Patents by Inventor Toshio Konishi
Toshio Konishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7754397Abstract: A phase-shift mask including a transparent substrate, and a light-shielding film formed on the transparent substrate and provided with first apertures and second apertures which are alternately arranged. The transparent substrate is partially removed through the second apertures to form a recessed portion having a predetermined depth. Light transmitted through the first apertures and light transmitted through the second apertures are enabled to alternately invert in phase thereof. This phase-shift mask is characterized in that a phase shift of transmitted light is set in conformity with a pitch between an edge of the first aperture and an edge of the second aperture of the light-shielding film.Type: GrantFiled: June 14, 2007Date of Patent: July 13, 2010Assignee: Toppan Printing Co., Ltd.Inventors: Toshio Konishi, Yosuke Kojima, Satoru Nemoto, Jun Sasaki, Keishi Tanaka
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Patent number: 7632613Abstract: A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.Type: GrantFiled: October 20, 2006Date of Patent: December 15, 2009Assignee: Toppan Printing Co., Ltd.Inventors: Yosuke Kojima, Toshio Konishi, Keishi Tanaka, Masao Otaki, Jun Sasaki
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Publication number: 20090053348Abstract: In an injection apparatus of a molding machine, a bad influence given to a molded product due to a water component contained in a resin is eliminated by maintaining the resin immediately before being melted in a dry state. The injection apparatus has a cylinder (11) to which a molding material is supplied and a metering member (13) that meters the molding material by being driven in the cylinder (11). The cylinder (11) has a material supply opening (11b) through which the molding material is supplied. A dry gas, which has been heated at a predetermined temperature, is supplied to a vicinity of the material supply opening (11b) in the cylinder (11).Type: ApplicationFiled: January 23, 2007Publication date: February 26, 2009Inventors: Toshio Konishi, Yoshiyuki Imatomi
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Patent number: 7496427Abstract: A molding machine includes a control part incorporating a specific server program and a memory part saving internal data of the molding machine. The specific server program transmits the internal data, which is converted into a predetermined format and stored in the memory part, to a network.Type: GrantFiled: September 8, 2006Date of Patent: February 24, 2009Assignee: Sumitomo Heavy Industries, Ltd.Inventor: Toshio Konishi
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Publication number: 20070269726Abstract: A phase-shift mask including a transparent substrate, and a light-shielding film formed on the transparent substrate and provided with first apertures and second apertures which are alternately arranged. The transparent substrate is partially removed through the second apertures to form a recessed portion having a predetermined depth. Light transmitted through the first apertures and light transmitted through the second apertures are enabled to alternately invert in phase thereof. This phase-shift mask is characterized in that a phase shift of transmitted light is set in conformity with a pitch between an edge of the first aperture and an edge of the second aperture of the light-shielding film.Type: ApplicationFiled: June 14, 2007Publication date: November 22, 2007Applicant: TOPPAN PRINTING CO., LTDInventors: Toshio Konishi, Yosuke Kojima, Satoru Nemoto, Jun Sasaki, Keishi Tanaka
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Publication number: 20070037072Abstract: A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.Type: ApplicationFiled: October 20, 2006Publication date: February 15, 2007Applicant: TOPPAN PRINTING CO., LTD.Inventors: Yosuke Kojima, Toshio Konishi, Keishi Tanaka, Masao Otaki, Jun Sasaki
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Publication number: 20070009627Abstract: A molding machine includes a control part incorporating a specific server program and a memory part saving internal data of the molding machine. The specific server program transmits the internal data, which is converted into a predetermined format and stored in the memory part, to a network.Type: ApplicationFiled: September 8, 2006Publication date: January 11, 2007Inventor: Toshio Konishi
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Patent number: 6848895Abstract: A display apparatus of an injection molding apparatus has a plurality of display areas on a screen of a display unit so as to perform a profile display of a molding data profile on an individual area basis. A program memory stores a program for defining a plurality of independent display areas on a screen of a display part, a program for arbitrarily relating the molding data to each of the display areas, a program for setting a display start timing to display the molding data profile related to each of the display areas, and a program for displaying the molding data profile related to each of the display areas on an individual area basis. A display control part controls the display part to display the molding data profile independently in the plurality of display areas on an individual area basis.Type: GrantFiled: October 28, 2002Date of Patent: February 1, 2005Assignee: Sumitomo Heavy Industries, Ltd.Inventors: Toshio Konishi, Susumu Moriwaki
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Patent number: 6638666Abstract: A substrate for a transfer mask, which comprises a first silicon layer formed of monocrystalline silicon, a silicon oxide film formed on the first silicon layer and having a thickness ranging from 0.2 to 0.8 &mgr;m, and a second silicon layer formed on the silicon oxide film. A transfer mask which is manufactured by making use of this substrate is featured in that it is possible to prevent a transfer pattern from being cracked or destroyed due to stress from the silicon oxide film on the occasion of manufacturing the transfer mask, thereby providing a defect-free transfer mask.Type: GrantFiled: January 23, 2002Date of Patent: October 28, 2003Assignee: Toppan Printing Co., Ltd.Inventors: Toshio Konishi, Akira Tamura, Kojiro Ito, Yushin Sasaki, Hideyuki Eguchi
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Publication number: 20030082255Abstract: A display apparatus of an injection molding apparatus has a plurality of display areas on a screen of a display unit so as to perform a profile display of a molding data profile on an individual area basis. A program memory stores a program for defining a plurality of independent display areas on a screen of a display part, a program for arbitrarily relating the molding data to each of the display areas, a program for setting a display start timing to display the molding data profile related to each of the display areas, and a program for displaying the molding data profile related to each of the display areas on an individual area basis. A display control part controls the display part to display the molding data profile independently in the plurality of display areas on an individual area basis.Type: ApplicationFiled: October 28, 2002Publication date: May 1, 2003Applicant: Sumitomo Heavy Industries, Ltd.Inventors: Toshio Konishi, Susumu Moriwaki
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Publication number: 20020060297Abstract: A substrate for a transfer mask, which comprises a first silicon layer formed of monocrystalline silicon, a silicon oxide film formed on the first silicon layer and having a thickness ranging from 0.2 to 0.8 &mgr;m, and a second silicon layer formed on the silicon oxide film. A transfer mask which is manufactured by making use of this substrate is featured in that it is possible to prevent a transfer pattern from being cracked or destroyed due to stress from the silicon oxide film on the occasion of manufacturing the transfer mask, thereby providing a defect-free transfer mask.Type: ApplicationFiled: January 23, 2002Publication date: May 23, 2002Applicant: Toppan Printing Co., Ltd.Inventors: Toshio Konishi, Akira Tamura, Kojiro Ito, Yushin Sasaki, Hideyuki Eguchi
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Patent number: 5462806Abstract: A plastic lens comprising a plastic lens base material having provided on at least one surface thereof (1) a primer layer comprising a resin containing at least one organosilicon compound represented by the following general formula (I):R.sup.1.sub.m R.sup.2.sub.n Si(OR.sup.3).sub.4-m-n (I)wherein R.sup.1 and R.sup.2 each independently represents an alkyl group, an alkenyl group, an aryl group, an aralkyl group or a halogen atom, R.sup.3 represents an alkyl group, an acyl group, an aryl group or an aralkyl group, and m and n are each 0 or 1, or a hydrolyzate thereof, (2) a hard coat layer and, optionally, (3) a reflection preventing layer in this order is disclosed. The plastic lens according to the present invention is characterized by having an excellent scratch resistance even though the lens has the primer layer, and also having an excellent impact resistance even though the lens has the hard coat layer.Type: GrantFiled: May 17, 1994Date of Patent: October 31, 1995Assignee: Nikon CorporationInventors: Toshio Konishi, Toshihiko Horibe, Toru Yashiro, Kouji Watanabe, Toshiya Shuin
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Patent number: 4879085Abstract: A polyacetal resin is manufactured by an improvement whereby a polyacetal resin having a melt index (MI) of 0.3.about.5.Type: GrantFiled: April 1, 1988Date of Patent: November 7, 1989Assignee: Polyplastics Co., Ltd.Inventors: Kotaro Taniguchi, Toshio Konishi, Takehiko Shimura, Shigekazu Tanimoto, Shigeru Nedzu
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Patent number: 4601433Abstract: An apparatus for winding a wire around a toroidal core is disclosed which includes a core holder for supporting the toroidal core, moving the same in the directions of first and second axes and rotating the same, first and second clamps for clamping one end of the wire, a clamp driver for holding the first and second clamps and moving the position thereof in the directions of the first and second axes and rotating the same, a wire holder positioned near the toroidal core for supporting the wire, a detector for detecting the position of the wire and the aperture of the toroidal core and a control device for controlling the core holder and the clamp driver by the output from the detector.Type: GrantFiled: July 20, 1984Date of Patent: July 22, 1986Assignee: Sony CorporationInventors: Tsuneyuki Hayashi, Manabu Yamauchi, Kazuhide Tago, Toshio Konishi, Shinji Hirai