Patents by Inventor Toshio Sakamizu
Toshio Sakamizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9516699Abstract: A sensor network system is provided with a plurality of sensor terminals disposed in a predetermined area, and a monitoring center device that collects sensing data wirelessly transmitted from each of the plurality of sensor terminals. The sensor terminals wirelessly and intermittently transmit a transmission signal including sensor identification information and the latest sensing data from the sensors. The monitoring center device has the function of acquiring positional information of the sensor terminals in the predetermined area, and accumulates each item of the sensing data from the sensor terminals as time-series data in association with information about the time of acquisition. On the basis of the positional information of the sensor terminals and the time-series data of the accumulated sensing data, a time-series variation of an environmental element in the predetermined area is visually presented.Type: GrantFiled: September 6, 2013Date of Patent: December 6, 2016Assignees: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, MICROMACHINE CENTERInventors: Hironao Okada, Toshihiro Itoh, Masao Arakawa, Toshio Sakamizu
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Publication number: 20160021434Abstract: A sensor terminal is provided with a sensor information storing part for storing sensor information regarding each of different types of sensors that can be connected to a sensor connector part. A sensor type discrimination means discriminates between types of sensors connected to the sensor connector part. A schedule information storing part stores schedule information regarding the connected sensors. On the basis of the discrimination result from the sensor type discrimination means, sensor information regarding the connected sensors is acquired from the sensor information storing part, and schedule information is generated and stored in the schedule information storing part. A control means refers to the schedule information storing part, and on the basis of the schedule information regarding the connected sensor, acquires sensing data and wirelessly transmits the sensing data. A sensor terminal is thus provided merely by connecting and installing different types of sensors.Type: ApplicationFiled: March 12, 2014Publication date: January 21, 2016Applicant: MICROMACHINE CENTERInventors: Masao ARAKAWA, Toshio SAKAMIZU, Munehisa TAKEDA
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Publication number: 20150257203Abstract: A sensor network system is provided with a plurality of sensor terminals disposed in a predetermined area, and a monitoring center device that collects sensing data wirelessly transmitted from each of the plurality of sensor terminals. The sensor terminals wirelessly and intermittently transmit a transmission signal including sensor identification information and the latest sensing data from the sensors. The monitoring center device has the function of acquiring positional information of the sensor terminals in the predetermined area, and accumulates each item of the sensing data from the sensor terminals as time-series data in association with information about the time of acquisition. On the basis of the positional information of the sensor terminals and the time-series data of the accumulated sensing data, a time-series variation of an environmental element in the predetermined area is visually presented.Type: ApplicationFiled: September 6, 2013Publication date: September 10, 2015Applicants: MICROMACHINE CENTER, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Hironao Okada, Toshihiro Itoh, Masao Arakawa, Toshio Sakamizu
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Patent number: 7642145Abstract: There is a problem in that when the demand accuracy with respect to a semiconductor pattern dimension comes close to a resist molecule size with miniaturization, the device performance is deteriorated due to edge roughness of a resist pattern to exert a bad influence on the system performance. The present invention overcomes the problem by the procedure in which super-molecules which are small in dimension as compared with the conventional polymers are used as main components, the reaction number required for the change of molecule solubility is made constant and as large as possible, and an acid generator is made clathrate or combinatory n super molecules to make an acid catalyst concentration large. As a result, it is possible to form a pattern of molecular accuracy with high productivity even with respect to the pattern dimension less than 50 nm, thereby realizing the high performance system.Type: GrantFiled: July 30, 2002Date of Patent: January 5, 2010Assignee: Hitachi, Ltd.Inventors: Hiroshi Fukuda, Yoshiyuki Yokoyama, Takashi Hattori, Toshio Sakamizu, Tadashi Arai, Hiroshi Shiraishi
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Publication number: 20060105273Abstract: There is a problem in that when the demand accuracy with respect to a semiconductor pattern dimension comes close to a resist molecule size with miniaturization, the device performance is deteriorated due to edge roughness of a resist pattern to exert a bad influence on the system performance. The present invention overcomes the problem by the procedure in which super-molecules which are small in dimension as compared with the conventional polymers are used as main components, the reaction number required for the change of molecule solubility is made constant and as large as possible, and an acid generator is made clathrate or combinatory n super molecules to make an acid catalyst concentration large. As a result, it is possible to form a pattern of molecular accuracy with high productivity even with respect to the pattern dimension less than 50 nm, thereby realizing the high performance system.Type: ApplicationFiled: July 30, 2002Publication date: May 18, 2006Applicant: Hitachi, Ltd.Inventors: Hiroshi Fukuda, Yoshiyuki Yokoyama, Takashi Hattori, Toshio Sakamizu, Tadashi Arai, Hiroshi Shiraishi
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Patent number: 7005216Abstract: Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.Type: GrantFiled: November 20, 2002Date of Patent: February 28, 2006Assignee: Renesas Technology Corp.Inventors: Hiroshi Shiraishi, Sonoko Migitaka, Takashi Hattori, Tadashi Arai, Toshio Sakamizu
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Publication number: 20050008976Abstract: To form a fine resist pattern without collapse, the invention patterns a resist by applying a resist composition to a substrate to form a resist film, exposing the resist film to radiation in a desired pattern, and developing the exposed resist film using supercritical carbon dioxide at 200 atm or lower. The resist composition mainly includes a polymer having a solubility parameter equal to or lower than that of supercritical carbon dioxide.Type: ApplicationFiled: June 18, 2004Publication date: January 13, 2005Inventors: Toshio Sakamizu, Hiroshi Fukuda, Hiroshi Shiraishi
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Publication number: 20030129505Abstract: Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.Type: ApplicationFiled: November 20, 2002Publication date: July 10, 2003Inventors: Hiroshi Shiraishi, Sonoko Migitaka, Takashi Hattori, Tadashi Arai, Toshio Sakamizu
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Patent number: 6319649Abstract: A chemically amplified photosensitive resin composition containing a first compound forming an acid by irradiation of actinic ray and a second compound that changes the solubility to an aqueous alkali solution with acid-catalyzed reaction wherein an ion dissociative compound having the composition represented by the general formula (1) or (2), as well a method of forming a resist pattern using the composition are disclosed, the formulae being expressed by: where each of R2, R3 and R4 represents hydrogen, and an alkyl or aryl group of 1 to 7 carbon atoms, at least one of R1, R2, R3 and R4 represents hydrogen, Y1 represents chlorine, bromine, iodine, carbonate group of 1 to 7 carbon atoms or sulfonate group of 1 to 7 carbon atoms, andType: GrantFiled: February 17, 1998Date of Patent: November 20, 2001Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.Inventors: Koji Kato, Masahiro Hashimoto, Michiaki Hashimoto, Toshio Sakamizu, Hiroshi Shiraishi
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Patent number: 5350485Abstract: A lithographic method for forming a mask pattern is useful for etching wiring or insulator layers on a substrate. A catalyst generation layer and a latent image formation layer are formed on the target layer prior to application of actinic radiation to activate a catalyst in the catalyst generation layer in accordance with a predetermined pattern. The activated catalyst diffuses into the latent image formation layer to form a latent image, which then serves as a mask pattern for etching the catalyst generation layer, latent image formation layer and target layer. The catalyst generation layer may be formed prior to the latent image formation layer, or vice versa. In another embodiment, the catalyst generation layer is formed prior to the radiation step, but the latent image formation layer is formed after application of the actinic radiation.Type: GrantFiled: January 26, 1993Date of Patent: September 27, 1994Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.Inventors: Hiroshi Shiraishi, Takashi Soga, Fumio Murai, Toshio Sakamizu, Nobuaki Hayashi
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Patent number: 5324550Abstract: In forming a resist pattern by forming a resist film containing an acid generator on a spin on glass film or a silicon resin film and subsequent exposure of light, an inhomogeneous distribution of an acid in the resist film caused by the spin on glass film or the silicon resin film is remedied by adding an acid generator beforehand into the spin on glass film or the silicon resin film or by using an organic polymer containing an acid generator. As a result, a profile defect in a cross section of the resist pattern caused by inhomogeneous acid distribution is prevented and the resist pattern has a rectangular cross-sectional shape.Type: GrantFiled: August 12, 1992Date of Patent: June 28, 1994Assignee: Hitachi, Ltd.Inventors: Hidenori Yamaguchi, Fumio Murai, Norio Hasegawa, Toshio Sakamizu, Hiroshi Shiraishi