Patents by Inventor Toshio Mochizuki
Toshio Mochizuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220145438Abstract: The duplex stainless steel material according to the present disclosure has a chemical composition consisting of, in mass %, C: 0.030% or less, Si: 0.20 to 1.00%, Mn: 0.50 to 7.00%, P: 0.040% or less, S: 0.0100% or less, Al: 0.100% or less, Ni: 4.20 to 9.00%, Cr: 20.00 to 28.00%, Mo: 0.50 to 2.00%, Cu: 1.90 to 4.00%, N: 0.150 to 0.350%, V: 0.01 to 1.50%, and one or more types of element selected from the group consisting of Ca: 0.0001 to 0.0200% and Mg: 0.0001 to 0.0200%, with the balance being Fe and impurities, and satisfying Formulae (1) and (2) described in the description, a microstructure consisting of 35.0 to less than 50.0% of ferrite in volume ratio and austenite as the balance, and a yield strength of 550 MPa or more.Type: ApplicationFiled: August 18, 2020Publication date: May 12, 2022Inventors: Mikiko NOGUCHI, Yusaku TOMIO, Toshio MOCHIZUKI
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Patent number: 10246765Abstract: A martensitic Cr-containing steel having excellent corrosion resistance, SSC resistance, and IGHIC resistance is provided. A martensitic Cr-containing steel according to the present invention includes: a chemical composition consisting of, by mass %, Si: 0.05 to 1.0%, Mn: 0.1 to 1.0%, Cr: 8 to 12%, V: 0.01 to 1.0%, sol. Al: 0.005 to 0.10%, with the balance being Fe and impurities, wherein an effective Cr amount defined by “Cr?16.6×C” is not less than 8%, and an Mo equivalent defined by “Mo+0.5×W” is 0.03 to 2%; a micro-structure wherein a grain size number of prior-austenite crystal grain is not less than 8.0; and a yield strength of less than 379 to 551 MPa, wherein a grain-boundary segregation ratio of Mo and W is not less than 1.5.Type: GrantFiled: December 24, 2014Date of Patent: April 2, 2019Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventors: Tomohiko Omura, Yusaku Tomio, Hideki Takabe, Toshio Mochizuki
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Publication number: 20160326617Abstract: A martensitic Cr-containing steel having excellent corrosion resistance, SSC resistance, and IGHIC resistance is provided. A martensitic Cr-containing steel according to the present invention includes: a chemical composition consisting of, by mass %, Si: 0.05 to 1.0%, Mn: 0.1 to 1.0%, Cr: 8 to 12%, V: 0.01 to 1.0%, sol. Al: 0.005 to 0.10%, with the balance being Fe and impurities, wherein an effective Cr amount defined by “Cr?16.6×C” is not less than 8%, and an Mo equivalent defined by “Mo+0.5×W” is 0.03 to 2%; a micro-structure wherein a grain size number of prior-austenite crystal grain is not less than 8.0; and a yield strength of less than 379 to 551 MPa, wherein a grain-boundary segregation ratio of Mo and W is not less than 1.5.Type: ApplicationFiled: December 24, 2014Publication date: November 10, 2016Inventors: Tomohiko Omura, Yusaku Tomio, Hideki Takabe, Toshio Mochizuki
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Patent number: 9468967Abstract: The pipe end correction method for correcting an inner diameter of pipe end of a seamless pipe made of a high Cr stainless steel containing 8 to 35 mass % Cr, and 0.1 to 10 mass % Ni includes a pipe end correction step following hot tube-making and heat treatment, that forces a plug into the inside of pipe end portion for inner diameter correction so as to expand the pipe end portion while oxide scale, which is generated during tube-making or heat treatment, remains accumulated on an inner surface of the pipe end portion. A lubricant film forming step, prior to the pipe end correction step, applies lubricant at least either on the inner surface of the pipe end portion of the seamless pipe or on a surface of the plug. Seizure flaws can be prevented on the inner surface of the pipe end portion of the high Cr stainless steel.Type: GrantFiled: February 14, 2012Date of Patent: October 18, 2016Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventor: Toshio Mochizuki
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Publication number: 20130333429Abstract: The pipe end correction method for correcting an inner diameter of pipe end of a seamless pipe made of a high Cr stainless steel containing 8 to 35 mass % Cr, and 0.1 to 10 mass % Ni includes a pipe end correction step following hot tube-making and heat treatment, that forces a plug into the inside of pipe end portion for inner diameter correction so as to expand the pipe end portion while oxide scale, which is generated during tube-making or heat treatment, remains accumulated on an inner surface of the pipe end portion. A lubricant film forming step, prior to the pipe end correction step, applies lubricant at least either on the inner surface of the pipe end portion of the seamless pipe or on a surface of the plug. Seizure flaws can be prevented on the inner surface of the pipe end portion of the high Cr stainless steel.Type: ApplicationFiled: February 14, 2012Publication date: December 19, 2013Applicant: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventor: Toshio Mochizuki
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Patent number: 7714264Abstract: Disclosed herein is a semiconductor integrated circuit device such as a for-camera preprocessing LSI suitable for a semiconductor integrated circuit and having improved responsiveness. In a D/A converter circuit for generating a feedback signal for compensating for black level variation in a for-camera preprocessing LSI, first-conductivity-type MOSFETs as first current sources produce currents corresponding to digital signals. The digital signals are supplied to first-conductivity-type first differential MOSFETs and second-conductivity-type second differential MOSFETs, with the gates and drains of the first differential MOSFETs and the gates and drains of the second differential MOSFETs being connected together respectively.Type: GrantFiled: December 14, 2008Date of Patent: May 11, 2010Assignee: Renesas Technology Corp.Inventors: Toshio Mochizuki, Takanobu Ambo
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Publication number: 20090095884Abstract: Disclosed herein is a semiconductor integrated circuit device such as a for-camera preprocessing LSI suitable for a semiconductor integrated circuit and having improved responsiveness. In a D/A converter circuit for generating a feedback signal for compensating for black level variation in a for-camera preprocessing LSI, first-conductivity-type MOSFETs as first current sources produce currents corresponding to digital signals. The digital signals are supplied to first-conductivity-type first differential MOSFETs and second-conductivity-type second differential MOSFETs, with the gates and drains of the first differential MOSFETs and the gates and drains of the second differential MOSFETs being connected together respectively.Type: ApplicationFiled: December 14, 2008Publication date: April 16, 2009Inventors: Toshio MOCHIZUKI, Takanobu AMBO
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Patent number: 7488927Abstract: Disclosed herein is a semiconductor integrated circuit device such as a for-camera preprocessing LSI suitable for a semiconductor integrated circuit and having improved responsiveness. In a D/A converter circuit for generating a feedback signal for compensating for black level variation in a for-camera preprocessing LSI, first-conductivity-type MOSFETs as first current sources produce currents corresponding to digital signals. The digital signals are supplied to first-conductivity-type first differential MOSFETs and second-conductivity-type second differential MOSFETs, with the gates and drains of the first differential MOSFETs and the gates and drains of the second differential MOSFETs being connected together respectively.Type: GrantFiled: January 26, 2007Date of Patent: February 10, 2009Assignee: Renesas Technology Corp.Inventors: Toshio Mochizuki, Takanobu Ambo
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Publication number: 20080057506Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: ApplicationFiled: June 26, 2007Publication date: March 6, 2008Inventors: Stefan Somlo, Toshio Mochizuki
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Patent number: 7294465Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: GrantFiled: January 21, 2005Date of Patent: November 13, 2007Assignee: Albert Einstein College of Medicine of Yeshiva UniversityInventors: Stefan Somlo, Toshio Mochizuki
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Publication number: 20070229677Abstract: Disclosed herein is a semiconductor integrated circuit device such as a for-camera preprocessing LSI suitable for a semiconductor integrated circuit and having improved responsiveness. In a D/A converter circuit for generating a feedback signal for compensating for black level variation in a for-camera preprocessing LSI, first-conductivity-type MOSFETs as first current sources produce currents corresponding to digital signals. The digital signals are supplied to first-conductivity-type first differential MOSFETs and second-conductivity-type second differential MOSFETs, with the gates and drains of the first differential MOSFETs and the gates and drains of the second differential MOSFETs being connected together respectively.Type: ApplicationFiled: January 26, 2007Publication date: October 4, 2007Inventors: Toshio Mochizuki, Takanobu Ambo
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Patent number: 7268529Abstract: The present invention provides a band gap type reference voltage generating circuit and a semiconductor integrated circuit having the same, capable of generating a reference voltage of about 1.2V or less whose temperature dependency is low, and realizing reduced offset voltage dependency of a differential amplifier. A band gap part has: a first resistor and a first bipolar transistor connected in series between power supply voltage terminals; a second resistor, a second bipolar transistor, and a third resistor connected in series between the power supply voltage terminals; and a differential amplifier that receives voltages generated by the first and second resistors, and an output of the differential amplifier is applied to the bases of the two transistors.Type: GrantFiled: September 6, 2006Date of Patent: September 11, 2007Assignee: Renesas Technology Corp.Inventors: Toshio Mochizuki, Eiki Imaizumi, Sachiko Okumura
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Publication number: 20070052405Abstract: The present invention provides a band gap type reference voltage generating circuit and a semiconductor integrated circuit having the same, capable of generating a reference voltage of about 1.2V or less whose temperature dependency is low, and realizing reduced offset voltage dependency of a differential amplifier. A band gap part has: a first resistor and a first bipolar transistor connected in series between power supply voltage terminals; a second resistor, a second bipolar transistor, and a third resistor connected in series between the power supply voltage terminals; and a differential amplifier that receives voltages generated by the first and second resistors, and an output of the differential amplifier is applied to the bases of the two transistors.Type: ApplicationFiled: September 6, 2006Publication date: March 8, 2007Inventors: Toshio Mochizuki, Eiki Imaizumi, Sachiko Okumura
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Patent number: 7083915Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: GrantFiled: January 2, 2001Date of Patent: August 1, 2006Assignee: Albert Einstein College of Medicine of Yeshiva UniversityInventors: Stefan Somlo, Toshio Mochizuki
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Publication number: 20050170399Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: ApplicationFiled: January 21, 2005Publication date: August 4, 2005Inventors: Stefan Somlo, Toshio Mochizuki
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Publication number: 20020061520Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: ApplicationFiled: January 2, 2001Publication date: May 23, 2002Inventors: Stefan Somlo, Toshio Mochizuki
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Patent number: 6228591Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: GrantFiled: August 30, 1999Date of Patent: May 8, 2001Assignee: Albert Einstein College of Medicine of Yeshiva UniversityInventors: Stefan Somlo, Toshio Mochizuki
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Patent number: 6031088Abstract: The present invention provides a purified and isolated wild type PKD2 gene, as well as mutated forms of this gene. The present invention also provides one or more single-stranded nucleic acid probes which specifically hybridize to the wild type PKD2 gene or the mutated PKD2 gene, and mixtures thereof, which may be formulated in kits, and used in the diagnosis of ADPKD associated with the mutated PKD2 gene. The present invention also provides a method for diagnosing ADPKD caused by a mutated PKD2 gene, as well as a method for treating autosomal dominant polycystic kidney disease caused by a mutated PKD2 gene.Type: GrantFiled: May 23, 1996Date of Patent: February 29, 2000Assignee: Albert Einstein College of Medicine of Yeshiva UniversityInventors: Stefan Somlo, Toshio Mochizuki
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Patent number: 5882586Abstract: A heat-resistant nickel-based alloy having excellent welding properties, said nickel-based alloy consisting essentially of, in terms of wt. %, 0.05 to 0.25% of C, 18 to 25% of Cr, 15 to 25% of Co, at least one selected from the group consisting of up to 3.5% of Mo and 5 to 10% of W, with W+1/2Mo being 5 to 10%, 1.0 to 5.0% of Ti, 1.0 to 4.0% of Al, 0.5 to 4.5% of Ta, 0.2 to 3.0% of Nb, 0.005 to 0.10% of Zr, 0.001 to 0.01% of B and the balance being Ni and unavoidable impurities, wherein the (Al+Ti) content and the (W+1/2Mo) content are within the range surrounded by the lines connecting points A (Al+Ti: 5%, W+1/2Mo: 10%), B (Al+Ti: 5%, W+1/2Mo: 5%), C (Al+Ti: 7%, W+1/2Mo: 5%), and D (Al+Ti: 7%, W+1/2Mo: 10%) excluding the line A-B in FIG. 1.Type: GrantFiled: July 24, 1997Date of Patent: March 16, 1999Assignees: Mitsubishi Steel Mfg. Co., Ltd., Mitsubishi Jukogyo Kabushiki KaishaInventors: Itaru Tamura, Kazunori Tokoro, Takashi Kawabata, Tsuyoki Kokubun, Toshio Mochizuki, Shuichi Sakashita, Hisataka Kawai, Ikuo Okada, Ichiro Tsuji, Kouji Takahashi, Taiji Torigoe
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Patent number: 4694748Abstract: A device for moving offset plates from a stack of such plates to a fixing device by grasping a plurality of offset plates having positioning engagement holes from a stack and moving them through a print-through device to a fixing device utilizing a transport mechanism having positioning pins to receive the engagement holes of the offset plates and to release them when the offset plates have completed the desired movement.Type: GrantFiled: November 14, 1985Date of Patent: September 22, 1987Assignee: Fujirex Company, LimitedInventors: Kunio Fujisawa, Toyoji Tanaka, Toshio Mochizuki, Norio Nakamura, Seiji Kaya