Patents by Inventor Toshiro Kubo
Toshiro Kubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120144938Abstract: Inspection units have moving parts such as XY-movement stage mechanisms and high-speed rotation mechanisms for inspecting the entire surfaces of substrates, and it is difficult for fan filter units (FFUs) to completely remove all foreign materials. The provided inspection device has: a fan filter unit divided into a plurality of regions; an exhaust unit, divided into a plurality of regions, for getting rid of air from the fan filter unit; and a transfer system disposed between the fan filter unit and the exhaust unit. The chief characteristic of the provided inspection device is that the flow rate in some of the regions of the fan filter unit and the flow rate in some of the regions of the exhaust unit are controlled in accordance with the operations of the transfer system.Type: ApplicationFiled: September 6, 2010Publication date: June 14, 2012Inventors: Katsuyasu Inagaki, Kenji Aiko, Masaru Kamada, Toshiro Kubo, Yusuke Miyazaki
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Patent number: 7105815Abstract: To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position of a specimen is set so as to fall within the visual field of the electron microscope, using position data of a defect of the specimen. The position of the defect is imaged by the electron microscope set to the first imaging condition to obtain a first image corresponding to the defect position. The first image is processed to determine whether a defect exists. The electron optical system is then set to a second imaging condition on the basis of the result of determination. A point imaged under the first imaging condition is imaged by the electron microscope set to the second imaging condition to acquire a second image corresponding to a defect position.Type: GrantFiled: December 27, 2004Date of Patent: September 12, 2006Assignee: Hitachi High-Technologies CorporationInventors: Kenji Obara, Toshifumi Honda, Toshiro Kubo
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Patent number: 6979821Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained. The reflected electrons 12a emitted in a direction at a small angle with the surface of the sample 8 are detected by the detectors 10a and 10b arranged on the side of the electron source 1 of the magnetic field leakage type object lens 7 and a sample image is formed. Irregularity information of the sample is obtained from the effects of light and shade appearing in the sample image.Type: GrantFiled: December 9, 2003Date of Patent: December 27, 2005Assignee: Hitachi, Ltd.Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
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Publication number: 20050199808Abstract: To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position of a specimen is set so as to fall within the visual field of the electron microscope, using position data of a defect of the specimen. The position of the defect is imaged by the electron microscope set to the first imaging condition to obtain a first image corresponding to the defect position. The first image is processed to determine whether a defect exists. The electron optical system is then set to a second imaging condition on the basis of the result of determination. A point imaged under the first imaging condition is imaged by the electron microscope set to the second imaging condition to acquire a second image corresponding to a defect position.Type: ApplicationFiled: December 27, 2004Publication date: September 15, 2005Inventors: Kenji Obara, Toshifumi Honda, Toshiro Kubo
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Publication number: 20050087686Abstract: This invention provides a technique for observing defects, which can automatically decide a direction from inclined observation and take an inclined review image. In a defect observing system for detecting the defects and thereafter observing images of the defects from various directions in detail, positions of inclined images to be taken are automatically displayed on a display screen from a planar image (top-down image) of a SEM using CAD data, and the defects are selected from the images displayed on the display screen based on specification by a user, an inclined angle and direction are determined per selected image to take an inclined image (beam-tilt image), and the inclined image of each defect is acquired.Type: ApplicationFiled: October 1, 2004Publication date: April 28, 2005Inventors: Toshifumi Honda, Toshiro Kubo
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Patent number: 6765205Abstract: An electron microscope including an apparatus for x-ray analysis, is capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing, at high speed and with high precision and high space resolving power. The current quantity of the electron beam is automatically controlled such that an X-ray count rate falls within a range of 1000 to 2000 counts per second, a plurality of X-ray energy regions are set up when checking an X-ray spectrum against reference spectra stored in a database for analysis of the X-ray spectrum, matching is performed for each of the X-ray energy regions, and the distribution of the elements observed is analyzed on the basis of an intensity ratio between X-ray sample spectra obtained by electron beam irradiation at not less than two varied acceleration voltages.Type: GrantFiled: June 24, 2003Date of Patent: July 20, 2004Assignee: Hitachi High-Technologies CorporationInventors: Isao Ochiai, Toshiei Kurosaki, Toshiro Kubo, Naomasa Suzuki
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Publication number: 20040113074Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained.Type: ApplicationFiled: December 9, 2003Publication date: June 17, 2004Applicant: Hitachi, Ltd.Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
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Publication number: 20040099805Abstract: There are provided an electron microscope including an apparatus of x-ray analysis, capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing semiconductor devices and so forth, at high speed and with high precision and high space resolving power, and a method of analyzing specimens using the same.Type: ApplicationFiled: June 24, 2003Publication date: May 27, 2004Inventors: Isao Ochiai, Toshiei Kurosaki, Toshiro Kubo, Naomasa Suzuki
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Publication number: 20030122074Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained.Type: ApplicationFiled: February 20, 2003Publication date: July 3, 2003Applicant: Hitachi, Ltd.Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
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Patent number: 6555819Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained. The reflected electrons 12a emitted in a direction at a small angle with the surface of the sample 8 are detected by the detectors 10a and 10b arranged on the side of the electron source 1 of the magnetic field leakage type object lens 7 and a sample image is formed. Irregularity information of the sample is obtained from the effects of light and shade appearing in the sample image.Type: GrantFiled: October 4, 2000Date of Patent: April 29, 2003Assignee: Hitachi, Ltd.Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
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Patent number: 5442182Abstract: An electron lens comprising a first exciting coil, a second exciting coil, a casing for encompassing the first and second exciting coils, and an excitation control apparatus for controlling the excitation state of at least the first exciting coil independently of the second exciting coil. The excitation control apparatus independently controls currents applied to the first and second exciting coils, respectively. At this time, exothermy of each coil can be kept constant and thermal deformation of the casing can be prevented by keeping the sum of the absolute values of the currents applied to the coils.Type: GrantFiled: November 3, 1993Date of Patent: August 15, 1995Assignee: Hitachi, Ltd.Inventors: Toshiro Kubo, Toshiyuki Ohashi, Mikio Ichihashi, Yuji Sato
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Patent number: 5310156Abstract: An earthquake-proof leg support structure (10) of an electronic apparatus comprising a leg (12) vertically downwardly extending from the outer case (1) and a dish-shaped leg support seat (20) to receive the leg (12). The leg support seat (20) includes a metal element (28) having an upper surface (22) over which the leg (12) slides and a peripheral flange (24) against which the leg (12) abuts, and a plastic liner (30) having a lower flat smooth surface (26) which is slidable on the floor. The lower end surface (14) of the leg is of a convex spherical shape and the upper surface (22) of the leg support seat includes a central surface portion (22a) of a concave spherical shape and a cone-shaped slope portion (22b) arranged around and tangential to the central surface portion, with the radius of curvature of the leg (12) being smaller than that of the upper surface (22) of the leg support seat (20 ).Type: GrantFiled: August 24, 1992Date of Patent: May 10, 1994Assignee: Fujitsu LimitedInventors: Tadanobu Matsumura, Yasuhide Iwamoto, Yoshio Makino, Osamu Nishina, Katuei Satou, Takasi Watanabe, Yujiro Hata, Toshiro Kubo, Wataru Ishizu, Takashi Simura