001 to 1 part by weight of (d) a chain transfer agent being a terpenoid compound based on 100 parts by weight of the polymerizable monomer (a).
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: August 29, 2023
    Assignee: SHOFU INC.
    Inventors: Toshiyuki Nakatsuka, Toshio Kitamura, Masanori Goto, Tomohiro Kai, Satoshi Takano, Yoshiyuki Jogetsu
  • Publication number: 20230255734
    Abstract: The present disclosure relates to a dental cutting zirconia blank having high relative density for preparing a dental restoration. More specifically, the present disclosure relates to a dental cutting zirconia blank which consists of a zirconia ceramics used for the cutting with the CAD/CAM system in the dental field, a semi-sinter zirconia blank (pre-sintered body) of which has high relative density, and which can provide a prosthesis device having high aesthetics after sintering.
    Type: Application
    Filed: April 19, 2023
    Publication date: August 17, 2023
    Applicant: SHOFU INC.
    Inventors: Toshio KITAMURA, Rieko AIBA
  • Patent number: 11660172
    Abstract: The present disclosure relates to a dental cutting zirconia blank having high relative density for preparing a dental restoration. More specifically, the present disclosure relates to a dental cutting zirconia blank which consists of a zirconia ceramics used for the cutting with the CAD/CAM system in the dental field, a semi-sinter zirconia blank (pre-sintered body) of which has high relative density, and which can provide a prosthesis device having high aesthetics after sintering. There is provided a dental cutting zirconia blank wherein the dental cutting zirconia blank has at least one layer consisting of zirconia powder containing 4 to 15 mol % of yttria or erbium oxide as a stabilizer, a relationship among pre-sintering density, final-sintering density and relative density satisfies the following relation: 54?Relative density(%)={(Pre-sintering density)/(Perfect-sintering density)}×100?70.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: May 30, 2023
    Assignee: SHOFU INC.
    Inventors: Toshio Kitamura, Rieko Aiba
  • Patent number: 11622840
    Abstract: To provide a liquid material which can only adjust transparency by applying on a part of a zirconia crown having high transparency, without coloring. The present disclosure provides an opaque imparting liquid used for a prosthesis device cut and machined from a dental zirconia for cutting and machining, comprising; (a) 10 to 39 wt. % of a water-soluble aluminum compound and/or a water-soluble lanthanum compound, (b) 60 to 89 wt. % of water, and (c) 1 to 20 wt. % of an organic solvent.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: April 11, 2023
    Assignee: SHOFU INC.
    Inventors: Toshio Kitamura, Shuhei Takahashi
  • Publication number: 20220347927
    Abstract: A manufacturing method for a prosthetic apparatus for dental purpose according to one aspect of the present invention includes: acquiring scan data of a model that is a reproduction of at least a part of an inside of an oral cavity of a patient; creating shape data of a shaped body for dental purpose on a basis of the scan data; producing a shaped body on a basis of the shape data; covering at least a part of the shaped body and at least a part of a model with film, the shaped body attached to the model; releasing air in a part covered with the film to deform the film and bring the shaped body into close contact with the model; and curing the shaped body in a state where the shaped body is in close contact with the model.
    Type: Application
    Filed: September 17, 2020
    Publication date: November 3, 2022
    Inventors: Kenji KONO, Hidefumi FUJIMURA, Toshiyuki TANAKA, Yuushin OKIMOTO, Sayaka ISHIDA, Toshio KITAMURA
  • Patent number: 11311350
    Abstract: To provide a resin cured body for dental cutting processing used for cutting and machining using a dental CAD/CAM system, wherein the resin cured body consists of the cured body of a composition comprising: (a) an inorganic filler containing 55 wt. % or more of an element belonging to group II and/or group XIII of the periodic table in terms of an oxide, (b) a polymerizable monomer, and (c) a polymerization initiator.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: April 26, 2022
    Assignee: SHOFU INC.
    Inventors: Mamoru Hosokawa, Toshio Kitamura
  • Patent number: 11008671
    Abstract: An object of the present invention is to improve quality of a group-III nitride crystal, and also improve performance and manufacturing yield of a semiconductor device manufactured using the crystal. Provided is a nitride crystal represented by the composition formula of InxAlyGa1-x-yN (satisfying 0?x?1, 0?y?1, 0?x+y?1), with a hardness exceeding 22.0 GPa as measured by a nanoindentation method using an indenter with a maximum load applied thereto being within a range of 1 mN or more and 50 mN or less.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: May 18, 2021
    Assignees: SCIOCS COMPANY LIMITED, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hajime Fujikura, Taichiro Konno, Takayuki Suzuki, Toshio Kitamura, Tetsuji Fujimoto, Takehiro Yoshida
  • Patent number: 10945927
    Abstract: To provide a phosphate-based dental investment material which can used for metal and press ceramic and especially can impart the lubricity to the surface of a press ceramic, and a phosphate-based dental investment material which can be subjected to a flash heating for press ceramic, can obtain sufficient the hardening expansion, and can easily remove the investment material after press molding. A phosphate-based dental investment material of the present disclosure comprising a powder material and a liquid material, wherein the powder material contains (a) magnesium oxide: 5 to 20 wt. %; (b) ammonium dihydrogenphosphate: 8 to 25 wt. % and the liquid material contains (c) aqueous solution including a cation-treated colloidal silica.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: March 16, 2021
    Assignee: SHOFU INC.
    Inventors: Toshio Kitamura, Masahiro Kazama
  • Publication number: 20200113658
    Abstract: To provide a zirconia perfect sintered body which has a chroma of an excellent color tone and excellent translucency as compared with a zirconia mill blank for dental cutting and machining prepared from a zirconia raw material powder containing various stabilizing materials while maintaining high strength, and does not cause deformation.
    Type: Application
    Filed: February 20, 2018
    Publication date: April 16, 2020
    Applicant: SHOFU INC.
    Inventors: Seiji BAN, Shuhei TAKAHASHI, Toshio KITAMURA, Rieko AIBA
  • Publication number: 20200032417
    Abstract: An object of the present invention is to improve quality of a group-III nitride crystal, and also improve performance and manufacturing yield of a semiconductor device manufactured using the crystal. Provided is a nitride crystal represented by the composition formula of InxAlyGa1-x-yN (satisfying 0?x?1, 0?y?1, 0?x+y?1), with a hardness exceeding 22.0 GPa as measured by a nanoindentation method using an indenter with a maximum load applied thereto being within a range of 1 mN or more and 50 mN or less.
    Type: Application
    Filed: May 23, 2019
    Publication date: January 30, 2020
    Inventors: Hajime FUJIKURA, Taichiro KONNO, Takayuki SUZUKI, Toshio KITAMURA, Tetsuji FUJIMOTO, Takehiro YOSHIDA
  • Publication number: 20190388196
    Abstract: To provide a liquid material which can only adjust transparency by applying on a part of a zirconia crown having high transparency, without coloring. The present disclosure provides an opaque imparting liquid used for a prosthesis device cut and machined from a dental zirconia for cutting and machining, comprising; (a) 10 to 39 wt. % of a water-soluble aluminum compound and/or a water-soluble lanthanum compound, (b) 60 to 89 wt. % of water, and (c) 1 to 20 wt. % of an organic solvent.
    Type: Application
    Filed: March 28, 2019
    Publication date: December 26, 2019
    Applicant: SHOFU INC.
    Inventors: Toshio KITAMURA, Shuhei TAKAHASHI
  • Publication number: 20190380815
    Abstract: To provide a dental zirconia blank which has high permeability, can reproduce a color tone close to a natural tooth and a strength to be able to tolerate in oral cavity. Furthermore, to provide a dental zirconia blank from which a prosthesis device of 4 or more units having high strength can be prepared. To provide a dental zirconia blank having a plurality of layers, comprising; a first layer consisting of a high permeability ceramic containing 91.6 to 96.5 mol % of zirconium oxide and 3.5 to 8.4 mol % of yttrium oxide, and a second layer consisting of a low permeability ceramic containing 95.6 to 98.5 mol % of zirconium oxide and 1.5 to 4.4 mol % of yttrium oxide, wherein a content rate of yttrium oxide in the low permeability ceramic is lower than a content rate of yttrium oxide in the high permeability ceramic by 0.5 to 5.4 mol %, and the first layer is positioned at one end of the plurality of layers in a layering direction.
    Type: Application
    Filed: March 19, 2019
    Publication date: December 19, 2019
    Applicant: SHOFU INC.
    Inventors: Rieko AIBA, Shuhei TAKAHASHI, Toshio KITAMURA
  • Patent number: 10470982
    Abstract: Provided herein is a curable silicone composition that has high optical transparency after being cured and that is in a putty form to be hand-mixable. A curable silicone composition contains: a specific organopolysiloxane as a component (1); a specific organohydrogenpolysiloxane as a component (2); a filler as a component (3); and a catalyst as a component (4). The difference between the refractive index of one of the components (1) to (3) that has the highest refractive index and the refractive index of one of the components (1) to (3) that has the lowest refractive index is 0.1000 or less. The complex viscosity of any of constituent compositions of the curable silicon composition before the curable silicone composition is cured is 10 Pa·s to 100000 Pa·s, as measured under predetermined measurement condition.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: November 12, 2019
    Assignee: SHOFU INC.
    Inventors: Shun Shimosoyama, Toshio Kitamura
  • Publication number: 20190209528
    Abstract: An object of the present invention is to provide a new medicinal drug, a method, use, and a compound; which are for refractory leukemia associated with MLL, for which existing chemotherapy is not effective. According to the present invention, there is provided a medicinal drug for preventing or curing leukemia associated with MLL, containing 5-hydroxy-1H-imidazole-4-carboxamide, or a salt thereof or a hydrate thereof.
    Type: Application
    Filed: March 12, 2019
    Publication date: July 11, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Hiroyuki IWAMURA, Motoki SAITO, Susumu GOYAMA, Toshio KITAMURA
  • Publication number: 20190192257
    Abstract: To provide a resin cured body for dental cutting processing used for cutting and machining using a dental CAD/CAM system, wherein the resin cured body consists of the cured body of a composition comprising: (a) an inorganic filler containing 55 wt. % or more of an element belonging to group II and/or group XIII of the periodic table in terms of an oxide, (b) a polymerizable monomer, and (c) a polymerization initiator.
    Type: Application
    Filed: September 28, 2018
    Publication date: June 27, 2019
    Applicant: SHOFU INC.
    Inventors: Mamoru HOSOKAWA, Toshio KITAMURA
  • Patent number: 10290489
    Abstract: There is provided a method for manufacturing a group-III nitride substrate, including: (a) preparing a substrate which is made of a group III-nitride crystal and which has a high oxygen concentration domain where an oxygen concentration is higher than that of a matrix of the crystal; (b) irradiating the substrate with laser beam aiming at the high oxygen concentration domain, forming a through-hole penetrating the substrate in a thickness direction, and removing at least a part of the high oxygen concentration domain from the substrate; and (c) embedding at least a part of an inside of the through-hole by growing the group-III nitride crystal in the through-hole.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: May 14, 2019
    Assignees: Sciocs Company Limited, Sumitomo Chemical Company, Limited
    Inventors: Toshio Kitamura, Masatomo Shibata, Takehiro Yoshida
  • Patent number: 10253432
    Abstract: A semiconductor substrate manufacturing method includes: epitaxially growing a columnar III nitride semiconductor single crystal on a principal place of a circular substrate; removing a hollow cylindrical region at an outer peripheral edge side of the III nitride semiconductor single crystal to leave a solid columnar region at an inside of the hollow cylindrical region of the III nitride semiconductor single crystal; and slicing the solid columnar region after removing the hollow cylindrical region. The hollow cylindrical region is removed such that the shape of the III nitride semiconductor single crystal is always keeps an axial symmetry that a center axis of the III nitride semiconductor single crystal is defined as a symmetric axis.
    Type: Grant
    Filed: January 28, 2014
    Date of Patent: April 9, 2019
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masatomo Shibata, Takehiro Yoshida, Toshio Kitamura, Yukio Abe