Patents by Inventor Toshiro UMEKI

Toshiro UMEKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Target supply device, processing device and processing method therefor
    Patent number: 10237961
    Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: March 19, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Yutaka Shiraishi, Shinya Ikesaka, Takanobu Ishihara, Toshiro Umeki
  • TARGET SUPPLY DEVICE, PROCESSING DEVICE AND PROCESSING METHOD THEREFOR
    Publication number: 20190045614
    Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
    Type: Application
    Filed: October 9, 2018
    Publication date: February 7, 2019
    Applicant: Gigaphoton Inc.
    Inventors: Tsukasa HORI, Yutaka SHIRAISHI, Shinya IKESAKA, Takanobu ISHIHARA, Toshiro UMEKI
  • Target supply device, processing device and processing method thefefor
    Patent number: 10136509
    Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: November 20, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Yutaka Shiraishi, Shinya Ikesaka, Takanobu Ishihara, Toshiro Umeki
  • TARGET SUPPLY DEVICE, PROCESSING DEVICE AND PROCESSING METHOD THEFEFOR
    Publication number: 20170280543
    Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
    Type: Application
    Filed: June 7, 2017
    Publication date: September 28, 2017
    Applicant: Gigaphoton Inc.
    Inventors: Tsukasa HORI, Yutaka SHIRAISHI, Shinya IKESAKA, Takanobu ISHIHARA, Toshiro UMEKI