Patents by Inventor Toshiro Miki

Toshiro Miki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5096522
    Abstract: A process for producing a copper-clad laminate is disclosed which includes the steps of (a) contacting the surface of a conductive carrier with a catalyst liquid containing at least one noble metal selected from the group consisting of Pd, Pt, Ru, Au, and Ag; (b) subsequently forming a copper foil layer on the treated surface of the conductive carrier by copper electroplating; (c) laminating an insulating base on the copper foil layer by hot-press bonding; and (d) separating the conductive carrier from the resulting laminate. The copper foil layer in the resulting copper-clad laminate has reduced pinholes and exhibits isotropic mechanical characteristics.
    Type: Grant
    Filed: June 22, 1990
    Date of Patent: March 17, 1992
    Assignees: Meiko Electronics Co., Ltd., Toagosei Chemical Industry
    Inventors: Norio Kawachi, Katsurou Aoshima, Tatsuo Wada, Toshiro Miki, Takeharu Kato
  • Patent number: 4889584
    Abstract: A method suited for producing a conductor circuit board having a high-density, fine circuit pattern. Conductor circuits and dummy circuits are formed on the surface of a planar, electrically conductive substrate, and after removing a resist mask, unnecessary dummy circuits are removed. A thin metal film is formed over the surface of the conductive substrate and the surfaces of the conductor circuits and remaining dummy circuits. An insulating substrate is superposed on the surface of the conductive substrate on which the thin metal film is formed, and the two substrates are pressure-bonded together with heat applied thereto. Subsequently, only the conductive substrate is removed, and exposed portions of the thin metal film are removed by etching.
    Type: Grant
    Filed: March 31, 1989
    Date of Patent: December 26, 1989
    Assignees: Meiko Electronics Co., Ltd., Toagosei Chemical Industry Co., Ltd.
    Inventors: Tatsuo Wada, Toshiro Miki, Masamitsu Takenaka
  • Patent number: 4677225
    Abstract: A process for producing acrylic acid or methacrylic acid by reacting acetic acid or propionic acid with formaldehyde in a gas phase is described, characterized by carrying out the reaction in the presence of a solid catalyst containing at least one of boron oxide or phosphorus oxide and having an acid site of an acid strength, pKa.ltoreq.-3.0. The solid catalyst is of high activity and is satisfactory in both selectivity and conversion and, furthermore, its high selectivity can be maintained for long periods of time. Thus the desired product, acrylic acid or methacrylic acid, can be produced in high yield.
    Type: Grant
    Filed: May 21, 1985
    Date of Patent: June 30, 1987
    Assignee: Toagosei Chemical Industry Co., Ltd.
    Inventors: Hiroshi Niizuma, Toshiro Miki, Shiro Kojima, Kishiro Azuma, Hiroyuki Kato, Yuichi Murakami, Tsutomu Ito