Abstract: A process for making a release sheet which is non-silicone based and has good releasability from a pressure sensitive adhesive layer and which makes it possible to form a release agent layer at low temperature, having solvent resistance. The process comprises coating a substrate film with a release agent liquid, drying, and curing, to give a release agent layer, wherein the release agent layer is a cured layer obtained by irradiating a diene base polymer containing an intermolecular cleavage photopolymerization initiator with an active energy beam.

Abstract: Provided is a release sheet which is a non-silicone based and has a good releasability from a pressure sensitive adhesive layer and which makes it possible to form a release agent layer at low temperature and has a solvent resistance. The release sheet comprises a substrate film and a release agent layer, wherein the release agent layer is a cured layer obtained by irradiating a diene base polymer containing an intermolecular cleavage type photopolymerization initiator with an active energy beam.

Abstract: Provided is a release sheet which is a non-silicone based and has a good releasing performance from a pressure sensitive adhesive layer and which is excellent in an aging stability of releasing performance. The above release sheet comprises a rubber base release agent layer provided on a substrate directly or via an undercoat layer, wherein a central line average roughness (Ra) of a substrate surface or an undercoat layer surface which is brought into contact with the rubber base release agent layer is 0.06 ?m or less, and the rubber base release agent layer has a thickness of 0.01 to 5 ?m.